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Colloidal polyamic acid electrodeposition compositions and process for preparing said compositions

Assignee: Westinghouse Electric Corp
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Filing: 1975-04-24
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Granted: 1977-10-11
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Expires: 1995-04-24
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Abstract

Abstract A conducting non-aqueous colloidal polyamic acid electrodeposition composition is made by reacting (1) 1 part polyamic acid and 29-37 parts non-aqueous, organic solvent for the acid with (2) 0.8-1.2 parts of a nitrogen containing base to form an organic salt which is added to 50-150 parts of a non-aqueous, organic non-electrolizable, non-solvent for the acid salt.

Inventors

  • 👤 David C. Phillips

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 20:08
CPC Classifications
C; C09; C09D; C09D5/00; C09D5/44; C09D5/4419; C09D5/4461; C08; C08G; C08G73/00; C08G73/06; C08G73/10; C08G73/1003; C08G73/1007; C08G73/1028; C08G73/1032; C08L; C08L79/00; C08L79/04; C08L79/08

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 140 words
A method of making a nonaqueous, colloidal, polyamic acid electrodeposition composition comprising the steps of: A. providing a salt solution comprising: 1 part by weight of organic aromatic polyamic acid, about 29-37 parts by weight of a non-aqueous, organic, non-electrolizable, aprotic solvent for the polyamic acid and an amount of nitrogen containing base, selected from the group consisting of tertiary amines and imidazoles effective to form an organic acid salt, and B. adding the salt solution to about 50-150 parts by weight of a non-aqueous, organic, non-electrolizable, non-solvent for the salt which is not capable of dissolving the acid salt, to provide a colloidal dispersion of the salt within the solvent mixture, the composition having a pH of between 8-10 and a solids content of between about 0.5 wt.% to about 1.5 wt.% based on polyamic acid and total solvent.
Claim 2
Independent Claim 140 words
A method of making a nonaqueous, colloidal, polyamic acid electrodeposition composition comprising the steps of: A. providing a salt solution comprising: 1 part by weight of organic aromatic polyamic acid, about 29-37 parts by weight of a non-aqueous, organic, non-electrolizable, aprotic solvent for the polyamic acid and an amount of nitrogen containing base, selected from the group consisting of tertiary amines and imidazoles effective to form an organic acid salt, and B. adding the salt solution to about 50-150 parts by weight of a non-aqueous, organic, non-electrolizable, non-solvent for the salt which is not capable of dissolving the acid salt, to provide a colloidal dispersion of the salt within the solvent mixture, the composition having a pH of between 8-10 and a solids content of between about 0.5 wt.% to about 1.5 wt.% based on polyamic acid and total solvent.
Claim 3
Dependent Claim 53 words
The method of claim 1 wherein about 0.8-1.2 parts of nitrogen containing base is added in step (A) for each 1 part of polyamic acid, the non-solvent for the salt is a ketone, and the solvent for the polyamic acid is selected from the group consisting of N,N-dialkylcarboxylamides, dimethylsulfoxide, pyridine and mixtures thereof.
Claim 4
Dependent Claim 84 words
The method of claim 2 wherein the nitrogen containing base is selected from the group consisting of trimethyl amine, triethylamine, N, N-dimethylbenzylamine, tri-n-propylamine, tri-n-butylamine, N-ethylpiperidine, N-allylpiperidine, N-ethylmorpholine, N,N-diethyl-m-toluidine, N,N-diethyl-p-toluidine, N-allylmorpholine, N,N-diethylaniline pyridine, imidazole, 1-methylimadazole, 4-methylimidazole, 5-methylimidazole, 1-propylimidazole, 1,2-dimethylimidazole, 1-ethyl-2-methylimidazole and 1-phenylimidazole and the non-solvent for the salt is selected from the group of ketones consisting of acetone, methyl isobutyl ketone, methyl ethyl ketone, methyl n-propyl ketone, diethyl ketone, mesityl oxide, cyclohexanone, methyl-n-butyl ketone, ethyl-n-butyl ketone, methyl-n-amyl ketone, acetophenone, methyl-n-hexyl ketone, isophorone and di-isobutyl ketone.
Claim 5
Dependent Claim 128 words
A colloidal polyamic acid electrodeposition composition comprising a colloidal dispersion of organic acid salt within a solvent mixture, said acid salt being the reaction product of 1 part by weight of organic aromatic polyamic acid and about 0.8-1.2 parts by weight of nitrogen containing base, selected from the group consisting of tertiary amines and imidazoles, and said solvent mixture comprising about 29-37 parts by weight of a non-aqueous organic, non-electrolizable, aprotic solvent for the polyamic acid and about 50-150 parts by weight of a non-aqueous, organic, non-electrolizable non-solvent for the salt which is not capable of dissolving the acid salt, the composition having a pH of between 8-10 and a solids content of between about 0.5 wt.% to about 1.5 wt.% based on polyamic acid and total solvent.
Claim 6
Dependent Claim 128 words
A colloidal polyamic acid electrodeposition composition comprising a colloidal dispersion of organic acid salt within a solvent mixture, said acid salt being the reaction product of 1 part by weight of organic aromatic polyamic acid and about 0.8-1.2 parts by weight of nitrogen containing base, selected from the group consisting of tertiary amines and imidazoles, and said solvent mixture comprising about 29-37 parts by weight of a non-aqueous organic, non-electrolizable, aprotic solvent for the polyamic acid and about 50-150 parts by weight of a non-aqueous, organic, non-electrolizable non-solvent for the salt which is not capable of dissolving the acid salt, the composition having a pH of between 8-10 and a solids content of between about 0.5 wt.% to about 1.5 wt.% based on polyamic acid and total solvent.
Claim 7
Dependent Claim 14 words
The composition of claim 4 wherein the non-solvent for the salt is a ketone.
Claim 8
Dependent Claim 82 words
The compositions of claim 5 wherein the nitrogen containing base is selected from the group consisting of trimethylamine, triethylamine, N,N-dimethylbenzylamine, tri-n-propylamine, tri-n-butylamine, N-ethylpiperidine, N-allylpiperidine, N-ethylmorpholine, N,N-diethyl-m-toluidine, N,N-diethyl-p-toluidine, N-allylmorpholine, N,N-diethylaniline pyridine, imidazole, 1-methyl-imidazole, 4-methylimidazole, 5-methylimidazole, 1-propylimidazole, 1,2-dimethylimidazole, 1-ethyl-2-methylimidazole and 1-phenylimidazole and the non-solvent for the salt is selected from the group of ketones consisting of acetone, methyl isobutyl ketone, methyl ethyl ketone, methyl n-propyl ketone, diethyl ketone, mesityl oxide, cyclohexanone, methyl-n-butyl ketone, ethyl-n-butyl ketone, methyl-n-amyl ketone, acetophenone, methyl-n-hexyl ketone, isophorone and di-isobutyl ketone.
Claim 9
Dependent Claim 123 words
The composition of claim 4 wherein the polyamic acid is selected from the group of polyamic acids having the structure: ##STR11## wherein n is at least 15, R is at least one tetravalent organic radical selected from the group consisting of: ##STR12## R 2 being selected from the group consisting of divalent aliphatic hydrocarbon radicals having from 1 to 4 carbon atoms and carbonyl, oxy, sulfo and sulfonyl radicals, R 1 is at least one divalent radical selected from the group consisting of: ##STR13## in which R 3 is a divalent organic radical selected from the group consisting of R 2 , silico and amido radicals and in which R 4 is selected from the group consisting of: --H, alkyl and aryl radicals.
Claim 10
Dependent Claim 25 words
The composition of claim 7 wherein the solvent for the acid is selected from the group consisting of N,N-dialkylcarboxylamides, dimethyl sulfoxide, pyridine and mixtures thereof.
Claim 11
Dependent Claim 30 words
The composition of claim 7 wherein the solvent for the acid is selected from the group consisting of dimethyl acetamide, dimethyl formamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide and pyridine and mixtures thereof.
Claim 12
Dependent Claim 15 words
The composition of claim 7 also containing an effective amount of finely divided filler particles.
Claim 13
Dependent Claim 21 words
The composition of claim 7 wherein R is at least one tetravalent organic radical selected from the group consisting of: ##STR14##
Claim 14
Dependent Claim 10 words
The composition of claim 11 wherein R 1 is ##STR15##
Claim 15
Dependent Claim 139 words
A colloidal polyamic acid electrodeposition composition comprising a colloidal dispersion of organic acid salt within a solvent mixture, said acid salt comprising 1 part by weight of organic aromatic polyamic acid and an amount of 1 methyl imidazole effective to form an organic acid salt, said solvent mixture comprising about 29-37 parts by weight of an organic solvent for the polyamic acid selected from the group consisting of dimethylsulfoxide, N-methyl-2-pyrrolidone and mixtures thereof and about 50-150 parts by weight of an organic non-solvent for the salt which is not capable of dissolving the salt selected from the group consisting of methyl ethyl ketone, acetone and mixtures thereof, wherein the pH of the composition is between 8-10, and the solids content of the composition is between about 0.5 wt.% to about 1.5 wt.% based on polyamic acid and total solvent.
Claim 16
Dependent Claim 139 words
A colloidal polyamic acid electrodeposition composition comprising a colloidal dispersion of organic acid salt within a solvent mixture, said acid salt comprising 1 part by weight of organic aromatic polyamic acid and an amount of 1 methyl imidazole effective to form an organic acid salt, said solvent mixture comprising about 29-37 parts by weight of an organic solvent for the polyamic acid selected from the group consisting of dimethylsulfoxide, N-methyl-2-pyrrolidone and mixtures thereof and about 50-150 parts by weight of an organic non-solvent for the salt which is not capable of dissolving the salt selected from the group consisting of methyl ethyl ketone, acetone and mixtures thereof, wherein the pH of the composition is between 8-10, and the solids content of the composition is between about 0.5 wt.% to about 1.5 wt.% based on polyamic acid and total solvent.

References Cited (Backward Citations)

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US3463714A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-10-10 1981-04-11 1981-10-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-10-10 1985-04-11 1985-10-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-10-10 1989-04-11 1989-10-11 $7700.00 Window Closed / Lapsed

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