US3733258A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials
Assignee: RCA Corp
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Filing: 1971-02-03
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Granted: 1973-05-15
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Expires: 1991-02-03
Abstract
Abstract SPUTTER ETCHING HAS BEEN FOUND TO BE CAPABLE OF TRANSFERRING HOLOGRAMS RECORDED ON A PHOTOSENSITIVE SURFACE LAYER COVERING AN UNDERLYING SUBSTRATE MATERIAL FROM THE LAYER TO THE SUBSTRATE MATERIAL ITSELF. THE TRANSFERRED HOLOGRAM IS IN THE FORM OF A RELIEF PATTERN. THIS TECHNIQUE PROVIDES BOTH HIGH FIDELITY AND HIGH RESOLUTION CAPABILITIES IN BOTH THE DEPTH DIMENSION AND IN THE SURFACE DIMENSIONS OF THE TRANSFERRED RELIEF-PATTERN HOLOGRAM, WHICH ARE IN THE ORDER OF ONE MICRON OR LESS, AND IS APPLICABLE TO OTHER FINE-DETAIL RELIEF PATTERNS.
Inventors
- 👤 J Hanak
- 👤 J Russell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 21:15
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; G; G03; G03H; G03H1/00; G03H1/02; G03H1/024; G03H1/0244; G03H1/0276; G03H2001/0292; G03H2270/00; G03H2270/52
Claims Analysis
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-05-14 | 1976-11-13 | 1977-05-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-05-14 | 1980-11-13 | 1981-05-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-05-14 | 1984-11-13 | 1985-05-15 | $7700.00 | Window Closed / Lapsed |