Patent US4141733A successfully refreshed from Google Patents.
US4141733A
Expired / Lapsed
US
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Development of light-sensitive quinone diazide compositions
Assignee: Eastman Kodak Co
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Filing: 1977-10-25
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Granted: 1979-02-27
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Expires: 1997-10-25
Abstract
Abstract Light-sensitive compositions containing a quinone diazide which are useful in positive-working photoresists and positive-working lithographic printing plates are developed with a developing composition comprising methyltriethanol ammonium hydroxide. The developing composition provides the advantage that it is free of metal ions and, accordingly, does not contaminate the surface of the image. It is additionally advantageous in that it provides extended development latitude, increased exposure latitude, improved resist contrast, improved prebake latitude, a low depletion rate and minimal loss of image layer thickness.
Inventors
- 👤 John R. Guild
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 21:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
44 words
In a process for forming a resist image which comprises imagewise exposing to actinic radiation a layer of a light-sensitive quinone diazide composition and developing the exposed layer with an alkaline developing composition, the improvement wherein said alkaline developing composition comprises methyltriethanol ammonium hydroxide.
Claim 2
Dependent Claim
44 words
In a process for forming a resist image which comprises imagewise exposing to actinic radiation a layer of a light-sensitive quinone diazide composition and developing the exposed layer with an alkaline developing composition, the improvement wherein said alkaline developing composition comprises methyltriethanol ammonium hydroxide.
Claim 3
Dependent Claim
28 words
The process as claimed in claim 1 wherein said developing composition is an aqueous solution containing about 1 to about 30 percent by weight of methyltriethanol ammonium hydroxide.
Claim 4
Dependent Claim
28 words
The process as claimed in claim 1 wherein said developing composition is an aqueous solution containing about 3 to about 24 percent by weight of methyltriethanol ammonium hydroxide.
Claim 5
Dependent Claim
28 words
The process as claimed in claim 1 wherein said developing composition is an aqueous solution containing about 3 to about 6 percent by weight of methyltriethanol ammonium hydroxide.
Claim 6
Dependent Claim
25 words
The process as claimed in claim 1 wherein said quinone diazide composition is comprised of a monomeric quinone diazide incorporated in an alkali-soluble resinous binder.
Claim 7
Dependent Claim
28 words
The process as claimed in claim 1 wherein said quinone diazide composition is comprised of a monomeric quinone diazide that has been reacted with an alkali-soluble resinous material.
Claim 8
Dependent Claim
29 words
The process as claimed in claim 1 wherein said quinone diazide composition comprises a polymeric compound formed from the condensation reaction of a quinone diazide with a phenol-formaldehyde resin.
Claim 9
Dependent Claim
29 words
The process as claimed in claim 1 wherein said quinone diazide composition comprises a polymeric compound formed from the condensation reaction of a naphthoquinone diazide with a phenol-formaldehyde resin.
Claim 10
Dependent Claim
25 words
The process as claimed in claim 1 wherein said quinone diazide has a linkage selected from the group consisting of sulfonyl, carbonyl, carbonyloxy and sulfinyloxy.
Claim 11
Dependent Claim
28 words
The process as claimed in claim 1 wherein said quinone diazide composition comprises a polymeric compound formed from the condensation reaction of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride with a phenol-formaldehyde resin.
Claim 12
Dependent Claim
35 words
The process as claimed in claim 1 wherein said quinone diazide composition comprises a non-light-sensitive film-forming polymeric binder and a polymeric compound formed from the condensation reaction of a quinone diazide with a phenol-formaldehyde resin.
Claim 13
Dependent Claim
22 words
The process as claimed in claim 1 wherein said layer of light-sensitive quinone diazide composition is a coating on a silicon wafer.
Claim 14
Dependent Claim
80 words
In a process for forming a resist image which comprises imagewise exposing to actinic radiation a layer of a light-sensitive quinone diazide composition and developing the exposed layer with an alkaline developing composition, the improvement wherein said alkaline developing composition is an aqueous composition which is substantially free of metal ions and contains a sufficient concentration of methyltriethanol ammonium hydroxide to remove the exposed areas of said layer of light-sensitive quinone diazide composition without substantial removal of the unexposed areas.
Claim 15
Dependent Claim
80 words
In a process for forming a resist image which comprises imagewise exposing to actinic radiation a layer of a light-sensitive quinone diazide composition and developing the exposed layer with an alkaline developing composition, the improvement wherein said alkaline developing composition is an aqueous composition which is substantially free of metal ions and contains a sufficient concentration of methyltriethanol ammonium hydroxide to remove the exposed areas of said layer of light-sensitive quinone diazide composition without substantial removal of the unexposed areas.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-02-26 | 1982-08-28 | 1983-02-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-02-26 | 1986-08-28 | 1987-02-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-02-26 | 1990-08-28 | 1991-02-27 | $7700.00 | Window Closed / Lapsed |