Patent US4064885A successfully refreshed from Google Patents.
US4064885A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for cleaning workpieces by ultrasonic energy
Assignee: Branson Ultrasonics Corp
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Filing: 1976-10-26
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Granted: 1977-12-27
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Expires: 1996-10-26
Abstract
Abstract A delicate workpiece, such as a semiconductor wafer is cleaned by supporting the workpiece on a shaft which is rotated. A film of liquid solvent is caused to continuously flow across the exposed workpiece surface while the workpiece is in rotation and ultrasonic energy is applied to the liquid film for causing cavitation in the solvent, thereby effecting cleaning of the workpiece surface. Upon shutting off the solvent and the ultrasonic energy, the workpiece is dried by spinning it at high speed.
Inventors
- 👤 Jean G. M. Dussault
- 👤 Robert A. Geckle
- 👤 William L. Puskas
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 12:00
CPC Classifications
B; B08; B08B; B08B3/00; B08B3/04; B08B3/10; B08B3/12; Y; Y10; Y10S; Y10S134/00; Y10S134/902
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
142 words
Apparatus for cleaning a workpiece, such as a semiconductor wafer, comprising: a rotatable support including means for holding a workpiece on said support; means coupled to said support for rotating said support to cause a workpiece disposed on said support to undergo rotation; means for flooding the exposed side of the workpiece with a flowing film of cleaning solvent; mounting means disposed for supporting electroacoustic transducer means opposite said exposed side; electroacoustic transducer means coupled to said mounting means for providing, when said transducer means is energized, ultrasonic energy to said flowing film of solvent and causing cavitation therein for cleaning said exposed workpiece side; electrical generating means coupled for energizing said transducer means, and control means coupled to said means for rotating, said means for flooding and said electrical generating means for providing operation of said respective means in predetermined sequence.
Claim 2
Dependent Claim
142 words
Apparatus for cleaning a workpiece, such as a semiconductor wafer, comprising: a rotatable support including means for holding a workpiece on said support; means coupled to said support for rotating said support to cause a workpiece disposed on said support to undergo rotation; means for flooding the exposed side of the workpiece with a flowing film of cleaning solvent; mounting means disposed for supporting electroacoustic transducer means opposite said exposed side; electroacoustic transducer means coupled to said mounting means for providing, when said transducer means is energized, ultrasonic energy to said flowing film of solvent and causing cavitation therein for cleaning said exposed workpiece side; electrical generating means coupled for energizing said transducer means, and control means coupled to said means for rotating, said means for flooding and said electrical generating means for providing operation of said respective means in predetermined sequence.
Claim 3
Dependent Claim
16 words
Apparatus for cleaning as set forth in claim 1, said means for holding comprising vacuum means.
Claim 4
Dependent Claim
47 words
Apparatus for cleaning as set forth in claim 1, said means coupled to said support for rotating said support adapted to rotate said support at a first speed when said transducer means is energized and at a second speed when said means for flooding is not operated.
Claim 5
Dependent Claim
24 words
Apparatus for cleaning as set forth in claim 1, said support being constructed to hold the exposed workpiece side in a substantially horizontal plane.
Claim 6
Dependent Claim
26 words
Apparatus for cleaning as set forth in claim 1, and means disposed for draining the solvent after flowing over the exposed workpiece side and recirculating it.
Claim 7
Dependent Claim
18 words
Apparatus for cleaning as set forth in claim 1, said transducer means being enclosed in a metallic housing.
Claim 8
Dependent Claim
27 words
Apparatus for cleaning as set forth in claim 1, said transducer means being adapted to operate at a frequency in the range from 20 to 100 kHz.
Claim 9
Dependent Claim
41 words
Apparatus for cleaning as set forth in claim 1, said mounting means disposed for supporting said transducer means including motion means for moving said transducer means from a position opposite said exposed side to a position free from said exposed side.
Claim 10
Dependent Claim
23 words
Apparatus for cleaning as set forth in claim 8, said motion means including pivotable means and actuating means coupled to said pivotable means.
Claim 11
Dependent Claim
22 words
Apparatus for cleaning as set forth in claim 1, the thickness of said film of cleaning solvent being less than six mm.
Claim 12
Dependent Claim
16 words
Apparatus for cleaning as set forth in claim 1, said control means comprising automatic sequencing means.
Claim 13
Dependent Claim
25 words
Apparatus for cleaning as set forth in claim 1, the spacing between said exposed side of the workpiece and said transducer means being substantially uniform.
Claim 14
Dependent Claim
147 words
Apparatus for cleaning a workpiece, such as a semiconductor wafer, comprising: a rotatable support including means for holding a workpiece on said support; means for flooding the exposed side of the workpiece with a flowing film of cleaning solvent; mounting means disposed for supporting electroacoustic transducer means opposite said exposed side; electroacoustic transducer means coupled to said mounting means for providing, when said transducer means is energized, ultrasonic energy to said flowing film of solvent and causing cavitation therein for cleaning said exposed workpiece side; electrical generating means coupled for energizing said transducer means; means coupled to said support for rotating said support at a speed sufficient to effect solvent removal from the exposed workpiece side by centrifugal force, and control means coupled to said means for flooding, said electrical generating means and said means for rotating for providing operation of said respective means in predetermined sequence.
Claim 15
Dependent Claim
147 words
Apparatus for cleaning a workpiece, such as a semiconductor wafer, comprising: a rotatable support including means for holding a workpiece on said support; means for flooding the exposed side of the workpiece with a flowing film of cleaning solvent; mounting means disposed for supporting electroacoustic transducer means opposite said exposed side; electroacoustic transducer means coupled to said mounting means for providing, when said transducer means is energized, ultrasonic energy to said flowing film of solvent and causing cavitation therein for cleaning said exposed workpiece side; electrical generating means coupled for energizing said transducer means; means coupled to said support for rotating said support at a speed sufficient to effect solvent removal from the exposed workpiece side by centrifugal force, and control means coupled to said means for flooding, said electrical generating means and said means for rotating for providing operation of said respective means in predetermined sequence.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-12-26 | 1981-06-27 | 1981-12-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-12-26 | 1985-06-27 | 1985-12-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-12-26 | 1989-06-27 | 1989-12-27 | $7700.00 | Window Closed / Lapsed |