Process for coating metal substrates

Claim 3

heating the coated substrate to between about 200° and 300°C. for a period of time sufficient to obtain a solvent-resistant coating, wherein R 1 represents an alkyl radical containing between 1 and 20 carbon atoms, a hydroxyalkyl radical containing 2 or 3 carbon atoms, a cycloalkyl, aryl, alkaryl or an aralkyl radical; A is selected from the group consisting of alkylene radicals containing between 1 and 20 carbon atoms, cycloalkylene, arylene, alkarylene and aralkylene radicals, residues of diglycidyl ethers of dihydric alcohols, ##EQU14## wherein R 2 is an alkylene radical containing between 2 and 20 carbon atoms and residues of diglycidyl ethers of dihydric phenols, ##EQU15## wherein Ar represents an arylene or an alkarylene radical; B represents a divalent radical selected from the group consisting of --O--R 3 O-- m , ##EQU16## and ##EQU17## wherein R 3 represents an alkylene radical containing between 2 and 20 carbon atoms, R 4 is selected from the same group as R 1 ; m represents an integer between 1 and 20; n represents an integer between 9 and 20, inclusive, and Y represents an anionic radical obtained by removal of a proton from a mineral acid, a sulfonic acid or the carboxyl radical

Claim 4

heating the coated substrate to between about 200° and 300°C. for a period of time sufficient to obtain a solvent-resistant coating, wherein R 1 represents an alkyl radical containing between 1 and 20 carbon atoms, a hydroxyalkyl radical containing 2 or 3 carbon atoms, a cycloalkyl, aryl, alkaryl or an aralkyl radical; A is selected from the group consisting of alkylene radicals containing between 1 and 20 carbon atoms, cycloalkylene, arylene, alkarylene and aralkylene radicals, residues of diglycidyl ethers of dihydric alcohols, ##EQU14## wherein R 2 is an alkylene radical containing between 2 and 20 carbon atoms and residues of diglycidyl ethers of dihydric phenols, ##EQU15## wherein Ar represents an arylene or an alkarylene radical; B represents a divalent radical selected from the group consisting of --O--R 3 O-- m , ##EQU16## and ##EQU17## wherein R 3 represents an alkylene radical containing between 2 and 20 carbon atoms, R 4 is selected from the same group as R 1 ; m represents an integer between 1 and 20; n represents an integer between 9 and 20, inclusive, and Y represents an anionic radical obtained by removal of a proton from a mineral acid, a sulfonic acid or the carboxyl radical

Claim 5

of a carboxylic acid. 2. A method as described in claim 1 wherein A represents the radical ##SPC3##

Claim 6

A method as described in claim 1 wherein R 1 and R 4 represent hydroxyethyl radicals.

Claim 7

A method as described in claim 1 wherein B represents O--R 3 O-- m and R 3 represents an ethylene radical.

Claim 8

A method as described in claim 1 wherein the aqueous solution contains up to 50%, based on the weight of volatile materials, of a water-miscible organic liquid.

Claim 9

A method as described in claim 1 wherein Y represents the residue of a carboxylic acid.

Claim 10

A method as described in claim 6 wherein the carboxylic acid is formic acid.

Claim 11

A method as described in claim 1 wherein the aqueous solution contains between 0.05 and 3%, based on the weight of said epoxide-amine reaction product, of a catalyst selected from the group consisting of pyrophosphoric acid, phosphoric acid and amine salts of pyrophosphoric and phosphoric acids.