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US3907650A Expired / Lapsed US ⏱️ 0.0 years remaining

Photosensitive binder layer for xerography

Assignee: Xerox Corp
•
Filing: 1973-02-12
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Granted: 1975-09-23
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Expires: 1993-02-12
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Abstract

Abstract A process for applying a photoconductive layer to a flexible nickel or nickel-coated substrate by initially subjecting a nickel sheet or belt to an acid etching bath followed by anodizing treatment in an electrolytic bath to obtain at least two intermediate metal oxide layers such as nickel oxide layers having superior adhesive and charge-injection-blocking characteristics; and a flexible photoreceptor element with such structure which is especially useful for high-speed xerographic copy work.

Inventors

  • 👤 Heinz W Pinsler

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 21:26
CPC Classifications
G; G03; G03G; G03G5/00; G03G5/14; G03G5/142; G03G5/144; G03G5/10; G03G5/102

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 117 words
IN A PROCESS FOR PRODUCING A PHOTORECTOR ELEMENT COMPRISING A NICKEL OR NICKEL-COATED SUBSTRATE AND A PHOTOCONDUCTIVE LAYER JOINED IN GOOD BLOCKING AND CHANGE-INJECTION PREVENTING CONTACT WITH THE SUBSTRATE THROUGH AT LEAST TWO INTERMEDIATE NICKEL OXIDE BLOCKING LAYERS ARRANGED BETWEEN THE SUBSTRATE AND THE PHOTOCONDUCTIVE LAYER THE IMPROVEMENT COMPRISING MICROETCHING AND CHEMICALLY OXIDIZING THE NICKEL OR NICKELCOATED SUBSTRATE WITH A COMPOSITION COMPRISING AN INORGANIC ACID SELECTED FROM THE GROUP CONSISTING OF PHOSPHORIC ACID, SULFURIC ACID HAVING HYDROCHLOLIC ACID, IN THE PRESENCE OF AT LEAST ONE PALLADIUM CHLORIDE, CHLOROPLATININ ACID, OR FERRIC SULFATE, ANODICAALLY OXIDIZING THE RESULTING MICROETCHED CHEMICALLY OXIDIZED SUBSTRATE, AND DEPOSITING A DELENIU,-CONTAINING PGHOTCONDUCTIVE LAYER UPON THE TREATED SUBSTRATE TO OBTAIN THE DESIRED PHOTORE CEPTOR ELEMENT.
Claim 2
Dependent Claim 117 words
IN A PROCESS FOR PRODUCING A PHOTORECTOR ELEMENT COMPRISING A NICKEL OR NICKEL-COATED SUBSTRATE AND A PHOTOCONDUCTIVE LAYER JOINED IN GOOD BLOCKING AND CHANGE-INJECTION PREVENTING CONTACT WITH THE SUBSTRATE THROUGH AT LEAST TWO INTERMEDIATE NICKEL OXIDE BLOCKING LAYERS ARRANGED BETWEEN THE SUBSTRATE AND THE PHOTOCONDUCTIVE LAYER THE IMPROVEMENT COMPRISING MICROETCHING AND CHEMICALLY OXIDIZING THE NICKEL OR NICKELCOATED SUBSTRATE WITH A COMPOSITION COMPRISING AN INORGANIC ACID SELECTED FROM THE GROUP CONSISTING OF PHOSPHORIC ACID, SULFURIC ACID HAVING HYDROCHLOLIC ACID, IN THE PRESENCE OF AT LEAST ONE PALLADIUM CHLORIDE, CHLOROPLATININ ACID, OR FERRIC SULFATE, ANODICAALLY OXIDIZING THE RESULTING MICROETCHED CHEMICALLY OXIDIZED SUBSTRATE, AND DEPOSITING A DELENIU,-CONTAINING PGHOTCONDUCTIVE LAYER UPON THE TREATED SUBSTRATE TO OBTAIN THE DESIRED PHOTORE CEPTOR ELEMENT.
Claim 3
Dependent Claim 14 words
The process of claim 1 wherein the anodizing step is effected by glow discharge.
Claim 4
Dependent Claim 34 words
a balance of 0% up to about a catalytic amount of at least one of palladium chloride or chloroplatinic acid based on the total amount of catalyst utilized in steps (a) and (b), and
Claim 5
Dependent Claim 34 words
a balance of 0% up to about a catalytic amount of at least one of palladium chloride or chloroplatinic acid based on the total amount of catalyst utilized in steps (a) and (b), and
Claim 6
Dependent Claim 108 words
from 0% up through about 10% by weight of a water soluble alkali metal halide or iron sulfate; about 8% - 10% of the metal sulfate being utilized in the absence of platinum or palladium catalyst; b. anodically oxidizing the washed microetched and oxide-coated substrate by immersing and treating as an anode in an electrolytic bath until the potential of the resulting etched double oxide coated electrode as measured against a saturated calomel electrode changes from a negative value to a value not exceeding about 0.85 volt; and c. depositing a selenium-containing photoconductive layer upon a surface of the treated and washed substrate to obtain the desired element.
Claim 7
Dependent Claim 108 words
from 0% up through about 10% by weight of a water soluble alkali metal halide or iron sulfate; about 8% - 10% of the metal sulfate being utilized in the absence of platinum or palladium catalyst; b. anodically oxidizing the washed microetched and oxide-coated substrate by immersing and treating as an anode in an electrolytic bath until the potential of the resulting etched double oxide coated electrode as measured against a saturated calomel electrode changes from a negative value to a value not exceeding about 0.85 volt; and c. depositing a selenium-containing photoconductive layer upon a surface of the treated and washed substrate to obtain the desired element.
Claim 8
Dependent Claim 40 words
The process of claim 1 wherein the anodizing step is effected by immersing the substrate as an anode in an electrolytic bath until its potential, as measured against a saturated calomel electrode, has a maximum value of about 0.85 volt.
Claim 9
Dependent Claim 21 words
The process of claim 1 wherein the microetching step is effected with an etching bath comprising phosphoric acid and chloroplatinic acid.
Claim 10
Dependent Claim 21 words
The process of claim 1 wherein the microetching step is effected with an etching bath comprising phosphoric acid and palladium chloride.
Claim 11
Dependent Claim 52 words
A process for producing a photoreceptor element comprising a nickel or nickel-covered substrate and a selenium-containing photoconductive layer joined in good blocking contact through at least two intermediate blocking layers arranged between said substrate and the applied photoconductive layer, comprising a. microetching the nickel or nickel-coated substrate with an etching composition comprising
Claim 12
Dependent Claim 52 words
A process for producing a photoreceptor element comprising a nickel or nickel-covered substrate and a selenium-containing photoconductive layer joined in good blocking contact through at least two intermediate blocking layers arranged between said substrate and the applied photoconductive layer, comprising a. microetching the nickel or nickel-coated substrate with an etching composition comprising
Claim 13
Dependent Claim 36 words
A process according to claim 6 in which the clean substrate is treated with a pre-etch and wash solution containing 0% up to a catalytic amount of at least one of palladium chloride or chloroplatinic acid.
Claim 14
Dependent Claim 40 words
The process of claim 7 wherein the initial acid treatment of step is effected with a phosphoric acid solution or a hydrochloric acid solution in the presence of about 0% - 0.1% by weight of palladium chloride or chloroplatinic acid.
Claim 15
Dependent Claim 21 words
The process of claim 6 wherein the microetching step is effected with an etching bath comprising phosphoric acid and potassium chloride.
Claim 16
Dependent Claim 26 words
The process of claim 6 wherein the anodizing step is effected in an acidic electrolytic bath containing an alkali metal chromate salt solution as an electrolyte.
Claim 17
Dependent Claim 25 words
The procesS of claim 6 wherein the selenium-containing photoconductive layer comprises a cadmium selenide, a gallium triselenide, an arsenic triselenide, an antimony-selenium or a selenium-arsenic-halogen-alloy.
Claim 18
Dependent Claim 21 words
The process of claim 6 wherein the microetching step is effected with an etching bath comprising sulfuric acid and ferric sulfate.

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-09-22 1979-03-24 1979-09-23 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-09-22 1983-03-24 1983-09-23 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-09-22 1987-03-24 1987-09-23 $7700.00 Window Closed / Lapsed

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