US4069076A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Liquid lamination process
Assignee: EIDP Inc
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Filing: 1976-11-29
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Granted: 1978-01-17
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Expires: 1996-11-29
Abstract
Abstract The process of this invention applies a photoresist film to a preimaged patterned relief substrate wherein the height of the relief image is at least 0.00004 inch (0.001 mm) and the thickness of the photoresist film is at least one third the thickness of the relief image height. Prior to the application of the photoresist film, the patterned relief substrate is flooded with a swelling agent for the photoresist, the depth of flooding being at least to cover the relief height. The process can occur at room temperature.
Inventors
- 👤 Michael Glenn Fickes
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 17:06
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/161; B; B32; B32B; B32B37/00; B32B37/0038; H; H05; H05K; H05K3/00; H05K3/22; H05K3/28; H05K3/281; B32B2457/00; B32B2457/08; H05K2203/00; H05K2203/06; H05K2203/068; H05K2203/07; H05K2203/0779; H05K2203/0783; H05K3/0073; H05K3/0079; Y; Y10; Y10S; Y10S430/00; Y10S430/136
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
81 words
In a process for applying a photoresist film to a preimaged, patterned relief substrate wherein the height of the relied image is at least 0.0004 inch and the thickness of the photoresist film is at least one third the thickness of the relief image height, the improvement comprising flooding with a solvent or non-solvent swelling agent the patterned relief substrate to a depth of swelling agent at least to cover the relief height prior to the application of said photoresist film.
Claim 2
Dependent Claim
81 words
In a process for applying a photoresist film to a preimaged, patterned relief substrate wherein the height of the relied image is at least 0.0004 inch and the thickness of the photoresist film is at least one third the thickness of the relief image height, the improvement comprising flooding with a solvent or non-solvent swelling agent the patterned relief substrate to a depth of swelling agent at least to cover the relief height prior to the application of said photoresist film.
Claim 3
Dependent Claim
15 words
A process according to claim 1 wherein said photoresist film is applied at room temperature.
Claim 4
Dependent Claim
18 words
A process according to claim 1 wherein the height of the relief image is at least 0.0001 inch.
Claim 5
Dependent Claim
25 words
A process according to claim 1 wherein any excess swelling agent is squeezed off the relief substrate at the time the resist film is applied.
Claim 6
Dependent Claim
17 words
A process according to claim 4 wherein the excess swelling agent is absorbed by an absorbent carrier.
Claim 7
Dependent Claim
17 words
A process according to claim 1 wherein said swelling agent is a non-solvent for the photoresist film.
Claim 8
Dependent Claim
14 words
A process according to claim 1 wherein the photoresist film comprises a photohardenable layer.
Claim 9
Dependent Claim
22 words
A process according to claim 7 wherein the photohardenable composition is taken from the group consisting of photopolymerizable, photocrosslinkable and photodimerizable compositions.
Claim 10
Dependent Claim
12 words
A process according to claim 8 wherein the photohardenable composition is photopolymerizable.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-01-16 | 1981-07-18 | 1982-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-01-16 | 1985-07-18 | 1986-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-01-16 | 1989-07-18 | 1990-01-17 | $7700.00 | Window Closed / Lapsed |