Patent US4030940A successfully refreshed from Google Patents.
US4030940A
Expired / Lapsed
US
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Method of producing fine disperse alkylated silica compounds
Assignee: Individual
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Filing: 1975-11-03
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Granted: 1977-06-21
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Expires: 1995-11-03
Abstract
Abstract A method of producing fine-disperse alkylated silica compounds, characterized in that starting fine-disperse silica is subjected to treatment with water vapors at a temperature of 110°-120° C to attain the humidification degree of from 2 to 40 micromoles H 2 O/m 2 SiO 2 , the thus humidified silica being then treated with vapors of alkylchlorosilane at a temperature of 250° to 310° C. The method of the invention allows controlling the concentration of grafted alkyl groups in the resultant product within the range of from 4.7 to 8.0 micromoles of grafted alkyl groups per m 2 of the surface of SiO 2 . Starting silica can be modified with oxides of metals, such as aluminium, titanium, iron or zirconium oxides, the resultant products exhibiting good hydrophobic properties when used as thickeners for lubrication materials.
Inventors
- 👤 Alexei Alexeevich Chuiko
- 👤 Valentin Anatolievich Tertykh
- 👤 Vilyam Alexandrovich Sobolev
- 👤 Valery Mikhailovich Maschenko
- 👤 Vyacheslav Valentinovich Pavlov
- 👤 Alexei Dmitrievich Chugai
- 👤 Nikolai Vasilievich Khaber
- 👤 Anatoly Borisovich Kondratenko
- 👤 Vasily Ivanovich Vatamanjuk
- 👤 Mikhail Ivanovich Khoma
- 👤 Alexandr Nikolaevich Kutin
- 👤 Jury Davydovich Shaposhnikov
- 👤 Malvina Leontievna Galashina
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 21:50
CPC Classifications
C; C09; C09C; C09C3/00; C09C3/12; C09C1/00; C09C1/28; C09C1/30; C09C1/3081; C01; C01P; C01P2004/00; C01P2004/80; C01P2004/82; C01P2006/00; C01P2006/80
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
88 words
A method of producing fine-disperse alkylated silica and controlling the concentration of grafted alkyl groups on said silica, comprising the steps of treating fine-disperse silica with vapours of water at a temperature of 110°-120° C to a humidification degree ranging from 2 to 40 micromoles H 2 O/m 2 SiO 2 ; treating the thus humidified fine-disperse silica with vapours of alkylchlorosilane at a temperature of 250°-310° C in a fluidized bed; isolating the resultant fine-disperse alkylated silica from gaseous reaction products at a temperature of 390°-400° C.
Claim 2
Independent Claim
88 words
A method of producing fine-disperse alkylated silica and controlling the concentration of grafted alkyl groups on said silica, comprising the steps of treating fine-disperse silica with vapours of water at a temperature of 110°-120° C to a humidification degree ranging from 2 to 40 micromoles H 2 O/m 2 SiO 2 ; treating the thus humidified fine-disperse silica with vapours of alkylchlorosilane at a temperature of 250°-310° C in a fluidized bed; isolating the resultant fine-disperse alkylated silica from gaseous reaction products at a temperature of 390°-400° C.
Claim 3
Independent Claim
48 words
A method as claimed in claim I, wherein for producing fine-disperse alkylated silica with the degree of grafting alkyl groups equal to 4.7 micromoles per m 2 SiO 2 , humidification of silica is conducted to the value of 2 micromoles H 2 O/m 2 SiO 2 .
Claim 4
Dependent Claim
48 words
A method as claimed in claim 1, wherein for producing fine-disperse alkylated silica with the degree of grafting alkyl groups equal to 6.7 micromoles per m 2 SiO 2 , humidification of silica is conducted to the value of 20 micromoles H 2 O/m 2 SiO 2 .
Claim 5
Independent Claim
48 words
A method as claimed in claim I, wherein for producing fine-disperse alkylated silica with the degree of grafting alkyl groups equal to 8 micromoles per m 2 SiO 2 , humidification of silica is conducted to the value of 40 micromoles H 2 O/m 2 SiO 2 .
Claim 6
Independent Claim
18 words
A method as claimed in claim I, wherein silica modified with metal oxides is used as fine-disperse silica.
Claim 7
Dependent Claim
29 words
A method as claimed in claim 5, wherein the content of said modifying metal oxides or of a mixture thereof in the fine-disperse silica is 0.5 to 5 wt.%.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-06-20 | 1980-12-20 | 1981-06-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-06-20 | 1984-12-20 | 1985-06-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-06-20 | 1988-12-20 | 1989-06-21 | $7700.00 | Window Closed / Lapsed |