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Method of producing a doped zone of a given conductivity type in a semiconductor body

Assignee: Siemens AG
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Filing: 1975-06-18
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Granted: 1977-06-14
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Expires: 1995-06-18
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Abstract

Abstract The "emitter-dip effect" is eliminated by applying a layer of an undoped polycrystalline semiconductor onto the surface of a select zone to be doped in a semiconductor body, for example, such as on the emitter zone of a silicon body and then diffusing a select dopant through the undoped polycrystalline semiconductor layer into the select zone of the semiconductor body.

Inventors

  • 👤 Andreas Glasl
  • 👤 Helmuth Murrmann

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 08:16
CPC Classifications
H; H10; H10P; H10P95/00; H10D; H10D99/00; H10P32/00; H10P32/10; H10P32/14; H10P32/1408; H10P32/1414; H10P32/17; H10P32/171; Y; Y10; Y10S; Y10S438/00; Y10S438/914; Y10S438/923

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 68 words
In a process of producing a n-conductivity type doped zone in a silicon semiconductor body wherein a silicon polycrystalline semiconductor layer is deposited on the surface of the zone to be doped, the improvement comprising: depositing an undoped silicon polycrystalline semiconductor layer on the surface of the zone to be doped; and diffusing PH 3 through said undoped polycrystalline layer and into said zone in the semiconductor body.
Claim 2
Dependent Claim 68 words
In a process of producing a n-conductivity type doped zone in a silicon semiconductor body wherein a silicon polycrystalline semiconductor layer is deposited on the surface of the zone to be doped, the improvement comprising: depositing an undoped silicon polycrystalline semiconductor layer on the surface of the zone to be doped; and diffusing PH 3 through said undoped polycrystalline layer and into said zone in the semiconductor body.

References Cited (Backward Citations)

US3621346A Cited
US3703420A Cited
US3719535A Cited
US3897282A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-06-13 1980-12-13 1981-06-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-06-13 1984-12-13 1985-06-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-06-13 1988-12-13 1989-06-14 $7700.00 Window Closed / Lapsed

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