Method of making injection lasers by epitaxial deposition and selective etching

Claim 1

A method of making a double heterostructure injection laser including the steps of forming a double heterostructure with a layer bounded on both sides by layers of the same conductivity type but larger band gap, the upper of said larger bandgap layers having a thickness not large compared with the wavelength of the laser radiation in said upper layer, of growing an epitaxial layer of opposite conductivity type on said upper layer using a conductivity type determining dopant of greater mobility and in greater concentration than used in the provision of the underlying layers of the double heterostructure, of selectively removing all of said epitaxial layer with the exception of a stripe extending in a direction normal to a cleavage plane, and of heating the structure so as to promote diffusion of the greater mobility dopant until the p-n junction beneath the stripe is translated into the smaller band gap layer of the double heterostructure.

Claim 2

A method of making a double heterostructure injection laser including the steps of forming a double heterostructure with a layer bounded on both sides by layers of the same conductivity type but larger band gap, the upper of said larger bandgap layers having a thickness not large compared with the wavelength of the laser radiation in said upper layer, of growing an epitaxial layer of opposite conductivity type on said upper layer using a conductivity type determining dopant of greater mobility and in greater concentration than used in the provision of the underlying layers of the double heterostructure, of selectively removing all of said epitaxial layer with the exception of a stripe extending in a direction normal to a cleavage plane, and of heating the structure so as to promote diffusion of the greater mobility dopant until the p-n junction beneath the stripe is translated into the smaller band gap layer of the double heterostructure.