US3914515A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for forming transition metal oxide films on a substrate and photomasks therefrom
Assignee: RCA Corp
•
Filing: 1973-07-16
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Granted: 1975-10-21
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Expires: 1993-07-16
Abstract
Abstract Photomasks for microcircuit technology are prepared by evaporating cyclopentadienyl derivatives of transition metals, contacting the vapor with a heated substrate in an oxygencontaining atmosphere to form transition metal oxide films on the substrate and removing part of the film to form a desired pattern.
Inventors
- 👤 James Kane
- 👤 Hanspeter Schweizer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 16:57
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/04; C23C16/042; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/245; C23C16/22; C23C16/30; C23C16/40; C23C16/405; C23C16/406; C03C2217/00; C03C2217/20; C03C2217/21; C03C2217/217; C03C2217/229; C03C2218/00; C03C2218/10; C03C2218/15; C03C2218/152; C03C2218/30; C03C2218/32; C03C2218/328
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
78 words
A PROCESS FOR PREPARING A PHOTOMASK WHICH COMPRISES A. VAPORIZING SOLVENT-FREE DICYCLOPENTADIENYL IRON AT A TEMPERATURE FROM ABOUT 100**-140*C, B. HEATING A TRANSPARENT SUBSTRATE TO A TEMPERATURE OF ABOUT 300**-550C, C. CONTACTING THE HEATED SUBSTRATE WITH THE VAPORIZED DICYCLOPENTADIENYL IRON IN AN OXYGEN-CONTAINING ATMOSPHERE SO AS TO DEPOSIT A FILM OF IRON OXIDE ON THE SUBSTRATE TO A THICKNESS OF FROM ABOUT 500-5,000A, AND D. FORMING A PATTERN IN THE IRON OXIDE FILM BY REMOVING SELECTED PORTIONS THEREOF.
Claim 2
Dependent Claim
78 words
A PROCESS FOR PREPARING A PHOTOMASK WHICH COMPRISES A. VAPORIZING SOLVENT-FREE DICYCLOPENTADIENYL IRON AT A TEMPERATURE FROM ABOUT 100**-140*C, B. HEATING A TRANSPARENT SUBSTRATE TO A TEMPERATURE OF ABOUT 300**-550C, C. CONTACTING THE HEATED SUBSTRATE WITH THE VAPORIZED DICYCLOPENTADIENYL IRON IN AN OXYGEN-CONTAINING ATMOSPHERE SO AS TO DEPOSIT A FILM OF IRON OXIDE ON THE SUBSTRATE TO A THICKNESS OF FROM ABOUT 500-5,000A, AND D. FORMING A PATTERN IN THE IRON OXIDE FILM BY REMOVING SELECTED PORTIONS THEREOF.
Claim 3
Dependent Claim
14 words
A process according to claim 1 wherein the temperature of vaporization is from 110*-120*C.
Claim 4
Dependent Claim
16 words
A process according to claim 1 wherein the temperature of the substrate is from about 360*-380*C.
Claim 5
Dependent Claim
21 words
A process according to claim 1 wherein the deposition is continued until a film from about 1,700-2,500A thick has been deposited.
Claim 6
Dependent Claim
9 words
A photomask produced by the method of claim 1.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-10-20 | 1979-04-21 | 1979-10-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-10-20 | 1983-04-21 | 1983-10-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-10-20 | 1987-04-21 | 1987-10-21 | $7700.00 | Window Closed / Lapsed |