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Process for the manufacture of 3-substituted thiomethyl-7-amino-2-cephem-4-carboxylic acid compound

Assignee: Novartis Corp
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Filing: 1975-01-27
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Granted: 1977-03-29
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Expires: 1995-01-27
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Abstract

Abstract The invention concerns a new process for the manufacture of 3-substituted thiomethyl-7-amino-3-cephem-4-carboxylic acid compounds which comprises reacting a 3-y-methyl-7-amino-3-cephem-4-carboxylic acid compound, in which Y is hydroxy or esterified hydroxy, with a mercaptane compound, if necessary, in the presence of an optionally protonic Lewis acid, particularly trifluoroacetic acid.

Inventors

  • 👤 Heinrich Peter
  • 👤 Beat Muller
  • 👤 Walter Sibral
  • 👤 Hans Bickel

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-10 00:55
CPC Classifications
C; C07; C07D; C07D501/00; C07D501/14; C07D501/60; Y; Y02; Y02P; Y02P20/00; Y02P20/50; Y02P20/55

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 293 words
Process for the manufacture of a member selected from the group consisting of 7-N-R 1 2 -N-R 1 b -amino-3-R-thiomethyl-2-cephem-4 carboxylic acid compounds of the formula ##STR6## wherein R represents methyl, thiadiazolyl, tetrazolyl, methyl-substituted thiadiazolyl, or methyl-substituted tetrazolyl, R 1 b is hydrogen, R 1 a represents hydrogen, cyanoacetyl or an acyl radical of the formula ##STR7## wherein Ar is phenyl or tetrazolyl, X is oxygen, n denoted 0 or 1 and R 1 c denotes hydrogen or, if n represents 0, denotes α-poly-branched lower alkoxycarbonylamino, phenyl-lower alkoxycarbonylamino or phenyl-lower alkoxycarbonylamino substituted by lower alkoxy, nitro, or hydroxyl, α-poly-branched lower alkoxycarbonyloxy, 2-halogeno-lower alkoxycarbonyloxy, or formyloxy, or represents a 5-amino-5-carboxyvaleryl radical, wherein the amino and/or carboxyl group are optionally present, as lower alkanoylamino, dichloro-acetylamino, or phthaloylamino, or as phenyl-lower alkoxy-carbonyl, and R 2 denotes hydrogen, lower alkyl, α-poly-branched lower alkyl, or 2 halogeno-lower alkyl, nitrobenzyl, diphenylmethyl or lower alkoxy-substituted diphenylmethyl, and salts of such compounds with alkali and alkaline earth metals, ammonia or organic amines, if R 2 represents hydrogen, or with inorganic acids or organic sulfonic acids, if R 1 a and R 1 b both represent hydrogen or inner salts of such compounds, if R 2 , R 1 a and R 1 b all represent hydrogen, wherein a 7- (N-R 1 A -N-R 1 b -amino)-3-Y-methyl-2-cephem-4-carboxylic acid compound of the formula ##STR8## wherein R 1 b and R 2 have the above-mentioned meanings, R 1 A represents trityl, tri-lower alkyl silyl, phenylglycyl, phenylacetyl or phenoxyacetyl , and Y represents hydroxy, lower alkanoyloxy or halogeno acetoxy, is reacted with a compound of the formula R-SH (III), in the presence of trifluoroacetic acid with the proviso that when Y represents trifluoroacetoxy, the reaction can be carried out in the absence of trifluoroacetic acid.
Claim 2
Dependent Claim 293 words
Process for the manufacture of a member selected from the group consisting of 7-N-R 1 2 -N-R 1 b -amino-3-R-thiomethyl-2-cephem-4 carboxylic acid compounds of the formula ##STR6## wherein R represents methyl, thiadiazolyl, tetrazolyl, methyl-substituted thiadiazolyl, or methyl-substituted tetrazolyl, R 1 b is hydrogen, R 1 a represents hydrogen, cyanoacetyl or an acyl radical of the formula ##STR7## wherein Ar is phenyl or tetrazolyl, X is oxygen, n denoted 0 or 1 and R 1 c denotes hydrogen or, if n represents 0, denotes α-poly-branched lower alkoxycarbonylamino, phenyl-lower alkoxycarbonylamino or phenyl-lower alkoxycarbonylamino substituted by lower alkoxy, nitro, or hydroxyl, α-poly-branched lower alkoxycarbonyloxy, 2-halogeno-lower alkoxycarbonyloxy, or formyloxy, or represents a 5-amino-5-carboxyvaleryl radical, wherein the amino and/or carboxyl group are optionally present, as lower alkanoylamino, dichloro-acetylamino, or phthaloylamino, or as phenyl-lower alkoxy-carbonyl, and R 2 denotes hydrogen, lower alkyl, α-poly-branched lower alkyl, or 2 halogeno-lower alkyl, nitrobenzyl, diphenylmethyl or lower alkoxy-substituted diphenylmethyl, and salts of such compounds with alkali and alkaline earth metals, ammonia or organic amines, if R 2 represents hydrogen, or with inorganic acids or organic sulfonic acids, if R 1 a and R 1 b both represent hydrogen or inner salts of such compounds, if R 2 , R 1 a and R 1 b all represent hydrogen, wherein a 7- (N-R 1 A -N-R 1 b -amino)-3-Y-methyl-2-cephem-4-carboxylic acid compound of the formula ##STR8## wherein R 1 b and R 2 have the above-mentioned meanings, R 1 A represents trityl, tri-lower alkyl silyl, phenylglycyl, phenylacetyl or phenoxyacetyl , and Y represents hydroxy, lower alkanoyloxy or halogeno acetoxy, is reacted with a compound of the formula R-SH (III), in the presence of trifluoroacetic acid with the proviso that when Y represents trifluoroacetoxy, the reaction can be carried out in the absence of trifluoroacetic acid.
Claim 3
Dependent Claim 28 words
Process according to claim 1, wherein an esterified hydroxyl group Y represents a member selected from the group consisting of a lower alkanoyloxy and a halogeno acetoxy group.
Claim 4
Dependent Claim 22 words
Process according to claim 2, wherein an esterified hydroxylgroup Y represents a member selected from the group consisting of acetyloxy and trifluoroacetyloxy.
Claim 5
Dependent Claim 26 words
Process according to claim 1, wherein a starting material of the formula II, wherein Y represents trifluoroacetoxy is reacted with a compound of the formula III.
Claim 6
Dependent Claim 58 words
Process according to claim 1, wherein a starting material of the formula II, wherein Y represents a member selected from the group consissting of a free hydroxyl group and a hydroxyl group esterified by a lower alkane-carboxylic acid or a halogeno acetic acid, is reacted with a compound of the formula III in the presence of trifluoroacetic acid.

References Cited (Backward Citations)

US3878204A Cited
US3867380A Cited
US3948905A Cited
US3891629A Cited
US3975385A Cited
US3965099A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-03-28 1980-09-27 1981-03-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-03-28 1984-09-27 1985-03-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-03-28 1988-09-27 1989-03-29 $7700.00 Window Closed / Lapsed

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