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Photovoltaic cell manufacture

Assignee: AT&T Inc
•
Filing: 1977-05-02
•
Granted: 1978-04-04
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Expires: 1997-05-02
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Abstract

Abstract A quality control technique is based on the observation that trapping centers contribute to inefficient operation of junction devices. Devices are irradiated by a first radiation source of intensity sufficient to populate traps and a second radiation source of varying wavelength. Trapping centers are detected by a deviation from the expected photovoltaic output-incident wavelength relationship. Such "structure" is utilized as the basis for altering production conditions to minimize currents of such centers. While the procedure is of general applicability, it is particularly suitable as applied to photovoltaic cells.

Inventors

  • 👤 Kuang-Chou Chang
  • 👤 Adam Heller
  • 👤 Barry Miller

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 21:00
CPC Classifications
H; H01; H01G; H01G9/00; H01G9/20; H10; H10F; H10F77/00; H10F77/95; H10F77/953; H10F77/955; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y10; Y10S; Y10S136/00; Y10S136/29

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 116 words
A method for production line quality control of junction devices comprising: selecting from time to time at least one of said junction devices; irradiating said junction device with an intense first light source; irradiating said junction device with a second light source; said second light source adaptable to produce light at at least one wavelength; measuring the photovoltaic output from said junction device at at least one wavelength, said measured wavelength corresponding to said incident wavelength, said measured photovoltaic output being indicative of the presence of functional imperfections in said junction device; comparing said measured photovoltaic output with the desired photovoltaic output; and setting the processing parameters for said junction devices in accordance with said comparison.
Claim 2
Independent Claim 116 words
A method for production line quality control of junction devices comprising: selecting from time to time at least one of said junction devices; irradiating said junction device with an intense first light source; irradiating said junction device with a second light source; said second light source adaptable to produce light at at least one wavelength; measuring the photovoltaic output from said junction device at at least one wavelength, said measured wavelength corresponding to said incident wavelength, said measured photovoltaic output being indicative of the presence of functional imperfections in said junction device; comparing said measured photovoltaic output with the desired photovoltaic output; and setting the processing parameters for said junction devices in accordance with said comparison.
Claim 3
Dependent Claim 28 words
A method as recited in claim 1 in which said second light source is chopped at a frequency less than the relaxation time associated with said functional imperfections.
Claim 4
Dependent Claim 18 words
A method as recited in claim 2 in which said frequency is between 2 Hertz and 3000 Hertz.
Claim 5
Dependent Claim 30 words
A method as recited in claim 1 in which said selecting step selects at least one of said junction devices after every change in processing parameters of said junction devices.
Claim 6
Dependent Claim 22 words
A method as recited in claim 1 in which said measuring step measures said photovoltaic output at at least two discrete wavelengths.
Claim 7
Dependent Claim 23 words
A method as recited in claim 5 in which said comparing step compares the ratios of said measured photovoltaic outputs at said wavelengths.
Claim 8
Dependent Claim 18 words
A method as recited in claim 1 in which said junction device is a semiconductor liquid junction photocell.
Claim 9
Dependent Claim 21 words
A method as recited in claim 7 in which said setting step affects the etching of the surface of said semiconductor.
Claim 10
Dependent Claim 24 words
A method as recited in claim 7 in which said selecting step selects at least one junction device after every change in etching solutions.
Claim 11
Dependent Claim 22 words
A method as recited in claim 1 in which said second light source is adaptable to produce light with continually varying wavelengths.
Claim 12
Dependent Claim 18 words
A method as recited in claim 9 in which said setting step occurs automatically after said comparing step.
Claim 13
Dependent Claim 21 words
A method as recited in claim 1 in which said first light source is adaptable to produce light of variable intensity.
Claim 14
Dependent Claim 18 words
A method as recited in claim 1 in which said setting step occurs automatically after said comparing step.

References Cited (Backward Citations)

US3150021A Cited
US3874959A Cited
US4039370A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-04-03 1981-10-03 1982-04-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-04-03 1985-10-03 1986-04-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-04-03 1989-10-03 1990-04-04 $7700.00 Window Closed / Lapsed

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