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US3968199A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for making silane

Assignee: Advanced Silicon Materials LLC
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Filing: 1974-02-25
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Granted: 1976-07-06
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Expires: 1994-02-25
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Abstract

Abstract There is a process for manufacturing SiH4 by the disproportionation or redistribution of HSiCl3 which comprises feeding HSiCl3 into a bed of insoluble solid anion exchange resin containing tertiary amino or quaternary ammonium groups bonded to carbon therein, refluxing the HSiCl3 to vaporize disproportionated products to the upper portion of the bed and condensing liquid SiCl4 from the area in which HSiCl3 is refluxed, maintaining the temperature at the top of the bed above the boiling point of SiH4 and below the boiling point of H3SiCl, and recovering SiH4 from the bed substantially free of chlorosilanes.

Inventors

  • 👤 Carl James Bakay

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 12:41
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/08; C01B33/107; C01B33/10773; C01B33/04; C01B33/043

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 107 words
The process of producing SiH 4 which comprises providing HSiCl 3 in a bed of an insoluble, solid anion exchange resin congtaining tertiary amino or quaternary ammonium groups bonded to carbon thereof, maintaining the temperature of the bed where HSiCl 3 is provided sufficient to cause said HSiCl 3 to be disproportionated to form vaporous products which rise in the bed, and SiCl 4 , which is condensed, maintaining the temperature at the top of the bed above the boiling point of SiH 4 and below the boiling point of H 3 SiCl and recovering SiH 4 which is substantially free of chlorosilicon hydrides from the bed.
Claim 2
Dependent Claim 107 words
The process of producing SiH 4 which comprises providing HSiCl 3 in a bed of an insoluble, solid anion exchange resin congtaining tertiary amino or quaternary ammonium groups bonded to carbon thereof, maintaining the temperature of the bed where HSiCl 3 is provided sufficient to cause said HSiCl 3 to be disproportionated to form vaporous products which rise in the bed, and SiCl 4 , which is condensed, maintaining the temperature at the top of the bed above the boiling point of SiH 4 and below the boiling point of H 3 SiCl and recovering SiH 4 which is substantially free of chlorosilicon hydrides from the bed.
Claim 3
Dependent Claim 15 words
The process of claim 1 wherein the resin is macroreticular and contains tertiary amino groups.
Claim 4
Dependent Claim 18 words
The process of claim 2 wherein the resin is derived from the reaction of a styrene and divinylbenzene.
Claim 5
Dependent Claim 19 words
The process of claim 1 wherein liquid HSiCl 3 is vaporized and the vapors are passed to said bed.

References Cited (Backward Citations)

US3069239A Cited
DE2162537A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-07-06 1980-01-05 1980-07-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-07-06 1984-01-05 1984-07-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-07-06 1988-01-05 1988-07-06 $7700.00 Window Closed / Lapsed

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