US4080723A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for making and using a group IV-VI semiconductor
Assignee: Ford Motor Co
•
Filing: 1977-03-25
•
Granted: 1978-03-28
•
Expires: 1997-03-25
Abstract
Abstract A method for making and using a group IV-VI photovoltaic semiconductor diode such that its capacitance is reduced substantially with respect to its capacitance if made and used according to prior art techniques. The capacitance reduction may be obtained without detrimental effect to the detectivity and noise levels of the diode. In the currently preferred form of the method, a thin film of p conductivity type semiconductor material, PbTe, is applied to (epitaxially grown on) a cleaved BaF2 substrate. A layer of Pb is deposited on the semiconductor material to form a diode having an n+ conductivity type region in the semiconductor material and a depletion region. When the PbTe semiconductor material is applied to the BaF2 substrate, its thickness is limited such that the depletion region extends to the boundary formed between the PbTe and BaF2 materials, either when the diode is formed or, preferably, when a backbias voltage, less than the diode reverse breakdown voltage, is applied across the p-n junction. The diode is particularly suitable for use as an infrared detector typically operated at 80 DEG K.
Inventors
- 👤 Henry Holloway
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 04:55
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/22; H10F30/221; H10F30/2218; H10F77/00; H10F77/10; H10F77/12; H10F77/127; Y; Y10; Y10S; Y10S438/00; Y10S438/93
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
129 words
A method for making and using a group IV-VI photovoltaic semiconductor diode comprising the steps of: applying, to a substrate of an insulating material, a thin film of a group IV-VI semiconductor material of p type or n type conductivity, a boundary thereby being formed between said insulating and semiconductor materials; in said semiconductor material and at a location therein spaced from said boundary, forming a region of conductivity type opposite to that of the bulk of said semiconductor material, a depletion region and a diode thereby being formed in said semiconductor material; causing said depletion region to extend to said boundary, thereby, to reduce substantially the capacitance of said diode relative to the capacitance said diode would have were said depletion region not to extend to said boundary.
Claim 2
Independent Claim
129 words
A method for making and using a group IV-VI photovoltaic semiconductor diode comprising the steps of: applying, to a substrate of an insulating material, a thin film of a group IV-VI semiconductor material of p type or n type conductivity, a boundary thereby being formed between said insulating and semiconductor materials; in said semiconductor material and at a location therein spaced from said boundary, forming a region of conductivity type opposite to that of the bulk of said semiconductor material, a depletion region and a diode thereby being formed in said semiconductor material; causing said depletion region to extend to said boundary, thereby, to reduce substantially the capacitance of said diode relative to the capacitance said diode would have were said depletion region not to extend to said boundary.
Claim 3
Dependent Claim
60 words
A method according to claim 1 wherein the thickness of said semiconductor material is limited such that a backbias voltage, including zero voltage and less than the reverse breakdown voltage of said diode, applied to said diode across said region of opposite conductivity type and said bulk of said semiconductor material, causes said depletion region to extend to said boundary.
Claim 4
Dependent Claim
95 words
A method according to claim 2 wherein said backbias voltage applied to said diode is approximately equal to or greater than the voltage V o defined by the equation: V.sub.o = (t.sup.2 Nq/2ε) - V.sub.bi wherein t is the thickness of said thin film of semiconductor material, N is the majority carrier concentration in said bulk of said semiconductor material, q is the unit positive charge equal in magnitude to the charge of an electron, ε is the static permittivity of said semiconductor material and V bi is the built-in voltage inherent in said diode.
Claim 5
Dependent Claim
62 words
A method according to claim 3 wherein said group IV-VI semiconductor material is a material selected from the group consisting of: PbS; PbSe; PbTe; Pb 1-x Sn x Te (0≦x ≦0.4); Pb 1-x Sn x Se (0≦x ≦ 0.2); PbSe 1-x Te x (0≦x≦1); PbS 1-x Se x (0≦x≦1); Pb 1-x Ge x Te (0≦x≦0.1); and Pb 1-x Cd x Te (0≦x≦0.1).
Claim 6
Dependent Claim
40 words
A method according to claim 4 wherein said region of conductivity type opposite to that of the bulk of said semiconductor material is of n+ conductivity type and wherein the bulk of said semiconductor material is of p conductivity type.
Claim 7
Dependent Claim
30 words
A method according to claim 5 wherein said region of n+ conductivity type is formed by depositing Pb on the surface of said semiconductor material remote from said insulating material.
Claim 8
Dependent Claim
12 words
A method according to claim 5 wherein said semiconductor material is PbTe.
Claim 9
Dependent Claim
12 words
A method according to claim 6 wherein said semiconductor material is PbTe.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-03-27 | 1981-09-26 | 1982-03-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-03-27 | 1985-09-26 | 1986-03-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-03-27 | 1989-09-26 | 1990-03-28 | $7700.00 | Window Closed / Lapsed |