Patent US2857587A successfully refreshed from Google Patents.
Patent US4035655A successfully refreshed from Google Patents.
US4035655A
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US
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Method and a device for implantation of particles into a substrate
Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1976-01-19
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Granted: 1977-07-12
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Expires: 1996-01-19
Abstract
Abstract Implantation of particles and especially ions is carried out by directing a particle beam onto a target and sweeping the beam in two directions at right angles. The target is subjected to a double movement of rotation about two axes which are substantially parallel to the direction of the particle beam. All the points of the target thus describe an epicycloid and are subjected to implantation by the particle beam.
Inventors
- 👤 Georges Guernet
- 👤 Georges Lefeuvre
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 15:52
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3171; C; C23; C23C; C23C14/00; C23C14/22; C23C14/50; C23C14/505; H10; H10P; H10P72/00; H10P72/50
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
88 words
A method of implantation and especially ion implantation in which a beam of particles and especially an ion beam is directed onto a target in order to carry out an ion implantation into said target, said beam of particles being swept in two perpendicular directions, wherein said target is subjected to a double movement of rotation about two axes substantially parallel to the direction of the particle beam so that all the points of the target describe an epicycloid and are subjected to implantation by said particle beam.
Claim 2
Independent Claim
88 words
A method of implantation and especially ion implantation in which a beam of particles and especially an ion beam is directed onto a target in order to carry out an ion implantation into said target, said beam of particles being swept in two perpendicular directions, wherein said target is subjected to a double movement of rotation about two axes substantially parallel to the direction of the particle beam so that all the points of the target describe an epicycloid and are subjected to implantation by said particle beam.
Claim 3
Dependent Claim
26 words
A method according to claim 1, wherein the target is set at a predetermined angle of inclination with respect to the direction of the particle beam.
Claim 4
Dependent Claim
17 words
A method according to claim 2, wherein said angle is within the range of 0° to 15°.
Claim 5
Dependent Claim
129 words
A device for ion implantation in a vacuum for the practical application of the method according to claim 1, wherein said device comprises: a motor M for driving a shaft which extends through a vacuum-tight passage and couples said motor to a carrier-plate P located within a vacuum chamber, means for deflecting a particle beam in two directions substantially perpendicular to the shaft, a circular toothed rack rigidly fixed to the vacuum chamber and coaxial with the chamber A, a toothed wheel being disposed in meshing engagement with said toothed rack, a second shaft A' which is the shaft of the toothed wheel and passes through the carrier-plate P within a guide bush, said second shaft being adapted to support a carrier-plate P' on which the target-samples are placed.
Claim 6
Dependent Claim
25 words
A device according to claim 4, wherein the target-sample carrier-plate and its rotary shaft are rigidly fixed and orientable with respect to the incident beam.
Claim 7
Dependent Claim
40 words
A device according to claim 4 wherein said device comprises a mechanical arm for successively extracting the target-samples from a magazine in order to place said samples on said carrier-plate and for replacing said targets in the magazine after implantation.
Claim 8
Dependent Claim
28 words
A device according to claim 6, wherein said target samples are rigidly fixed to a sample-carrier provided with a magnet and wherein said carrier-plate is of ferromagnetic material.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-07-11 | 1981-01-10 | 1981-07-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-07-11 | 1985-01-10 | 1985-07-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-07-11 | 1989-01-10 | 1989-07-12 | $7700.00 | Window Closed / Lapsed |