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US4038157A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of hermetically sealing semiconductor devices

Assignee: United States Department of the Air Force
•
Filing: 1976-04-16
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Granted: 1977-07-26
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Expires: 1996-04-16
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Abstract

Abstract A method of hermetically sealing semiconductor devices utilizes a dielectric tube with a two step structure at one end. The tube is used to surround a semiconductor. The two step end of the tube is metallized. The other end of the tube is flat and is brazed onto a metal stud so that the semiconductor is in the center of the brazed joint. A metal lid is painted with a conductive material and then placed into a rim formed by the two step end. When the paint dries, a metal layer is electrodeposited at the top of the lid and tube.

Inventors

  • 👤 Chung K. Kim
  • 👤 Yung L. Cho

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 06:42
CPC Classifications
H; H10; H10W; H10W72/00; H10W72/071; H10W44/00; H10W44/20

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 226 words
An electroplated microwave encapsulation process for a semiconductor being comprised of the step of forming a dielectric sleeve of ceramic for microwave utilization having an inner and outer circumference, a two step structure at one end and a flat surface at the other end, the two step structure having the first step thereof extending partially outwardly from the inner circumference toward the outer circumference of the dielectric sleeve, the first and second step being interconnected to form a rim, the step of metallizing with platinum the surfaces of the two step structure, the flat end of the dielectric sleeve and the outer circumference of the dielectric sleeve, the step of brazing the metallized dielectric flat end onto a metal stud in the form of a brazed joint with said semiconductor being positioned in the center of the brazed joint, painting the surface of the first step and the rim with a viscose conductive material, placing a metal lid having a top surface with said first step and fitting tightly into said rim, said top surface of said metal lid and said second step providing a flush surface, the step of electroforming a metal layer on said flush surface after the hardening of said viscose conductive material, and the step of gold barrel plating for final gold finishing on the entire metal surface exposed to the air.
Claim 2
Dependent Claim 226 words
An electroplated microwave encapsulation process for a semiconductor being comprised of the step of forming a dielectric sleeve of ceramic for microwave utilization having an inner and outer circumference, a two step structure at one end and a flat surface at the other end, the two step structure having the first step thereof extending partially outwardly from the inner circumference toward the outer circumference of the dielectric sleeve, the first and second step being interconnected to form a rim, the step of metallizing with platinum the surfaces of the two step structure, the flat end of the dielectric sleeve and the outer circumference of the dielectric sleeve, the step of brazing the metallized dielectric flat end onto a metal stud in the form of a brazed joint with said semiconductor being positioned in the center of the brazed joint, painting the surface of the first step and the rim with a viscose conductive material, placing a metal lid having a top surface with said first step and fitting tightly into said rim, said top surface of said metal lid and said second step providing a flush surface, the step of electroforming a metal layer on said flush surface after the hardening of said viscose conductive material, and the step of gold barrel plating for final gold finishing on the entire metal surface exposed to the air.
Claim 3
Dependent Claim 30 words
An electroplated microwave encapsulation process as described in claim 1 wherein the covering of the surfaces of the first step and the rim includes a viscose conductive of silver epoxy.

References Cited (Backward Citations)

US227370A Cited
US1090456A Cited
DE1195143B Cited
US2980829A Cited
US3932227A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-07-25 1981-01-24 1981-07-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-07-25 1985-01-24 1985-07-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-07-25 1989-01-24 1989-07-26 $7700.00 Window Closed / Lapsed

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