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US3879680A Expired / Lapsed US ⏱️ 0.0 years remaining

Device for removing and decontaminating chemical laser gaseous effluent

Assignee: Atlantic Research Corp
•
Filing: 1973-02-20
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Granted: 1975-04-22
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Expires: 1993-02-20
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Abstract

Abstract A device for removing low-pressure effluent gases containing hydrogen fluoride or deuterium fluoride from a chemical laser system, comprising a gas generator containing a gas-generating composition which burns to produce high-temperature gaseous combustion products including gaseous alkali metal hydroxide, gaseous alkali metal, or mixtures thereof, and provided with a restricted nozzle for producing high-velocity gas stream of said combustion products, and a chamber adapted to receive the gas stream venting from said nozzle, said chamber having inlet means for the low-pressure effluent gases and exit means for the mixed gas stream resulting from admixture within the chamber of the combustion gas stream and the low-pressure effluent gases. The exit means may include conventional means, such as a convergentdivergent diffuser, to increase, if necessary, the pressure of the mixed product gas stream above ambient pressure to ensure its ejection. A method for removing low-pressure effluent gases containing hydrogen fluoride or deuterium fluoride from a chemical laser system comprising burning a gas-generating composition to produce high-temperature gaseous combustion products containing gaseous alkali metal hydroxide, gaseous alkali metal, or mixtures thereof, venting said combustion products through a restricted nozzle to produce a total high-velocity gas stream, entraining in and admixing with said gas stream said low-pressure effluent gases to produce a mixed gas stream and permitting said gaseous alkali metal hydroxide, gaseous alkali metal, or mixtures thereof to react with said hydrogen fluoride or deuterium fluoride. Additionally, if required, the pressure of the mixed gas stream can be increased to a pressure above ambient pressure.

Inventors

  • 👤 Robert Naismith
  • 👤 Robert Stephen Scheffee

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 22:40
CPC Classifications
H; H01; H01S; H01S3/00; H01S3/09; H01S3/095

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 155 words
A DEVICE FOR REMOVING LOW-PRESSURE EFFLUENT GASES CONTAINING HYDROGEN FLUORIDE OR DEUTERIUM FLUORIDE FROM A CHEMICAL LASER SYSTEM AND FOR ELIMINATING FROM THE SO-REMOVED GASES SAID HYDROGEN FLUORIDE OR DEUTERIUM FLUORIDE, COMPRISING: A. A GAS GENERATOR HAVING A COMBUSTION CHAMBER, A GASGENERATING COMPOSITION SEATED IN SAID COMBUSTION CHAMBER CAPABLE OF PRODUCING HIGH TEMPERATURE, GASEOUS COMBUSTION PRODUCTS INCLUDING GASEOUS ALKALI METAL HYDROXIDE, GASEOUS ALKALI METAL, OR MIXTURES, THEREOF, AND A RESTRICTED NOZZLE FOR VENTING AT HIGH VELOCITY AND SAID COMBUTION PRODUCTS, AND B. A CHAMBER CONNECTED TO SAID GAS GENERATOR AND ADAPTED TO RECEIVE THE HIGH-VILOCITY COMBUSTION GAS STREAM VENTING FROM SAID RESTRICTED NOZZLE, SAID CHAMBER HAVING INLET MEANS CONNECTED TO THE CAVITY OF A LOW-PRESSURE HYDROGEN FLUORIDE- OR DEUTERIUM FLORIDE-PRODUCING CHEMICAL LASER AS ITS SOURCE OF THE LOW-PRESSURE EFFLUENT GASES, AND HAVING EXIT MEANS FOR THE PRODUCTS RESULTING FROM THE ADMIXTURE WITHIN SAID CHAMBER OF SAID COMBUSTION PRODUCT GAS STREAM AND SAID LOW-PRESSURE EFFLUENT GASES.
Claim 2
Independent Claim 155 words
A DEVICE FOR REMOVING LOW-PRESSURE EFFLUENT GASES CONTAINING HYDROGEN FLUORIDE OR DEUTERIUM FLUORIDE FROM A CHEMICAL LASER SYSTEM AND FOR ELIMINATING FROM THE SO-REMOVED GASES SAID HYDROGEN FLUORIDE OR DEUTERIUM FLUORIDE, COMPRISING: A. A GAS GENERATOR HAVING A COMBUSTION CHAMBER, A GASGENERATING COMPOSITION SEATED IN SAID COMBUSTION CHAMBER CAPABLE OF PRODUCING HIGH TEMPERATURE, GASEOUS COMBUSTION PRODUCTS INCLUDING GASEOUS ALKALI METAL HYDROXIDE, GASEOUS ALKALI METAL, OR MIXTURES, THEREOF, AND A RESTRICTED NOZZLE FOR VENTING AT HIGH VELOCITY AND SAID COMBUTION PRODUCTS, AND B. A CHAMBER CONNECTED TO SAID GAS GENERATOR AND ADAPTED TO RECEIVE THE HIGH-VILOCITY COMBUSTION GAS STREAM VENTING FROM SAID RESTRICTED NOZZLE, SAID CHAMBER HAVING INLET MEANS CONNECTED TO THE CAVITY OF A LOW-PRESSURE HYDROGEN FLUORIDE- OR DEUTERIUM FLORIDE-PRODUCING CHEMICAL LASER AS ITS SOURCE OF THE LOW-PRESSURE EFFLUENT GASES, AND HAVING EXIT MEANS FOR THE PRODUCTS RESULTING FROM THE ADMIXTURE WITHIN SAID CHAMBER OF SAID COMBUSTION PRODUCT GAS STREAM AND SAID LOW-PRESSURE EFFLUENT GASES.
Claim 3
Independent Claim 154 words
A device for removing low-pressure effluent gases containing hydrogen fluoride or deuterium fluoride from a chemical laser system and for eliminating from the so-removed gases said hydrogen fluoride or deuterium fluoride, comprising: a. a gas generator having a combustion chamber, a gas-generating composition seated in said combustion chamber capable of producing high temperature, gaseous combustion products including gaseous alkali metal hydroxide, gaseous alkali metal, or mixtures thereof, and a restricted nozzle for venting at high velocity said combustion products, and b. a chamber connected to said gas generator and adapted to receive the high-velocity combustion gas stream venting from said restricted nozzle, said chamber having inlet means connected to the cavity of a low-pressure hydrogen fluoride- or deuterium fluoride-producing chemical laser as its source of the low-pressure effluent gases, and having exit means for the products resulting from the admixture within said chamber of said combustion product gas stream and said low-pressure effluent gases.
Claim 4
Independent Claim 154 words
A device for removing low-pressure effluent gases containing hydrogen fluoride or deuterium fluoride from a chemical laser system and for eliminating from the so-removed gases said hydrogen fluoride or deuterium fluoride, comprising: a. a gas generator having a combustion chamber, a gas-generating composition seated in said combustion chamber capable of producing high temperature, gaseous combustion products including gaseous alkali metal hydroxide, gaseous alkali metal, or mixtures thereof, and a restricted nozzle for venting at high velocity said combustion products, and b. a chamber connected to said gas generator and adapted to receive the high-velocity combustion gas stream venting from said restricted nozzle, said chamber having inlet means connected to the cavity of a low-pressure hydrogen fluoride- or deuterium fluoride-producing chemical laser as its source of the low-pressure effluent gases, and having exit means for the products resulting from the admixture within said chamber of said combustion product gas stream and said low-pressure effluent gases.
Claim 5
Dependent Claim 19 words
The device of claim 1 wherein the alkali metal of said hydroxide or metal is sodium, potassium or lithium.
Claim 6
Dependent Claim 18 words
The device of claim 1 wherein the alkali metal of said hydroxide or metal is sodium or potassium.
Claim 7
Dependent Claim 14 words
The device of claim 3 wherein the gas-generating composition contains sodium or potassium nitrate.
Claim 8
Dependent Claim 19 words
The device of claim 1 wherein the exit means includes means for increasing the pressure of the exiting gases.
Claim 9
Dependent Claim 19 words
The device of claim 5 wherein the alkali metal of said hydroxide or metal is sodium, potassium, or lithium.
Claim 10
Dependent Claim 18 words
The device of claim 5 wherein the alkali metal of said hydroxide or metal is sodium or potassium.
Claim 11
Dependent Claim 14 words
The device of claim 7 wherein the gas-generating composition contains sodium or potassium nitrate.
Claim 12
Dependent Claim 12 words
The device of claim 5 wherein the pressurizing means is a diffuser.
Claim 13
Dependent Claim 19 words
The device of claim 9 wherein the alkali metal of said hydroxide or metal is sodium, potassium, or lithium.
Claim 14
Dependent Claim 18 words
The device of claim 9 wherein the alkali metal of said hydroxide or metal is sodium or potassium.

References Cited (Backward Citations)

US2767233A Cited
US2799159A Cited
US3692597A Cited
US2991166A Cited
US3198677A Cited
US3709978A Cited
US3694770A Cited
US3699209A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-04-21 1978-10-21 1979-04-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-04-21 1982-10-21 1983-04-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-04-21 1986-10-21 1987-04-22 $7700.00 Window Closed / Lapsed

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