Process for removing chloride impurities from TiO2

Claim 2

A process for removing chloride impurities from TiO 2 which has been produced by the vapor phase oxidation of TiCl 4 at elevated temperatures, comprising: A. feeding the TiO 2 into the treatment chamber B. injecting a gas selected from steam, air, and nitrogen or a mixture thereof at a sonic or a supersonic velocity into the treatment chamber directly in the TiO 2 feed stream and directing the gas so that it flows crosscurrently into the TiO 2 such that the gas creates a pressure difference which draws the TiO 2 into the treatment chamber for 0.1 to 5 seconds, whereby the gas causes the TiO 2 to disperse into discrete particles, and causes the chloride impurities to separate from the particles, wherein the initial gas pressure is about 25-600 psi and its temperature is about 140°-650° C., and the weight ratio of gas to TiO 2 is 0.2-6.0, and C. separating the TiO 2 from the gas and chlorides using a cyclone or a bag filter.

Claim 3

The process of claim 1 wherein the treatment chamber is cylindrically shaped.

Claim 4

The process of claim 2 wherein the gas is steam.

Claim 5

The process of claim 3 wherein the gas pressure is about 300-400 psi and the gas temperature is about 200°-350° C.

Claim 6

The process of claim 4 wherein the weight ratio is about 1-3.

Claim 7

A process for removing chloride impurities from TiO 2 which has been produced by the vapor phase oxidation of TiCl 4 at elevated temperatures, comprising: A. feeding TiO 2 vertically downward into a treatment chamber, wherein the TiO 2 remains for 0.1 to 5 seconds, B. injecting a gas selected from steam, air, and nitrogen, or a mixture thereof, at a sonic or a supersonic velocity, into a treatment chamber through a nozzle, such that the end of the nozzle through which the gas is expelled is located in the TiO 2 feed stream and the gas is injected crosscurrent to the flow of TiO 2 , whereby the gas causes the TiO 2 to disperse into discrete particles and causes the chloride impurities to separate from the particles, wherein the initial gas pressure is about 25-600 psi and its temperature is about 140°-650° C., and the weight ratio of gas to TiO 2 is 0.2-6.0, and C. separating the TiO 2 from the gas and chlorides using a cyclone or a bag filter.

Claim 8

A process for removing chloride impurities from TiO 2 which has been produced by the vapor phase oxidation of TiCl 4 at elevated temperatures, comprising: A. feeding TiO 2 vertically downward into a treatment chamber, wherein the TiO 2 remains for 0.1 to 5 seconds, B. injecting a gas selected from steam, air, and nitrogen, or a mixture thereof, at a sonic or a supersonic velocity, into a treatment chamber through a nozzle, such that the end of the nozzle through which the gas is expelled is located in the TiO 2 feed stream and the gas is injected crosscurrent to the flow of TiO 2 , whereby the gas causes the TiO 2 to disperse into discrete particles and causes the chloride impurities to separate from the particles, wherein the initial gas pressure is about 25-600 psi and its temperature is about 140°-650° C., and the weight ratio of gas to TiO 2 is 0.2-6.0, and C. separating the TiO 2 from the gas and chlorides using a cyclone or a bag filter.

Claim 9

The process of claim 6 wherein the treatment chamber is cylindrically shaped.

Claim 10

The process of claim 7 wherein the gas is steam.

Claim 11

The process of claim 8 wherein the gas pressure is about 300-400 psi and the gas temperature is about 200°-350° C.

Claim 12

The process of claim 9 wherein the weight ratio if about 1-3.