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US4014822A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor ceramic composition

Assignee: Murata Manufacturing Co Ltd
•
Filing: 1974-04-26
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Granted: 1977-03-29
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Expires: 1994-04-26
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Abstract

Abstract A semiconductor ceramic composition consists essentially of 83.95 to 98.65 mol% of barium titanate, 0.13 to 0.45 mol% of manganese oxide, 0.20 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of one or more oxides of said group being 0.10 to 1.20 mol% greater than that of manganese oxide. The semiconductor ceramic composition has a markedly high positive resistance temperature characteristic.

Inventors

  • 👤 Nagao Fujikawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 15:38
CPC Classifications
H; H01; H01C; H01C7/00; H01C7/02; H01C7/022; H01C7/023; H01C7/025; C; C04; C04B; C04B35/00; C04B35/01; C04B35/46; C04B35/462; C04B35/465; C04B35/468; C04B35/4682; H01B; H01B1/00; H01B1/06; H01B1/08

Claims Analysis

Total Claims: 24
Claim 1
Independent Claim 95 words
A ceramic composition for making a semiconductor, said composition consisting essentially of 83.95 to 98.65 mol% of a basic composition composed of 47.0 to 50.0 mol% of barium oxide and 50.0 to 53.0 mol% of titanium dioxide, 0.13 to 0.45 mol% of manganese oxide, 0.2 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of said one or more oxides being 0.10 to 120 mol% greater than the content of manganese oxide.
Claim 2
Dependent Claim 95 words
A ceramic composition for making a semiconductor, said composition consisting essentially of 83.95 to 98.65 mol% of a basic composition composed of 47.0 to 50.0 mol% of barium oxide and 50.0 to 53.0 mol% of titanium dioxide, 0.13 to 0.45 mol% of manganese oxide, 0.2 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of said one or more oxides being 0.10 to 120 mol% greater than the content of manganese oxide.
Claim 3
Dependent Claim 42 words
A composition according to claim 1, wherein 0.05 to 40 mol% of barium oxide in the basic composition is replaced by the equivalent amount of one or more oxides selected from the group consisting of strontium oxide, calcium oxide and lead monoxide.
Claim 4
Dependent Claim 34 words
A composition according to claim 2, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of strontium oxide and 50.0 to 53.0 mol% of titanium dioxide.
Claim 5
Dependent Claim 37 words
A composition according to claim 2, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of strontium oxide and calcium oxide and 50.0 to 53.0 mol% of titanium dioxide.
Claim 6
Dependent Claim 37 words
A composition according to claim 2, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of calcium oxide and lead monoxide, and 50.0 to 53.0 mol% of titanium dioxide.
Claim 7
Dependent Claim 30 words
A composition according to claim 1, wherein 0.05 to 40 mol% of titanium dioxide in the basic composition is replaced by the equivalent amount of zirconium oxide and/or stannic oxide.
Claim 8
Dependent Claim 20 words
A composition according to claim 1, wherein Al 2 O 3 is additionally incorporated in not more than 0.5 mol%.
Claim 9
Dependent Claim 109 words
A semiconductor comprising impurity-doped barium titanate, the chemical composition of said semiconductor, when measured in terms of the oxides making up said semiconductor, consisting essentially of 83.95 to 98.65 mol% of a basic composition composed of 47.0 to 50.0 mol% of barium oxide and 50.0 to 53.0 mol% of titanium dioxide, 0.13 to 0.45 mol% of manganese oxide, 0.2 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of said one or more oxides being 0.10 to 1.20 mol% greater than the content of manganese oxide.
Claim 10
Dependent Claim 109 words
A semiconductor comprising impurity-doped barium titanate, the chemical composition of said semiconductor, when measured in terms of the oxides making up said semiconductor, consisting essentially of 83.95 to 98.65 mol% of a basic composition composed of 47.0 to 50.0 mol% of barium oxide and 50.0 to 53.0 mol% of titanium dioxide, 0.13 to 0.45 mol% of manganese oxide, 0.2 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of said one or more oxides being 0.10 to 1.20 mol% greater than the content of manganese oxide.
Claim 11
Dependent Claim 41 words
The semiconductor of claim 8, wherein 0.05 to 40 mol% of barium oxide in the basic composition is replaced by the equivalent amount of one or more oxides selected from the group consisting of strontium oxide, calcium oxide and lead monoxide.
Claim 12
Dependent Claim 33 words
The semiconductor of claim 9, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of strontium oxide and 50.0 to 53.0 mol% of titanium dioxide.
Claim 13
Dependent Claim 36 words
The semiconductor of claim 9, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of strontium oxide and calcium oxide and 50.0 to 53.0 mol% of titanium dioxide.
Claim 14
Dependent Claim 36 words
The semiconductor of claim 9, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of calcium oxide and lead monoxide, and 50.0 to 53.0 mol% of titanium dioxide.
Claim 15
Dependent Claim 29 words
The semiconductor of claim 8, wherein 0.05 to 40 mol% of titanium dioxide in the basic composition is replaced by the equivalent amount of zirconium oxide and/or stannic oxide.
Claim 16
Dependent Claim 19 words
The semiconductor of claim 8, wherein Al 2 O 3 is additionally incorporated in not more than 0.5 mol%.
Claim 17
Dependent Claim 102 words
A semiconductor ceramic consisting essentially of the fired reaction product obtained by firing an oxide composition consisting essentially of 83.95 to 98.65 mol% of a basic composition composed of 47.0 to 50.0 mol% of barium oxide and 50.0 to 53.0 mol% of titanium dioxide, 0.13 to 0.45 mol% of manganese oxide, 0.2 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of said one or more oxides being 0.10 to 1.20 mol% greater than the content of manganese oxide.
Claim 18
Dependent Claim 102 words
A semiconductor ceramic consisting essentially of the fired reaction product obtained by firing an oxide composition consisting essentially of 83.95 to 98.65 mol% of a basic composition composed of 47.0 to 50.0 mol% of barium oxide and 50.0 to 53.0 mol% of titanium dioxide, 0.13 to 0.45 mol% of manganese oxide, 0.2 to 15 mol% of silicon dioxide and 0.23 to 1.65 mol% of one or more oxides selected from the group consisting of oxides of rare earth elements, bismuth and antimony, the content of said one or more oxides being 0.10 to 1.20 mol% greater than the content of manganese oxide.
Claim 19
Dependent Claim 41 words
The semiconductor of claim 15, wherein 0.05 to 40 mol% of barium oxide in the basic composition is replaced by the equivalent amount of one or more oxides selected from the group consisting of strontium oxide, calcium oxide and lead monoxide.
Claim 20
Dependent Claim 33 words
The semiconductor of claim 16, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of strontium oxide and 50.0 to 53.0 mol% of titanium dioxide.
Claim 21
Dependent Claim 36 words
The semiconductor of claim 16, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of strontium oxide and calcium oxide and 50.0 to 53.0 mol% of titanium dioxide.
Claim 22
Dependent Claim 36 words
The semiconductor of claim 16, wherein the basic composition consists of 30.0 to 49.975 mol% of barium oxide, 0.025 to 20 mol% of calcium oxide and lead monoxide, and 50.0 to 53.0 mol% of titanium dioxide.
Claim 23
Dependent Claim 29 words
The semiconductor of claim 15, wherein 0.05 to 40 mol% of titanium dioxide in the basic composition is replaced by the equivalent amount of zirconium oxide and/or stannic oxide.
Claim 24
Dependent Claim 24 words
The semiconductor of claim 15, wherein said oxide composition further contains Al 2 O 3 in an amount of not more than 0.5 mol%.

References Cited (Backward Citations)

US3373120A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1980-03-28 1980-09-27 1981-03-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1984-03-28 1984-09-27 1985-03-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1988-03-28 1988-09-27 1989-03-29 $7700.00 Window Closed / Lapsed

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