US4042387A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photolithographic method of making microcircuits using glycerine in photoresist stripping solution
Assignee: Boeing North American Inc
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Filing: 1976-05-05
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Granted: 1977-08-16
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Expires: 1996-05-05
Abstract
Abstract Following the generation of a pattern in a photoresist layer on a non-metallic wafer and development and rinsing thereof, the wafer is slightly etched and immediately metallized. The developed photoresist portions are softened in a stripper solved in methanol, and the unwanted metallization portions are lifted by boiling the wafer in an acetone-lubricant bath. The same liquid is used for a mild scrubbing followed by spraying the wafer in pure acetone.
Inventors
- 👤 Umit Tarakci
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 16:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
US2127469A
Cited
US3443915A
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US3520683A
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US3813309A
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US3676219A
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US3787239A
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US3945826A
Cited
US3871929A
Cited
US3900337A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-08-15 | 1981-02-14 | 1981-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-08-15 | 1985-02-14 | 1985-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-08-15 | 1989-02-14 | 1989-08-16 | $7700.00 | Window Closed / Lapsed |