US3865597A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Additives to negative photoresists which increase the sensitivity thereof
Assignee: AT&T Inc
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Filing: 1974-02-04
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Granted: 1975-02-11
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Expires: 1994-02-04
Abstract
Abstract The use of a scanning electron beam to generate a pattern in a negative photoresist is known. Electron beam equipment can be made which is capable of scanning very quickly, but standard negative photoresists require such a large flux of electrons for proper exposure that the scanning equipment must be operated at speeds substantially slower than the capability of the equipment. By adding certain compounds which dissociate readily into free radicals to the photoresist, the sensitivity or speed of the photoresist is effectively increased. As a result, the electron beam can scan at a higher rate. Compounds which are most effective are benzophenone, benzil and 1,4-diphenyl-1,3butadiene.
Inventors
- 👤 Barret Broyde
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 23:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/108; Y10S430/114; Y10S430/124; Y10S430/143
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
55 words
AN ELECTRON SENSITIVE PHOTORESIST COMPOSITION COMPRISING A PARTIALLY CYCLIZED CIS-POLYISOPRENE RESIST AND A COMPOUND SELECTED FROM THE GROUP CONSISTING OF BENZIL AND BENZOPHENONE, SAID RESIST AND SAID COMPOUND BEING DISSOLVED IN A SOLVENT SYSTEM EMPLOYED WTIH SAID RESIST, THE CONCENTRATION OF SAID COMPOUND IN THE PHOTORESIST-SOLVENT SYSTEM BEING AN AMOUNT RANGING FROM 0.1 TO 5%.
Claim 2
Dependent Claim
55 words
AN ELECTRON SENSITIVE PHOTORESIST COMPOSITION COMPRISING A PARTIALLY CYCLIZED CIS-POLYISOPRENE RESIST AND A COMPOUND SELECTED FROM THE GROUP CONSISTING OF BENZIL AND BENZOPHENONE, SAID RESIST AND SAID COMPOUND BEING DISSOLVED IN A SOLVENT SYSTEM EMPLOYED WTIH SAID RESIST, THE CONCENTRATION OF SAID COMPOUND IN THE PHOTORESIST-SOLVENT SYSTEM BEING AN AMOUNT RANGING FROM 0.1 TO 5%.
Claim 3
Dependent Claim
28 words
The composition as claimed in claim 1 wherein said resist and said compound are dissolved in a solvent system comprising 12% ethylbenzene, 82% mixed xylenes and 6% methylcellosolve.
Claim 4
Independent Claim
34 words
A method of increasing the electron sensitivity of a photoresist comprising a partially cyclized cis-polyisoprene resist which comprises combining the photoresist with a sensitizing compound selected from the group consisting of benzil and benzophenone.
Claim 5
Independent Claim
34 words
A method of increasing the electron sensitivity of a photoresist comprising a partially cyclized cis-polyisoprene resist which comprises combining the photoresist with a sensitizing compound selected from the group consisting of benzil and benzophenone.
Claim 6
Dependent Claim
23 words
The method as defined in claim 3 wherein saidd resist and said compound are dissolved in a solvent system employed with said resist.
Claim 7
Dependent Claim
24 words
The method as defined in claim 4 wherein said compound is present in said photoresist-solvent system in an amount ranging from 0.1 to 5%.
Claim 8
Dependent Claim
20 words
The method as defined in claim 4 wherein said solvent system comprises 12% ethylbenzene, 82% mixed xylenes and 6% methylcellosolve.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-02-10 | 1978-08-12 | 1979-02-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-02-10 | 1982-08-12 | 1983-02-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-02-10 | 1986-08-12 | 1987-02-11 | $7700.00 | Window Closed / Lapsed |