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Method for the preparation of relief structures

Assignee: Siemens AG
•
Filing: 1974-02-21
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Granted: 1976-05-18
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Expires: 1994-02-21
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Abstract

Abstract Novel cyclic monomers leaving two functional groups capable of undergoing condensation reactions to form amide, urea or urethane linkages and at least one photo or radiation-reactive group are condensed with cyclic comonomers to form a soluble, substantially-linear condensation pre-polymer. A solution of the prepolymer is applied to a substrate and the solution is evaporated off to form a film or foil. The photo or radiation-sensitive layer or foil is exposed or irradiated through a pattern, the unexposed or unirradiated part is dissolved or stripped off, and the relief structure which remains is annealed if necessary. The relief structures obtained are distinguished particularly by the sharpness of their edges, good mechanical and chemical properties as well as good insulating properties. They are suited particularly for the preparation of miniaturized insulating layers.

Inventors

  • 👤 Wolfgang Kleeberg
  • 👤 Roland Rubner
  • 👤 Wieland Bartel

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 17:23
CPC Classifications
C; C07; C07C; C07C255/00; G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0387

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 209 words
In a method for the preparation of relief structures consisting of highly heat resistant polymers comprising the steps of applying a soluble, photo or radiation-sensitive prepolymer of defined structure in the form of a film to a substrate or in the form of a foil, exposing or irradiating the photo or radiation active layer through a negative pattern, dissolving or stripping of the unexposed or unirradiated portions and annealing the relief structure obtained, the improvement which comprises forming said film or foil from a poly-addition or poly-condensation prepolymer having repeating units of the formula: ##EQU10## wherein, X and D each comprise a carbocyclic and/or heterocyclic nucleus; G is selected from the group consisting of amide, urea or urethane linkages; R* is an organic radical containing a photo- or radiation induced di- or polymerizable olefinic double bond; and is a component of ester group CO 2 R*, said group bound to said nucleus is ortho or peri position to G; F is a group capable of reacting with the carbonyl group of CO 2 R* to form a cyclic structure upon heating of the prepolymer to liberate R*OH; and wherein F is arranged in ortho- or periposition to G; x is 1 or 2; and y is 0 or 2.
Claim 2
Dependent Claim 209 words
In a method for the preparation of relief structures consisting of highly heat resistant polymers comprising the steps of applying a soluble, photo or radiation-sensitive prepolymer of defined structure in the form of a film to a substrate or in the form of a foil, exposing or irradiating the photo or radiation active layer through a negative pattern, dissolving or stripping of the unexposed or unirradiated portions and annealing the relief structure obtained, the improvement which comprises forming said film or foil from a poly-addition or poly-condensation prepolymer having repeating units of the formula: ##EQU10## wherein, X and D each comprise a carbocyclic and/or heterocyclic nucleus; G is selected from the group consisting of amide, urea or urethane linkages; R* is an organic radical containing a photo- or radiation induced di- or polymerizable olefinic double bond; and is a component of ester group CO 2 R*, said group bound to said nucleus is ortho or peri position to G; F is a group capable of reacting with the carbonyl group of CO 2 R* to form a cyclic structure upon heating of the prepolymer to liberate R*OH; and wherein F is arranged in ortho- or periposition to G; x is 1 or 2; and y is 0 or 2.
Claim 3
Dependent Claim 9 words
The method of claim 1 wherein y is 0.
Claim 4
Dependent Claim 33 words
The method of claim 1 wherein D is phenylene, pyridinylene, or a radical of the formula ##SPC10## wherein M is 0, SO 2 or CH 2 ; and z is 0 or 1.
Claim 5
Dependent Claim 20 words
The method of claim 1 having repeating units of the formula: ##SPC11## wherein D is as defined in claim 3.
Claim 6
Dependent Claim 9 words
The method of claim 4 wherein D is ##SPC12##
Claim 7
Dependent Claim 9 words
The method of claim 4 wherein D is ##SPC13##
Claim 8
Dependent Claim 9 words
The method of claim 4 wherein D is ##SPC14##
Claim 9
Dependent Claim 9 words
The method of claim 4 wherein D is 2,4-pyridinylene.
Claim 10
Dependent Claim 22 words
The method of claim 3 wherein the prepolymer has repeating units of the formula: ##SPC15## wherein Q is a hydrogen or CN.
Claim 11
Dependent Claim 15 words
The method of claim 3 wherein the prepolymer has repeating units of the formula: ##SPC16##

References Cited (Backward Citations)

US3475176A Cited
US3650746A Cited
US3858510A Cited
US3801638A Cited
US3753720A Cited
US3847767A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-05-18 1979-11-17 1980-05-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-05-18 1983-11-17 1984-05-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-05-18 1987-11-17 1988-05-18 $7700.00 Window Closed / Lapsed

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