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US4113543A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus for etching the edges of semiconductor plates

Assignee: US Philips Corp
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Filing: 1976-10-04
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Granted: 1978-09-12
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Expires: 1996-10-04
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Abstract

Abstract A mechanochemical method of etching the side wall of circular semiconductor plates, and apparatus for performing the method. The plates are given a rotary movement while their side walls only are contacted with an etching solution, the rotary movement being produced by rotation of at least one cylindrical roller dragging along a film of the etching solution.

Inventors

  • 👤 Yvon Salles
  • 👤 Pierre Leger
  • 👤 Gerard Andre David

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 22:31
CPC Classifications
H; H10; H10P; H10P90/00; H10P90/12; H10P90/129; H10F; H10F71/00; H10F71/121; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/547; Y02P; Y02P70/00; Y02P70/50

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 112 words
An apparatus for mechanochemical etching of the side wall of a circular plate, comprising a container for receiving an etching solution, at least one roller having a longitudinal axis and a circular cylindrical surface, means for mounting said roller in said container so that its longitudinal axis is horizontal and a lower portion only of said surface the roller is submerged in etching solution, means for rotating said roller about said axis, and means for holding a plate with its side wall in rolling contact with said roller surface only and above said etching solution, said plate being in a vertical position with faces of the plate perpendicular to the roller axis.
Claim 2
Independent Claim 112 words
An apparatus for mechanochemical etching of the side wall of a circular plate, comprising a container for receiving an etching solution, at least one roller having a longitudinal axis and a circular cylindrical surface, means for mounting said roller in said container so that its longitudinal axis is horizontal and a lower portion only of said surface the roller is submerged in etching solution, means for rotating said roller about said axis, and means for holding a plate with its side wall in rolling contact with said roller surface only and above said etching solution, said plate being in a vertical position with faces of the plate perpendicular to the roller axis.
Claim 3
Dependent Claim 45 words
An apparatus as claimed in claim 1 comprising two rollers having their longitudinal axes parrallel with lower portions only submerged in said etching solution, said rollers and said holding means arranged so that a plate in rolling contact with both rollers is above said solution.
Claim 4
Dependent Claim 39 words
An apparatus as claimed in claim 2, comprising first external means for rotating a first one of said rollers, and second external means for rotating the second one of said rollers in response to rotation of said first roller.
Claim 5
Dependent Claim 41 words
An apparatus as claimed in claim 2 wherein said holding means comprises fork means for maintaining plates being etched in a vertical position, the fork means comprising at least two teeth arranged for contacting faces only of a plate being etched.

References Cited (Backward Citations)

US3964957A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-09-11 1982-03-13 1982-09-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-09-11 1986-03-13 1986-09-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-09-11 1990-03-13 1990-09-12 $7700.00 Window Closed / Lapsed

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