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US3922708A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of producing high value ion implanted resistors

Assignee: International Business Machines Corp
•
Filing: 1974-03-04
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Granted: 1975-11-25
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Expires: 1994-03-04
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Abstract

Abstract High value resistors, of the order of 109 ohms/square and higher, are fabricated by implanting zinc or lead ions into a silicon dioxide layer over a silicon chip containing electrical components and/or circuits.

Inventors

  • 👤 Billy L Crowder
  • 👤 Swie-In Tan

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 16:51
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/40; H10D1/47; H10P; H10P30/00; H10P30/40; H10W; H10W20/00; H10W20/40

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 58 words
A SEMICONDUCTOR WAFER HAVING A NETWORK OF ELECTRICAL CIRCUITRY ON ITS SURFACE, AN INSULATING LAYER OVER SAID SURFACE, RESISTIVE ELEMENTS IMBEDDED BY ION IMPLANTATION WITHIN THE BODY OF SAID INSULATING LAYER, SAID ELEMENTS HAVING RESISTIVITIES OF 10**7 TO 10**9 OHMS/SQUARE, AND MEANS IN SAID INSULATING LAYER FOR ALLOWING ELECTRICAL CONNECTION BETWEEN SAID ELECTRICAL CIRCUITRY AND SAID RESISTIVE ELEMENTS.
Claim 2
Dependent Claim 58 words
A SEMICONDUCTOR WAFER HAVING A NETWORK OF ELECTRICAL CIRCUITRY ON ITS SURFACE, AN INSULATING LAYER OVER SAID SURFACE, RESISTIVE ELEMENTS IMBEDDED BY ION IMPLANTATION WITHIN THE BODY OF SAID INSULATING LAYER, SAID ELEMENTS HAVING RESISTIVITIES OF 10**7 TO 10**9 OHMS/SQUARE, AND MEANS IN SAID INSULATING LAYER FOR ALLOWING ELECTRICAL CONNECTION BETWEEN SAID ELECTRICAL CIRCUITRY AND SAID RESISTIVE ELEMENTS.
Claim 3
Dependent Claim 11 words
The device of claim 1 wherein said semiconductor wafer is silicon.
Claim 4
Dependent Claim 12 words
The device of claim 2 wherein said insulating layer is silicon dioxide.
Claim 5
Dependent Claim 15 words
The device of claim 1 wherein said imbedded resistances consist of implanted ions of zinc.
Claim 6
Dependent Claim 15 words
The device of claim 1 wherein said imbedded resistance consists of implanted ions of lead.
Claim 7
Dependent Claim 16 words
The device of claim 1 wherein said imbedded resistor has a small temperature coefficient of resistivity.

References Cited (Backward Citations)

US3390012A Cited
US3682700A Cited
US3705060A Cited
US3614480A Cited
US3620945A Cited
US3693011A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-11-24 1979-05-26 1979-11-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-11-24 1983-05-26 1983-11-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-11-24 1987-05-26 1987-11-25 $7700.00 Window Closed / Lapsed

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