Patent US2469843A successfully refreshed from Google Patents.
Patent US4026743A successfully refreshed from Google Patents.
US4026743A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of preparing transparent artworks
Assignee: Individual
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Filing: 1976-06-24
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Granted: 1977-05-31
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Expires: 1996-06-24
Abstract
Abstract A method of preparing transparent artworks by forming a predetermined topological relief pattern by way of local layer-by-layer removal of the material on the side of the masking layer which is translucent to actinic radiation, with concurrent measurement of the optical phase difference between actinic light rays passing through the masking layer and a substrate transparent to actinic light, until the geometrical relief of the pattern becomes deep enough to ensure the required optical phase difference which is a multiple of 2π.
Inventors
- 👤 Gennady Nikolaevich Berezin
- 👤 Valery Nikolaevich Gurzheev
- 👤 Vladimir Ivanovich Zakharov
- 👤 Arkady Viktorovich Nikitin
- 👤 Robert Arnoldovich Suris
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 15:29
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/32
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
102 words
A method of preparing transparent artworks comprising the following steps: taking a substrate transparent to actinic light; forming, in the near surface portion of said substrate, a masking layer translucent to said actinic light; and making a predetermined topological relief pattern by way of local layer-to-layer removal of the material on the side of said masking layer with concurrent measurement of the optical phase difference between actinic light rays passing through said masking layer and transparent portion of said artwork, until the geometrical relief of said pattern becomes deep enough to ensure said optical phase difference which is a multiple of 2π.
Claim 2
Independent Claim
102 words
A method of preparing transparent artworks comprising the following steps: taking a substrate transparent to actinic light; forming, in the near surface portion of said substrate, a masking layer translucent to said actinic light; and making a predetermined topological relief pattern by way of local layer-to-layer removal of the material on the side of said masking layer with concurrent measurement of the optical phase difference between actinic light rays passing through said masking layer and transparent portion of said artwork, until the geometrical relief of said pattern becomes deep enough to ensure said optical phase difference which is a multiple of 2π.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-05-30 | 1980-11-29 | 1981-05-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-05-30 | 1984-11-29 | 1985-05-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-05-30 | 1988-11-29 | 1989-05-31 | $7700.00 | Window Closed / Lapsed |