Abstract An improved charged-particle beam optical apparatus for the irradiation of a specimen in a two-dimensional pattern having first areas which are unexposed to the particle beam and are surrounded at least almost entirely by second areas which are exposed to the beam. The improvement of the invention comprises a mask disposed in the path of the beam which is uniformly irradiated by the beam and has apertures disposed therein in an arrangement corresponding to the two-dimensional pattern. A support grid comprising a plurality of spaced-apart, parallel strip members is disposed beneath the mask and at least in engagement with the portions thereof which correspond to the unexposed areas of the two-dimensional pattern. Deflection means laterally deflect the image of the mask and the strip members projected onto the specimen in a direction approximately perpendicular to the longitudinal axes of the strip members at least through a distance which is equal to the width of the strip members.
In a charged-particle beam optical apparatus for the irradiation of a specimen in a two-dimensional pattern, said pattern having first areas which are unexposed to said beam and are surrounded at least almost entirely by second areas which are exposed to said beam, the improvement comprising: a beam mask disposed in the path of said charged-particle beam, said mask being uniformly irradiated by said beam and having apertures disposed therein in an arrangement corresponding to said pattern for passing particles of said beam through said mask and imaging said mask on said specimen; a support grid, comprising a plurality of spaced-apart parallel strip members, disposed beneath said mask and at least in engagement with the portions thereof which correspond to said first unexposed areas of said pattern; and means for laterally deflecting said beam and the image of said mask and said strip members projected onto said specimen in a direction approximately perpendicular to the longitudinal axes of said strip members at least through a distance which is equal to the width of said strip members.
Claim 2
Dependent Claim
176 words
In a charged-particle beam optical apparatus for the irradiation of a specimen in a two-dimensional pattern, said pattern having first areas which are unexposed to said beam and are surrounded at least almost entirely by second areas which are exposed to said beam, the improvement comprising: a beam mask disposed in the path of said charged-particle beam, said mask being uniformly irradiated by said beam and having apertures disposed therein in an arrangement corresponding to said pattern for passing particles of said beam through said mask and imaging said mask on said specimen; a support grid, comprising a plurality of spaced-apart parallel strip members, disposed beneath said mask and at least in engagement with the portions thereof which correspond to said first unexposed areas of said pattern; and means for laterally deflecting said beam and the image of said mask and said strip members projected onto said specimen in a direction approximately perpendicular to the longitudinal axes of said strip members at least through a distance which is equal to the width of said strip members.
Claim 3
Dependent Claim
51 words
In the charged-particle beam optical apparatus recited in claim 1, wherein said means for deflecting comprises electrostatic deflection plates disposed between said mask and said specimen adjacent to said particle beam path, and sawtooth wave generating means coupled to said plates for deflecting said beam and said image of said mask.