US4131506A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing echelette gratings
Assignee: RIKEN
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Filing: 1976-12-15
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Granted: 1978-12-26
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Expires: 1996-12-15
Abstract
Abstract Disclosed is a method of producing echelette gratings using a beam of electrically charged particles to bomber a masked substrate. The shape and blazed angle "δ" of the echelette grating is controlled by putting the substrate at a selected slant angle "θ" with regard to the beam of electrically charged particles.
Inventors
- 👤 Susumu Namba
- 👤 Yoshinobu Aoyagi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 23:14
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/18; G02B5/1847; G02B5/1857
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
102 words
A method of producing echelette gratings comprising the steps of: using holographic masking techniques to produce a mask grating on a substrate; rotating the masked substrate with respect to a source of a beam of charged particles to form a desired oblique angle between the beam and surface of the masked substrate; projecting a beam of charged particles onto the masked substrate at the desired oblique angle to the surface of the substrate for eroding the substrate thereby leaving sawtooth parallel grooves in the substrate; and water cooling the masked substrate while it is being eroded by the beam of charged particles.
Claim 2
Independent Claim
102 words
A method of producing echelette gratings comprising the steps of: using holographic masking techniques to produce a mask grating on a substrate; rotating the masked substrate with respect to a source of a beam of charged particles to form a desired oblique angle between the beam and surface of the masked substrate; projecting a beam of charged particles onto the masked substrate at the desired oblique angle to the surface of the substrate for eroding the substrate thereby leaving sawtooth parallel grooves in the substrate; and water cooling the masked substrate while it is being eroded by the beam of charged particles.
Claim 3
Dependent Claim
20 words
A method of producing echelette gratings according to claim 1 wherein said beam of charged particles is an electron beam.
Claim 4
Dependent Claim
17 words
A method of producing echelette gratings according to claim 1 wherein said substrate is comprised of GaAs.
Claim 5
Dependent Claim
34 words
A method of producing echelette gratings according to claim 5, wherein the amount of material removed from the substrate is greater than the amount removed from the mask grating during a given time interval.
Claim 6
Dependent Claim
20 words
A method of producing echelette gratings according to claim 1 wherein said beam of charged particles is an ion beam.
Claim 7
Dependent Claim
18 words
A method of producing echelette gratings according to claim 1 wherein said substrate is comprised of polymethylmethacrylate. pg,12
Claim 8
Dependent Claim
17 words
A method of producing echelette gratings according to claim 1 wherein said substrate is comprised of CdS.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-12-25 | 1982-06-26 | 1982-12-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-12-25 | 1986-06-26 | 1986-12-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-12-25 | 1990-06-26 | 1990-12-26 | $7700.00 | Window Closed / Lapsed |