← Back to Patent Explorer
US4083758A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for regenerating and for recovering metallic copper from chloride-containing etching solutions

Assignee: Criterion
•
Filing: 1976-09-27
•
Granted: 1978-04-11
•
Expires: 1996-09-27
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Copper values are recovered in metallic form from a solution containing such values along with chloride ions by, first, selectively removing the chloride ions from the solution, and then electrowinning the copper from the chloride-free solution. The process is particularly useful in recovering copper values from etching solutions in a metallic form, such as "wire-grade" metallic copper, that is available for fabrication into commercial copper products. The process is preferably applied to ammoniacal etching solutions derived from the manufacture of printed electronic circuit boards. As so applied, the chlorides are selectively removed by liquid-liquid extraction procedures, resulting in a substantially chloride-free, acidic stripping solution containing the copper values, which solution is subjected to electrolysis for winning copper metal. The aqueous raffinate from the extraction stage is treated for the removal of residual organic and is available for reuse as an etching solution when brought up to the necessary strength by addition of ammonia.

Inventors

  • 👤 Wayne D. Hamby
  • 👤 Marvin Dale Slade

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 17:22
CPC Classifications
C; C25; C25C; C25C1/00; C25C1/12; C23; C23F; C23F1/00; C23F1/46

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 249 words
A process for recovering copper values in metallic form from an aqueous, ammoniacal, etching solution containing the copper values along with chloride ions, said etching solution being derived from the etching of printed electronic circuit boards with a mixture of ammonium hydroxide and ammonium chloride, comprising the steps of: a. intimately mixing the etching solution with an organic medium containing an exchange reagent which is capable of selectively extracting copper and chloride ions from said solution, thereby producing a dispersion comprising an aqueous phase and an organic phase, the organic phase containing the exchange reagent, the copper ions, and the chloride ions; b. separating the phases of step (a); c. intimately mixing the organic phase of step (b) with an aqueous, weakly acidic, scrubbing solution which is capable of selectively stripping the chloride ions from the organic phase to produce a dispersion comprising an aqueous acidic phase containing the chlorides, and an organic phase containing the exchange reagent and copper ions substantially free of chloride ions; d. separating the phases of step (c); e. intimately mixing the organic phase of step (d) with an aqueous acidic stripping solution which is capable of stripping copper ions from the organic phase, thereby producing a dispersion comprising an aqueous phase containing the copper ions substantially free of chloride ions, and an organic phase containing the exchange reagent; f. separating the phases of step (e); and g. electrowinning metallic copper from the aqueous phase containing the copper ions substantially free of chloride ions.
Claim 2
Dependent Claim 249 words
A process for recovering copper values in metallic form from an aqueous, ammoniacal, etching solution containing the copper values along with chloride ions, said etching solution being derived from the etching of printed electronic circuit boards with a mixture of ammonium hydroxide and ammonium chloride, comprising the steps of: a. intimately mixing the etching solution with an organic medium containing an exchange reagent which is capable of selectively extracting copper and chloride ions from said solution, thereby producing a dispersion comprising an aqueous phase and an organic phase, the organic phase containing the exchange reagent, the copper ions, and the chloride ions; b. separating the phases of step (a); c. intimately mixing the organic phase of step (b) with an aqueous, weakly acidic, scrubbing solution which is capable of selectively stripping the chloride ions from the organic phase to produce a dispersion comprising an aqueous acidic phase containing the chlorides, and an organic phase containing the exchange reagent and copper ions substantially free of chloride ions; d. separating the phases of step (c); e. intimately mixing the organic phase of step (d) with an aqueous acidic stripping solution which is capable of stripping copper ions from the organic phase, thereby producing a dispersion comprising an aqueous phase containing the copper ions substantially free of chloride ions, and an organic phase containing the exchange reagent; f. separating the phases of step (e); and g. electrowinning metallic copper from the aqueous phase containing the copper ions substantially free of chloride ions.
Claim 3
Dependent Claim 22 words
A process in accordance with claim 1, wherein the etching solution is ammoniacal; and wherein the exchange reagent is an alpha-hydroxy oxime.
Claim 4
Dependent Claim 40 words
A process in accordance with claim 1, wherein the ammoniacal etching solution is derived from the etching of printed electronic circuit boards with a mixture of ammonium hydroxide and ammonium chloride; and wherein the exchange reagent is an alpha-hydroxy oxime.
Claim 5
Dependent Claim 33 words
A process in accordance with claim 1, wherein the aqueous phase of step (b) is treated for the removal of residual organic, so as to constitute a regenerated etching solution capable of reuse.
Claim 6
Dependent Claim 43 words
A process in accordance with claim 4, wherein residual organic is removed by allowing the aqueous phase of step (b) to settle, thereby separating the organic phase therein from the aqueous phase, and by removing the organic phase separately from the aqueous phase.
Claim 7
Dependent Claim 32 words
A process in accordance with claim 5, wherein the separately removed aqueous phase from the settled aqueous phase of step (b) is further treated for the removal of remaining traces of organic.
Claim 8
Dependent Claim 31 words
A process in accordance with claim 6, wherein the further treatment specified in that claim comprises passing the separately removed aqueous phase through a coalescer and, thereafter, through a carbon column.
Claim 9
Dependent Claim 22 words
A process in accordance with claim 4, wherein the regenerated etching solution is treated to bring it up to full etching strength.

References Cited (Backward Citations)

US3216873A Cited
US3224873A Cited
US3440036A Cited
US3761249A Cited
US3971652A Cited
US3844857A Cited
US3981966A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-04-10 1981-10-10 1982-04-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-04-10 1985-10-10 1986-04-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-04-10 1989-10-10 1990-04-11 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag