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US4104672A Expired / Lapsed US ⏱️ 0.0 years remaining

High power gallium arsenide schottky barrier field effect transistor

Assignee: AT&T Inc
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Filing: 1976-10-29
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Granted: 1978-08-01
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Expires: 1996-10-29
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Abstract

Abstract An integrated high-power gallium arsenide field-effect-transistor device for operation in the gigahertz range comprises a multiple-gate structure. The device, which features gate cross-under fingers, is fabricated in microminiature form by directly processing a wafer using electron-beam lithographic techniques.

Inventors

  • 👤 James Vincent DiLorenzo
  • 👤 Gerard Edward Mahoney
  • 👤 Joseph Michael Moran

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 21:01
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/80; H10D30/87; H10D64/00; H10D64/20; H10D64/27; H10D64/311; H10D64/411; H10P; H10P50/00; H10P50/20

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 165 words
In combination in a high-power microminiature gallium arsenide field-effect-transistor device, a gallium arsenide substrate having an epitaxial mesa formed thereon, multiple interleaved source, gate and drain electrodes formed on said mesa, each of said electrodes including a portion that extends beyond one edge or the opposite edge of the mesa and onto said substrate, a drain bus bar on said substrate adjacent said one edge of said mesa connecting together said drain electrodes, a gate bus bar, including cross-under fingers, on said substrate adjacent the opposite edge of said mesa connecting together said gate electrodes, insulating portions disposed on selected regions of said cross-under fingers, and a source bus bar on said substrate adjacent said opposite edge of said mesa extending over the insulating portions on said cross-under fingers to connect together said source electrodes, wherein said cross-under fingers are respectively deposited in convex-bottom channels formed in said substrate, each of said fingers comprising, in order of deposition, layers of germanium/gold, silver, gold and tungsten.
Claim 2
Dependent Claim 165 words
In combination in a high-power microminiature gallium arsenide field-effect-transistor device, a gallium arsenide substrate having an epitaxial mesa formed thereon, multiple interleaved source, gate and drain electrodes formed on said mesa, each of said electrodes including a portion that extends beyond one edge or the opposite edge of the mesa and onto said substrate, a drain bus bar on said substrate adjacent said one edge of said mesa connecting together said drain electrodes, a gate bus bar, including cross-under fingers, on said substrate adjacent the opposite edge of said mesa connecting together said gate electrodes, insulating portions disposed on selected regions of said cross-under fingers, and a source bus bar on said substrate adjacent said opposite edge of said mesa extending over the insulating portions on said cross-under fingers to connect together said source electrodes, wherein said cross-under fingers are respectively deposited in convex-bottom channels formed in said substrate, each of said fingers comprising, in order of deposition, layers of germanium/gold, silver, gold and tungsten.
Claim 3
Dependent Claim 15 words
A combination as in claim 1 wherein said insulating portions are made of silicon dioxide.
Claim 4
Dependent Claim 164 words
A multiple-gate GaAs FET device comprising at least one mesa formed on a GaAs substrate member, plural interleaved source, drain and gate electrodes on each mesa with the ends of said electrodes extending onto said substrate member, a drain bus bar including at least one bonding pad on said substrate member, said drain bus bar electrically connecting together corresponding ends of said drain electrodes, a gate bus bar including at least one bonding pad on said substrate member and having cross-under members on said substrate member to electrically connect together corresponding ends of said gate electrodes, and a source bus bar including at least one bonding pad on said substrate member, said source bus bar crossing over said cross-under members and electrically insulated therefrom to electrically connect together corresponding ends of said source electrodes, wherein said cross-under members are respectively deposited in convex-bottom trenches formed in said substrate member, each of said members comprising, in order, deposited layers of germanium/gold, silver, gold and tungsten.
Claim 5
Dependent Claim 164 words
A multiple-gate GaAs FET device comprising at least one mesa formed on a GaAs substrate member, plural interleaved source, drain and gate electrodes on each mesa with the ends of said electrodes extending onto said substrate member, a drain bus bar including at least one bonding pad on said substrate member, said drain bus bar electrically connecting together corresponding ends of said drain electrodes, a gate bus bar including at least one bonding pad on said substrate member and having cross-under members on said substrate member to electrically connect together corresponding ends of said gate electrodes, and a source bus bar including at least one bonding pad on said substrate member, said source bus bar crossing over said cross-under members and electrically insulated therefrom to electrically connect together corresponding ends of said source electrodes, wherein said cross-under members are respectively deposited in convex-bottom trenches formed in said substrate member, each of said members comprising, in order, deposited layers of germanium/gold, silver, gold and tungsten.
Claim 6
Dependent Claim 29 words
A device as in claim 3 wherein a layer of silicon dioxide overlies said tungsten layer in those regions wherein said source bus bar crosses over said cross-under members.

References Cited (Backward Citations)

US3813585A Cited
US3737743A Cited
US3855613A Cited
US3969745A Cited
US4016643A Cited
US4015278A Cited
US3988619A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-07-31 1982-01-30 1982-08-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-07-31 1986-01-30 1986-08-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-07-31 1990-01-30 1990-08-01 $7700.00 Window Closed / Lapsed

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