US3770530A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of etching copper and alloys thereof
Assignee: Adeka Corp
•
Filing: 1971-09-24
•
Granted: 1973-11-06
•
Expires: 1991-09-24
Abstract
Abstract A method of etching copper, or its alloys, with an acidic aqueous etching solution containing peroxysulfate and containing an additive which is an azole of the following structures: WHEREIN X, X'' and X'''' which may be the same or different represent any one of hydrogen, amino group, aminoalkyl group having one to three carbon atoms, and alkyl group having one to three carbon atoms; and, if required, one or more halides as a secondary component. The use of such etching solution results in an accelerated etching rate.
Inventors
- 👤 O Fujimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 21:00
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/18; Y; Y10; Y10T; Y10T428/00; Y10T428/31504; Y10T428/31511; Y10T428/31529
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
50 words
Method according to claim 1 wherein said azoles being selected from the group consisting of 1,2,4-triazole, 3-methyl-1, 2,4-triazole, 3,5-dimethyl-1,2,4-triazole, 1-amino-1,2,4-triazole, 3-amino-1,2,4-triazole, 5-amino-3-methyl-1,2,4-triazole, 3-( Beta -aminoethyl)-1,2,4-triazole, 3-isopropyl-1,2, 4-triazole, 1,2,3-triazole, 1-methyl-1,2,3-triazole, 1-amino-1,2, 3-triazole, 1-amino-5-methyl-1,2,3-triazole, 4,5-dimethyl-1,2,3-triazole, 1-amino-5-(n)propyl-1,2,3-triazole, 1-( Beta -aminoethyl)-1,2,3-triazole, benzotriazole, 1-methyl-benzotriazole, 1-amino-benzotriazole, 1-ethyl-benzotriazole, tetrazole, 1-methyl-tetrazole, 2-methyl-tetrazole, 5-amino-tetrazole, 5-amino-1-methyl-tetrazole and 1-( Beta -aminoethyl)-tetrazole.
Claim 2
Dependent Claim
62 words
Method according to claim 1 wherein said halides being selected from the group consisting of hydrofluoric acid and salts thereof; hydrochloric acid and salts thereof; hydrobromic acid and salts thereof; hydroiodic acid and salts thereof; oxides of fluorine, chlorine, bromine and iodine; oxyacids of chlorine, bromine and iodine including salts thereof; dichloroisocyanuric acid and salts thereof; 1-chlorodiethyl ether and organic acid halides.
Claim 3
Dependent Claim
51 words
A method according to claim 1 wherein the etching solution contains the peroxysulfate in the concentration of from 5 weight percent to the maximum solubility in the etching solution at a temperature employed, the azoles in the concentration of 10-10, 000 PPM and the halides in the concentration of 0.1-1,000 PPM.
Claim 4
Dependent Claim
58 words
A method according to claim 1 wherein copper and alloys thereof are adhered in the form of foils onto an electric insulating material such as epoxy or phenol resin and a part of surface of the foil which later forms a printed circuit after etching is covered with a resist film on said foil-shaped copper and alloys thereof.
Claim 5
Dependent Claim
36 words
A method according to claim 5 wherein the Resist film is composed of at least one material selected from the group consisting of ink, organic photosensitive resins, solder, gold, gold-nickel alloy, rhodium, tin and tin-nickel alloy.
References Cited (Backward Citations)
US3476624A
Cited
US3663436A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-11-05 | 1977-05-07 | 1977-11-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-11-05 | 1981-05-07 | 1981-11-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-11-05 | 1985-05-07 | 1985-11-06 | $7700.00 | Window Closed / Lapsed |