Process for preparing catalytic solutions of sulfonium salts

Claim 2

A photocurable composition comprising an epoxy resin selected from the group consisting of monomeric, dimeric, oligomeric and polymeric epoxy resin containing at least one epoxy group and a catalytic amount of a photocatalytic solution of a sulfonium salt of a complex anion, capable of yielding a Lewis acid when irradiated by UV light formed by reacting a sulfonium halide with an alkali metal or ammonium salt of a complex anion in a solvent mixture containing a polyol containing at least two OH groups and a lactone of the formula: ##STR2## wherein R is H or CH 3 and n is 2 to 4, the weight ratio of the sulfonium halide:polyol:lactone being in the range 1:1 to 5:1 to 20, respectively.

Claim 3

The composition, according to claim 1, wherein the sulfonium salt in the photocatalytic solution is present in an amount in the range 0.1 to 10% by weight of the epoxy resin.

Claim 4

The process of curing an epoxy resin which comprises admixing an epoxy resin selected from the group consisting of monomeric, dimeric, oligomeric and polymeric epoxy resin containing at least one epoxy group with a photocatalytic solution of a sulfonium salt of a complex anion, capable of yielding a Lewis Acid when irradiated by UV light formed by reacting a sulfonium halide with an alkali metal or ammonium salt of a complex anion in a solvent mixture containing a polyol containing at least two OH groups and a lactone of the formula: ##STR3## wherein R is H or CH 3 and n is 2 to 4, the weight ratio of the sulfonium halide:polyol:lactone being in the range 1:1 to 5:1 to 20, respectively, said solution being present in an amount sufficient to contain 0.1 to 10% by weight of the sulfonium salt based on the weight of the epoxy resin and thereafter exposing said admixture to radiation.

Claim 5

The process of curing an epoxy resin which comprises admixing an epoxy resin selected from the group consisting of monomeric, dimeric, oligomeric and polymeric epoxy resin containing at least one epoxy group with a photocatalytic solution of a sulfonium salt of a complex anion, capable of yielding a Lewis Acid when irradiated by UV light formed by reacting a sulfonium halide with an alkali metal or ammonium salt of a complex anion in a solvent mixture containing a polyol containing at least two OH groups and a lactone of the formula: ##STR3## wherein R is H or CH 3 and n is 2 to 4, the weight ratio of the sulfonium halide:polyol:lactone being in the range 1:1 to 5:1 to 20, respectively, said solution being present in an amount sufficient to contain 0.1 to 10% by weight of the sulfonium salt based on the weight of the epoxy resin and thereafter exposing said admixture to radiation.

Claim 6

The process, according to claim 3, wherein the radiation is UV radiation.

Claim 7

The process, according to claim 3, wherein the radiation is high energy ionizing radiation.

Claim 8

The process of coating a substrate which comprises admixing an epoxy resin selected from the group consisting of monomeric, dimeric, oligomeric and polymeric epoxy resin containing at least one epoxy group with a photocatalytic solution of a sulfonium salt of a complex anion, capable of yielding a Lewis Acid when irradiated by UV light formed by reacting a sulfonium halide with an alkali metal or ammonium salt of a complex anion in a solvent mixture containing a polyol containing at least two OH groups and a lactone of the formula: ##STR4## wherein R is H or CH 3 and n is 2 to 4, the weight ratio of the sulfonium halide:polyol:lactone being in the range 1:1 to 5:1 to 20, respectively, said solution being present in an amount sufficient to contain 0.1 to 10% by weight of the sulfonium salt based on the weight of the epoxy resin, coating said admixture on the substrate and thereafter exposing said admixture to radiation.

Claim 9

The process of coating a substrate which comprises admixing an epoxy resin selected from the group consisting of monomeric, dimeric, oligomeric and polymeric epoxy resin containing at least one epoxy group with a photocatalytic solution of a sulfonium salt of a complex anion, capable of yielding a Lewis Acid when irradiated by UV light formed by reacting a sulfonium halide with an alkali metal or ammonium salt of a complex anion in a solvent mixture containing a polyol containing at least two OH groups and a lactone of the formula: ##STR4## wherein R is H or CH 3 and n is 2 to 4, the weight ratio of the sulfonium halide:polyol:lactone being in the range 1:1 to 5:1 to 20, respectively, said solution being present in an amount sufficient to contain 0.1 to 10% by weight of the sulfonium salt based on the weight of the epoxy resin, coating said admixture on the substrate and thereafter exposing said admixture to radiation.

Claim 10

The process, according to claim 6, wherein the radiation is UV radiation.

Claim 11

The process, according to claim 6, wherein the radiation is high energy ionizing radiation.

Claim 12

The composition of claim 1 wherein the sodium salt is triphenylsulfonium hexafluorophosphate.

Claim 13

The process according to claim 2 wherein the sulfonium salt is triphenylsulfonium hexafluorophosphate.

Claim 14

The process according to claim 3 wherein the sulfonium salt is triphenylsulfonium hexafluorophosphate.