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US4028207A Expired / Lapsed US ⏱️ 0.0 years remaining

Measuring arrangements

Assignee: Post Office
•
Filing: 1975-05-16
•
Granted: 1977-06-07
•
Expires: 1995-05-16
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Abstract

Abstract The electrochemical measuring technique of the present invention employs, as the barrier material, a concentrated electrolyte, which also forms a medium for the controlled dissolution of a surface of the semiconductor so as to provide a continuous depth profile. The depth profile characteristic may be determined by capacitance-voltage measurements on n-type bulk GaAs, using KOH as the electrolyte.

Inventors

  • 👤 Marc Marian Faktor
  • 👤 Thomas Ambridge
  • 👤 Ean Grant Bremner

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 21:16
CPC Classifications
G; G01; G01R; G01R31/00; G01R31/26; G01R31/2607; G01R31/2637; G01N; G01N27/00; G01N27/02; G01N27/22; G01N27/227; H; H10; H10P; H10P74/00; H10P74/20; H10P74/207

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 167 words
Apparatus for determining the carrier concentration as a function of depth in a semiconductor material by measuring the capacitance of a Schottky diode depletion layer formed in the semiconductor, said apparatus comprising an electrolytic cell arranged to contain electrolyte, means for mounting the semiconductor material in the cell so that a surface of the semiconductor can contact the electrolyte, the junction of said semiconductor and electrolyte forming said Schottky diode and said electrolyte in use progressively etching the surface area of the semiconductor material, masking means defining an area of the semiconductor material in contact with the electrolyte, electrical contact means for contacting the semiconductor, means for applying a d.c. voltage to said electrical contact means, electrode means for applying a d.c. voltage to said electrolyte, means for measuring the d.c. current through the electrolyte, means for applying an a.c. voltage to said Schottky diode, and a capacitance measuring unit responsive to said a.c. voltage for measuring the capacitance of the depletion layer of the Schottky diode.
Claim 2
Dependent Claim 167 words
Apparatus for determining the carrier concentration as a function of depth in a semiconductor material by measuring the capacitance of a Schottky diode depletion layer formed in the semiconductor, said apparatus comprising an electrolytic cell arranged to contain electrolyte, means for mounting the semiconductor material in the cell so that a surface of the semiconductor can contact the electrolyte, the junction of said semiconductor and electrolyte forming said Schottky diode and said electrolyte in use progressively etching the surface area of the semiconductor material, masking means defining an area of the semiconductor material in contact with the electrolyte, electrical contact means for contacting the semiconductor, means for applying a d.c. voltage to said electrical contact means, electrode means for applying a d.c. voltage to said electrolyte, means for measuring the d.c. current through the electrolyte, means for applying an a.c. voltage to said Schottky diode, and a capacitance measuring unit responsive to said a.c. voltage for measuring the capacitance of the depletion layer of the Schottky diode.
Claim 3
Dependent Claim 25 words
Apparatus according to claim 1, including means connected to said capacitance measuring unit for providing a measurement of the carrier concentration of the semiconductor material.
Claim 4
Dependent Claim 16 words
Apparatus according to claim 2, including an integrator for integrating the current flowing through the electrolyte.
Claim 5
Dependent Claim 51 words
Apparatus according to claim 3, including an X - Y recorder which is coupled to said measuring means and to said integrator to provide a continuous graphical plot of the relationship between donor concentration at the surface of the Schottky diode and the thickness of the semiconductor edged from said area.
Claim 6
Dependent Claim 21 words
Apparatus according to claim 1, wherein said capacitance measuring means includes means for measuring the differential capacitance of the depletion layer.

References Cited (Backward Citations)

US2851654A Cited
US3250693A Cited
US3117899A Cited
US3303109A Cited
US3379625A Cited
US3586608A Cited
US3418226A Cited
US3660250A Cited
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US3873512A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-06-06 1980-12-06 1981-06-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-06-06 1984-12-06 1985-06-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-06-06 1988-12-06 1989-06-07 $7700.00 Window Closed / Lapsed

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