US3939089A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Etching solutions for copper and copper alloys and etching process using the same
Assignee: Adeka Corp
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Filing: 1974-09-30
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Granted: 1976-02-17
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Expires: 1994-09-30
Abstract
Abstract This invention provides etching solutions for copper and copper alloys comprising a mixed aqueous solution of a peroxysulfate with a purine compound and a halogen compound added as the catalyst. There is also provided a process for etching copper or copper alloys with said etching solutions.
Inventors
- 👤 Akira Matsumoto
- 👤 Katsutoshi Itani
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 03:05
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/18
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
64 words
An etching solution for copper and copper alloys comprising an aqueous peroxysulfate solution containing from 5 percent by weight to its solubility limit therein of a peroxysulfate, from 10 parts per million to its solubility limit therein of a purine compound, and from 5 parts per million to 1,000 parts per million of a halogen compound which liberates halogen in an aqueous peroxysulfate solution.
Claim 2
Dependent Claim
64 words
An etching solution for copper and copper alloys comprising an aqueous peroxysulfate solution containing from 5 percent by weight to its solubility limit therein of a peroxysulfate, from 10 parts per million to its solubility limit therein of a purine compound, and from 5 parts per million to 1,000 parts per million of a halogen compound which liberates halogen in an aqueous peroxysulfate solution.
Claim 3
Dependent Claim
16 words
An etching solution according to claim 1 wherein the peroxysulfate is ammonium peroxymonosulfate or ammonium peroxydisulfate.
Claim 4
Dependent Claim
31 words
An etching solution according to claim 1 wherein the purine compound is a member selected from the group consisting of purine, adenine, a chloropurine, a purinethiol, guanine, xanthine, hypoxanthine and theophylline.
Claim 5
Dependent Claim
64 words
An etching solution according to claim 1 wherein the halogen compound is a member selected from the group consisting of hydrofluoric acid and salts thereof, hydrochloric acid and salts thereof, hydrobromie acid and salts thereof, hydroiodic acid and salts thereof, oxides of fluorine, chlorine, bromine and iodine, oxygen-containing acids of chlorine, bromine and iodine and salts thereof, dichloroisocyanuric acid and salts thereof and 1-chlorodiethylether.
Claim 6
Dependent Claim
49 words
An etching solution of claim 1, wherein the concentration of said peroxysulfate is from 5 to 25 percent by weight, the concentration of said purine compound is from 50 to 1,000 parts per million, and the concentration of said halogen compound is from 10 to 500 parts per million.
Claim 7
Dependent Claim
63 words
An etching solution for copper and copper alloys comprising an aqueous solution containing from 5 percent by weight to its solubility limit therein of a peroxysulfate, from 10 parts per million to its solubility limit therein of a purine compound, and from 5 parts per million to 1,000 parts per million of a halogen compound which liberates halogen in an aqueous peroxysulfate solution.
Claim 8
Dependent Claim
63 words
An etching solution for copper and copper alloys comprising an aqueous solution containing from 5 percent by weight to its solubility limit therein of a peroxysulfate, from 10 parts per million to its solubility limit therein of a purine compound, and from 5 parts per million to 1,000 parts per million of a halogen compound which liberates halogen in an aqueous peroxysulfate solution.
Claim 9
Dependent Claim
49 words
An etching solution of claim 6, wherein the concentration of said peroxysulfate is from 5 to 25 percent by weight, the concentration of said purine compound is from 50 to 1,000 parts per million, and the concentration of said halogen compound is from 10 to 500 parts per million.
Claim 10
Dependent Claim
71 words
In the process for etching copper and copper alloys with an aqueous peroxysulfate solution containing from 5 percent by weight to its solubility limit therein of a peroxysulfate, which comprises adding to said solution from 10 parts per million to its solubility limit therein of a purine compound, and from 5 parts per million to 1,000 parts per million of a halogen compound which liberates halogen in an aqueous peroxysulfate solution.
Claim 11
Dependent Claim
71 words
In the process for etching copper and copper alloys with an aqueous peroxysulfate solution containing from 5 percent by weight to its solubility limit therein of a peroxysulfate, which comprises adding to said solution from 10 parts per million to its solubility limit therein of a purine compound, and from 5 parts per million to 1,000 parts per million of a halogen compound which liberates halogen in an aqueous peroxysulfate solution.
Claim 12
Dependent Claim
48 words
The process of claim 8, wherein the concentration of said peroxysulfate is from 5 to 25 percent by weight, the concentration of said purine compound is from 50 to 1,000 parts per million, and the concentration of said halogen compound is from 10 to 500 parts per million.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-02-16 | 1979-08-18 | 1980-02-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-02-16 | 1983-08-18 | 1984-02-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-02-16 | 1987-08-18 | 1988-02-17 | $7700.00 | Window Closed / Lapsed |