Cathode electrocatalyst

Claim 2

In a method of conducting electrolysis in an electrolytic cell having an anode in an anolyte compartment and a cathode in a catholyte compartment, which method comprises feeding an alkali metal chloride brine to the anode compartment, passing an electrical current from said anode to said cathode whereby to evolve chlorine at said anode and hydrogen at said cathode, the improvement wherein said cathode has a ferrous substrate with an electroconductive surface thereon, said electroconductive surface being prepared by the method comprising: inserting the ferrous substrate into an electroless plating solution comprising: a. a tungsten salt; b. salts chosen from the group consisting of cobalt salts, nickel salts, and mixtures thereof; c. a phosphorous containing reducing agent;

Claim 3

d. an acid complexing agent; and e. a buffering agent; electrolessly depositing a coating from said solution onto said substrate; and subsequently electrolytically depositing from said electroless plating solution a coating of at least 3 × 10 -5 equivalents per square centimeter of substrate from said solution onto said substrate as a cathode whereby to provide a coating on said substrate comprising tungsten, phosphorous, and a metal chosen from the group consisting of cobalt, nickel, and mixtures thereof.

Claim 4

d. an acid complexing agent; and e. a buffering agent; electrolessly depositing a coating from said solution onto said substrate; and subsequently electrolytically depositing from said electroless plating solution a coating of at least 3 × 10 -5 equivalents per square centimeter of substrate from said solution onto said substrate as a cathode whereby to provide a coating on said substrate comprising tungsten, phosphorous, and a metal chosen from the group consisting of cobalt, nickel, and mixtures thereof.

Claim 5

The method of claim 1 comprising electrolytically depositing said coating at the limiting current density of the electrolytic deposition.

Claim 6

In a method of conducting electrolysis in an electrolytic cell having an anode in an anolyte compartment and a cathode in a catholyte compartment, which method comprises feeding an alkali metal chloride brine to the anode compartment, passing an electrical current from said anode to said cathode whereby to evolve chlorine at said anode and hydrogen at said cathode, the improvement wherein said cathode has a ferrous substrate with an electroconductive surface thereon, said electroconductive surface being prepared by the method comprising: inserting the ferrous substrate into a first electroless plating solution comprising: a. a tungsten salt; b. salts chosen from the group consisting of cobalt salts, nickel salts, and mixtures thereof; c. a phosphorous containing reducing agent; d. an acid complexing agent; and e. a buffering agent; electrolessly depositing a coating from said solution onto said substrate; and thereafter electrolytically depositing from a second electroless plating solution having the same composition as the first said electroless plating solution a coating of at least 3 × 10 -5 equivalents per square centimeter of substrate from said solution onto said substrate as a cathode whereby to provide a coating on said substrate comprising tungsten, phosphorous, and a metal chosen from the group consisting of cobalt, nickel, and mixtures thereof.

Claim 7

In a method of conducting electrolysis in an electrolytic cell having an anode in an anolyte compartment and a cathode in a catholyte compartment, which method comprises feeding an alkali metal chloride brine to the anode compartment, passing an electrical current from said anode to said cathode whereby to evolve chlorine at said anode and hydrogen at said cathode, the improvement wherein said cathode has a ferrous substrate with an electroconductive surface thereon, said electroconductive surface being prepared by the method comprising: inserting the ferrous substrate into a first electroless plating solution comprising: a. a tungsten salt; b. salts chosen from the group consisting of cobalt salts, nickel salts, and mixtures thereof; c. a phosphorous containing reducing agent; d. an acid complexing agent; and e. a buffering agent; electrolessly depositing a coating from said solution onto said substrate; and thereafter electrolytically depositing from a second electroless plating solution having the same composition as the first said electroless plating solution a coating of at least 3 × 10 -5 equivalents per square centimeter of substrate from said solution onto said substrate as a cathode whereby to provide a coating on said substrate comprising tungsten, phosphorous, and a metal chosen from the group consisting of cobalt, nickel, and mixtures thereof.