Photosensitive elements for use in electrophotography

Claim 1

A method of manufacturing a photosensitive element for use in electrophotography by the steps of disposing a first source of a first photoconductive material exhibiting persistent internal polarization properties, a second source of a second such material having lower resistivity than said first material and an electrode layer in a vapor deposition tank, operating said second source to deposit said second material on said electrode layer, concurrently operating said first and second sources to deposit a mixture of said first and second materials, operating said first source to deposit said first material alone to a thickness greater than the combined thickness of said second material and said concurrently deposited first and second materials, and applying a highly insulative layer upon the deposited layer of said first material.

Claim 2

A method of manufacturing a photosensitive element for use in electrophotography by the steps of disposing a first source of a first photoconductive material exhibiting persistent internal polarization properties, a second source of a second such material having lower resistivity than said first material and an electrode layer in a vapor deposition tank, operating said second source to deposit said second material on said electrode layer, concurrently operating said first and second sources to deposit a mixture of said first and second materials, operating said first source to deposit said first material alone to a thickness greater than the combined thickness of said second material and said concurrently deposited first and second materials, and applying a highly insulative layer upon the deposited layer of said first material.

Claim 7

A method of preparing a photosensitive element for use in electrophotography comprising the steps of providing a conductive base as an electrode layer, preparing a first organic solution of photoconductive material exhibiting persistent internal polarization properties and a second organic solution of such material having lower resistivity than said photoconductive material of said first solution, applying said second organic solution upon said electrode layer to form a layer of said lower resistivity material, concurrently applying said first and second organic solutions to form a layer of a mixture of said photoconductive material exhibiting persistent internal polarization properties and said lower resistivity material, applying said first orgAnic solution to form a layer of said photoconductive material exhibiting persistent internal polarization properties and applying a transparent insulation layer upon the last mentioned layer.

Claim 8

A method of preparing a photosensitive element for use in electrophotography comprising the steps of providing a conductive base as an electrode layer, preparing a first organic solution of photoconductive material exhibiting persistent internal polarization properties and a second organic solution of such material having lower resistivity than said photoconductive material of said first solution, applying said second organic solution upon said electrode layer to form a layer of said lower resistivity material, concurrently applying said first and second organic solutions to form a layer of a mixture of said photoconductive material exhibiting persistent internal polarization properties and said lower resistivity material, applying said first orgAnic solution to form a layer of said photoconductive material exhibiting persistent internal polarization properties and applying a transparent insulation layer upon the last mentioned layer.

Claim 9

A METHOD OF MANUFACTURING A PHOTOSENSITIVE ELEMENT FOR USE IN ELECTROPHOTOGRAPHY COPRISING THE STEPS OF PROVIDING A CONDUCTIVE BASE AS AN ELECTRODE LAYER FORMING ON SAID ELECTRODE LAYER A LOW RESISTIVITY LAYER WHICH INCLUDES PHOTONDUCTIVE MATERIALS, FORMING A PHOTOCONDUCTIVE LAYER ON SAID LOW RESISTIVITY LAYER, AND APPLYING A TRANSPARENT HIGHLY INSLATIVE LAYER ON SAID PHOTOCONDUCTIVE LAYER, SAID LOW RESISTIVITY LAYER BEING FORMED TO A THICKNESS LESS THAN THAT OF SAID PHOTOCONDCTIVE LAYER AND BEING FORMED BY DEPOSITING A SERIES OF INTERDIFFSED LAYER OF VARYING RESISTIVITY SUCH THAT THE RESISTIVITY THEREOF IS A MINIMUM ADJACENT SAID ELECTRODE LAYER AND INCREASES TOWARD SAID PHOTOCONDUCTIVE LAYER TO A VAUE APPROCHING THAT OF SAID PHOTOCONDUCTIVE LAYER, THEREBY ELIMINATING ANY DISCRETE INTERFACE BETWEEN SAID PHOTOCONDUCTIVE LAYER AND SAID LOW RESISTIVITY LAYER.

Claim 10

A METHOD OF MANUFACTURING A PHOTOSENSITIVE ELEMENT FOR USE IN ELECTROPHOTOGRAPHY COPRISING THE STEPS OF PROVIDING A CONDUCTIVE BASE AS AN ELECTRODE LAYER FORMING ON SAID ELECTRODE LAYER A LOW RESISTIVITY LAYER WHICH INCLUDES PHOTONDUCTIVE MATERIALS, FORMING A PHOTOCONDUCTIVE LAYER ON SAID LOW RESISTIVITY LAYER, AND APPLYING A TRANSPARENT HIGHLY INSLATIVE LAYER ON SAID PHOTOCONDUCTIVE LAYER, SAID LOW RESISTIVITY LAYER BEING FORMED TO A THICKNESS LESS THAN THAT OF SAID PHOTOCONDCTIVE LAYER AND BEING FORMED BY DEPOSITING A SERIES OF INTERDIFFSED LAYER OF VARYING RESISTIVITY SUCH THAT THE RESISTIVITY THEREOF IS A MINIMUM ADJACENT SAID ELECTRODE LAYER AND INCREASES TOWARD SAID PHOTOCONDUCTIVE LAYER TO A VAUE APPROCHING THAT OF SAID PHOTOCONDUCTIVE LAYER, THEREBY ELIMINATING ANY DISCRETE INTERFACE BETWEEN SAID PHOTOCONDUCTIVE LAYER AND SAID LOW RESISTIVITY LAYER.