Patent US3982270A successfully refreshed from Google Patents.
US3982270A
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Deep diode varactors
Assignee: General Electric Co
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Filing: 1975-02-27
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Granted: 1976-09-21
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Expires: 1995-02-27
Abstract
Abstract A varactor has a lamellar structure of a plurality of abutting regions of alternate and opposite type conductivity. The structure is produced by thermal gradient zone melting processing.
Inventors
- 👤 Harvey E. Cline
- 👤 Thomas R. Anthony
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 05:40
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/50; H10D; H10D1/00; H10D1/60; H10D1/62; H10D1/64; H10D62/00; H10D62/40; H10D62/405
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
417 words
A semiconductor varactor comprising a body of semiconductor material having two opposed major surfaces forming respectively the top and bottom surfaces of the body, a predetermined level of resistivity, a predetermined first type conductivity, a preferred crystal structure and a vertical axis substantially perpendicular to the major opposed surfaces; at least one of the opposed major surfaces having a predetermined crystal planar orientation which is one selected from the group consisting of (100), (110) and (111); a plurality of spaced planar regions of recrystallized semiconductor material of the body having a second and opposite type conductivity than that of the body and a predetermined level of resistivity formed in the body and so oriented as to be aligned with a first preferred crystal axis of the material of the body; each of the spaced planar regions having two opposed major surfaces extending between, and terminating in, the opposed major surfaces extending betweeen, and terminating, in, the opposed major surfaces of the body and oriented substantially perpendicular thereto and substantially parallel with the vertical axis of the body and a second preferred crystal axis of the material of the body; the recrystallized material is formed in situ by the migration of a melt of metal-rich semiconductor material of the body by thermal gradient zone melting at a predetermined elevated temperature along a thermal gradient substantially parallel with the second preferred crystal axis and the vertical axis of the body and has a predetermined level of concentration of the metal of the melt as determined by the solid solubility limit of that metal in that semiconductor material at that predetermined elevated temperature of migration and the metal is distributed substantially uniformly throughout the entire region; the metal consisting of at least one dopant impurity material to impart the type conductivity and level of resistivity to the planar region; a P-N junction formed by the abutting, contiguous surfaces of the material of each of the planar regions and the material of the body; each P-N junction being substantially perpendicular to, and exposed at, the major opposed surfaces of the body; the spaced planar regions and the material of the body between each pair of planar regions defining a lamellar structure of a plurality of integral diodes arranged in a series electrical circuit; electrical contact means affixed to selected surface areas of the body to enable a predetermined number of P-N junctions to be biased by an applied potential; and the electrical characteristic of the varactor is a voltage dependent capacitance.
Claim 2
Dependent Claim
417 words
A semiconductor varactor comprising a body of semiconductor material having two opposed major surfaces forming respectively the top and bottom surfaces of the body, a predetermined level of resistivity, a predetermined first type conductivity, a preferred crystal structure and a vertical axis substantially perpendicular to the major opposed surfaces; at least one of the opposed major surfaces having a predetermined crystal planar orientation which is one selected from the group consisting of (100), (110) and (111); a plurality of spaced planar regions of recrystallized semiconductor material of the body having a second and opposite type conductivity than that of the body and a predetermined level of resistivity formed in the body and so oriented as to be aligned with a first preferred crystal axis of the material of the body; each of the spaced planar regions having two opposed major surfaces extending between, and terminating in, the opposed major surfaces extending betweeen, and terminating, in, the opposed major surfaces of the body and oriented substantially perpendicular thereto and substantially parallel with the vertical axis of the body and a second preferred crystal axis of the material of the body; the recrystallized material is formed in situ by the migration of a melt of metal-rich semiconductor material of the body by thermal gradient zone melting at a predetermined elevated temperature along a thermal gradient substantially parallel with the second preferred crystal axis and the vertical axis of the body and has a predetermined level of concentration of the metal of the melt as determined by the solid solubility limit of that metal in that semiconductor material at that predetermined elevated temperature of migration and the metal is distributed substantially uniformly throughout the entire region; the metal consisting of at least one dopant impurity material to impart the type conductivity and level of resistivity to the planar region; a P-N junction formed by the abutting, contiguous surfaces of the material of each of the planar regions and the material of the body; each P-N junction being substantially perpendicular to, and exposed at, the major opposed surfaces of the body; the spaced planar regions and the material of the body between each pair of planar regions defining a lamellar structure of a plurality of integral diodes arranged in a series electrical circuit; electrical contact means affixed to selected surface areas of the body to enable a predetermined number of P-N junctions to be biased by an applied potential; and the electrical characteristic of the varactor is a voltage dependent capacitance.
Claim 3
Dependent Claim
20 words
The semiconductor varactor of claim 1 including the thickness of each second planar region is substantially constant throughout the region.
Claim 4
Dependent Claim
14 words
The semiconductor varactor of claim 1 wherein each P-N junction is a step junction.
Claim 5
Dependent Claim
25 words
The semiconductor varactor of claim 1 wherein the semiconductor material is one selected from the group consisting of silicon, silicon carbide, germanium and gallium arsenide.
Claim 6
Dependent Claim
37 words
The semiconductor varactor of claim 4 wherein the material of the body is silicon of N-type conductivity, and the material of each planar region has P-type conductivity and the dopant impurity in the recrystallized silicon is aluminum.
Claim 7
Dependent Claim
20 words
The semiconductor varactor of claim 5 including the thickness of each second planar region is substantially constant throughout the region.
Claim 8
Dependent Claim
14 words
The semiconductor varactor of claim 5 wherein each P-N junction is a step junction.
Claim 9
Dependent Claim
19 words
The semiconductor varactor of claim 1 wherein the opposed major surfaces have a preferred planar crystal orientation of (111).
Claim 10
Dependent Claim
27 words
the semiconductor varactor of claim 8 wherein the material of the body is one selected from the group consisting of silicon, silicon carbide, germanium and gallium arsenide.
Claim 11
Dependent Claim
27 words
The semiconductor varactor of claim 9 wherein the material of the body is silicon of N-type conductivity, and the dopant impurity in the recrystallized silicon is aluminum.
Claim 12
Dependent Claim
20 words
The semiconductor varactor of claim 10 including the thickness of each second planar region is substantially constant throughout the region.
Claim 13
Dependent Claim
14 words
The semiconductor varactor of claim 10 wherein each P-N junction is a step junction.
Claim 14
Dependent Claim
49 words
The semiconductor varactor of claim 1 wherein the opposed major surfaces of the body have a preferred planar crystal orientation of (100) and each planar region of second type conductivity has a preferred crystal axis direction which is one selected from the group consisting of <011 > and <011>.
Claim 15
Dependent Claim
27 words
The semiconductor varactor of claim 13 wherein the material of the body is one selected from the group consisting of silicon, silicon carbide, germanium and gallium arsenide.
Claim 16
Dependent Claim
28 words
The semiconductor varactor of claim 14 wherein the material of the body is silicon of N-type conductivity, and the dopant impurity material in the recrystallized silicon is aluminum.
Claim 17
Dependent Claim
20 words
The semiconductor varactor of claim 15 including the thickness of each second planar region is substantially constant throughout the region.
Claim 18
Dependent Claim
14 words
The semiconductor varactor of claim 13 wherein each P-N junction is a step junction.
Claim 19
Dependent Claim
40 words
The semiconductor varactor of claim 1 wherein the opposed major surfaces of the body have a preferred planar crystal orientation of (110), and each planar region of second type conductivity has a preferred crystal axes direction of < 110 >.
Claim 20
Dependent Claim
27 words
The semiconductor varactor of claim 18 wherein the material of the body is one selected from the group consisting of silicon, silicon carbide, germanium and gallium arsenide.
Claim 21
Dependent Claim
28 words
The semiconductor varactor of claim 19 wherein the material of the body is silicon of N-type conductivity, and the dopant impurity material in the recrystallized silicon is aluminum.
Claim 22
Dependent Claim
20 words
The semiconductor varactor of claim 20 including the thickness of each second planar region is substantially constant throughout the region.
Claim 23
Dependent Claim
14 words
The semiconductor varactor of claim 20 wherein each P-N junction is a step junction.
Claim 24
Dependent Claim
39 words
The semiconductor varactor of claim 8 wherein each planar region of second type conductivity has a preferred crystal axes direction which is one selected from the group consisting of < 011 >, < 101 > and < 110 >.
Claim 25
Dependent Claim
27 words
The semiconductor varactor of claim 23 wherein the material of the body is one selected from the group consisting of silicon, silicon carbide, germanium and gallium arsenide.
Claim 26
Dependent Claim
28 words
The semiconductor varactor of claim 24 wherein the material of the body is silicon of N-type conductivity, and the dopant impurity material in the recrystallized silicon is aluminum.
Claim 27
Dependent Claim
20 words
The semiconductor varactor of claim 25 including the thickness of each second planar region is substantially constant throughout the region.
Claim 28
Dependent Claim
14 words
The semiconductor varactor of claim 25 wherein each P-N junction is a step junction.
Claim 29
Dependent Claim
39 words
The semiconductor varactor of claim 8 wherein each planar region of second type conductivity has a preferred crystal axes direction which is one selected from the group consisting of < 112 >, < 211 > and < 121 >.
Claim 30
Dependent Claim
27 words
The semiconductor varactor of claim 28 wherein the material of the body is one selected from the group consisting of silicon, silicon carbide, germanium and gallium arsenide.
Claim 31
Dependent Claim
28 words
The semiconductor varactor of claim 29 wherein the material of the body is silicon of N-type conductivity, and the dopant impurity material in the recrystallized silicon is aluminum.
Claim 32
Dependent Claim
20 words
The semiconductor varactor of claim 30 including the thickness of each second planar region is substantially constant throughout the region.
Claim 33
Dependent Claim
14 words
The semiconductor varactor of claim 20 wherein each P-N junction is a step junction.
References Cited (Backward Citations)
US3503125A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-09-21 | 1980-03-22 | 1980-09-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-09-21 | 1984-03-22 | 1984-09-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-09-21 | 1988-03-22 | 1988-09-21 | $7700.00 | Window Closed / Lapsed |