Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
209 words
In a method for the preparation of relief structures consisting of highly heat resistant polymers comprising the steps of applying a soluble, photo or radiation-sensitive prepolymer of defined structure in the form of a film to a substrate or in the form of a foil, exposing or irradiating the photo or radiation active layer through a negative pattern, dissolving or stripping of the unexposed or unirradiated portions and annealing the relief structure obtained, the improvement which comprises forming said film or foil from a poly-addition or poly-condensation prepolymer having repeating units of the formula: ##EQU10## wherein, X and D each comprise a carbocyclic and/or heterocyclic nucleus; G is selected from the group consisting of amide, urea or urethane linkages; R* is an organic radical containing a photo- or radiation induced di- or polymerizable olefinic double bond; and is a component of ester group CO 2 R*, said group bound to said nucleus is ortho or peri position to G; F is a group capable of reacting with the carbonyl group of CO 2 R* to form a cyclic structure upon heating of the prepolymer to liberate R*OH; and wherein F is arranged in ortho- or periposition to G; x is 1 or 2; and y is 0 or 2.
Claim 2
Dependent Claim
209 words
In a method for the preparation of relief structures consisting of highly heat resistant polymers comprising the steps of applying a soluble, photo or radiation-sensitive prepolymer of defined structure in the form of a film to a substrate or in the form of a foil, exposing or irradiating the photo or radiation active layer through a negative pattern, dissolving or stripping of the unexposed or unirradiated portions and annealing the relief structure obtained, the improvement which comprises forming said film or foil from a poly-addition or poly-condensation prepolymer having repeating units of the formula: ##EQU10## wherein, X and D each comprise a carbocyclic and/or heterocyclic nucleus; G is selected from the group consisting of amide, urea or urethane linkages; R* is an organic radical containing a photo- or radiation induced di- or polymerizable olefinic double bond; and is a component of ester group CO 2 R*, said group bound to said nucleus is ortho or peri position to G; F is a group capable of reacting with the carbonyl group of CO 2 R* to form a cyclic structure upon heating of the prepolymer to liberate R*OH; and wherein F is arranged in ortho- or periposition to G; x is 1 or 2; and y is 0 or 2.
Claim 3
Dependent Claim
9 words
The method of claim 1 wherein y is 0.
Claim 4
Dependent Claim
33 words
The method of claim 1 wherein D is phenylene, pyridinylene, or a radical of the formula ##SPC10## wherein M is 0, SO 2 or CH 2 ; and z is 0 or 1.
Claim 5
Dependent Claim
20 words
The method of claim 1 having repeating units of the formula: ##SPC11## wherein D is as defined in claim 3.
Claim 6
Dependent Claim
9 words
The method of claim 4 wherein D is ##SPC12##
Claim 7
Dependent Claim
9 words
The method of claim 4 wherein D is ##SPC13##
Claim 8
Dependent Claim
9 words
The method of claim 4 wherein D is ##SPC14##
Claim 9
Dependent Claim
9 words
The method of claim 4 wherein D is 2,4-pyridinylene.
Claim 10
Dependent Claim
22 words
The method of claim 3 wherein the prepolymer has repeating units of the formula: ##SPC15## wherein Q is a hydrogen or CN.
Claim 11
Dependent Claim
15 words
The method of claim 3 wherein the prepolymer has repeating units of the formula: ##SPC16##