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US3853726A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of producing organochlorosilanes

Assignee: Individual
•
Filing: 1973-01-02
•
Granted: 1974-12-10
•
Expires: 1993-01-02
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Abstract

Abstract A method for producing organochlorosilanes having the general formulae RRn''SiCl3-n and R''''(SiRn''Cl3-n)2, where R is an aryl, chloroaryl, fluoroaryl, fluorochloroaryl, functional aryl or heterocyclic radical; R'' is an alkyl or aryl radical; R'''' is arylene, chloroarylene, fluoroarylene or functional arylene; n 0, 1, or 2, in which organochlorosilicohydrides or trichlorosilane having the general formula HSiRn''Cl3-n, where R'' is the alkyl or aryl radical n 0, 1, or 2 react with chlorinecontaining aryl compounds having the general formulae RCl or R''''Cl2, where R is an aryl, chloroaryl, fluoroaryl, fluorochloroaryl, functional aryl or heterocyclic radical; R'''' is arylene, chloroarylene, fluoroarylene or functional arylene. The said process is carried out in the vapour phase at a temperature of not over 450*C at atmospheric pressure or at elevated pressure thus to exclude the formation of the condensation phase, under the action of the ionizing radiation. The proposed method can be used for the manufacture of the desired product with high yields in a continuous process.

Inventors

  • 👤 L Bogovtseva
  • 👤 E Starodubtsev
  • 👤 A Masljukov
  • 👤 V Andreev
  • 👤 M Ezerets
  • 👤 B Zorov
  • 👤 A Zimin
  • 👤 E Chernyshov
  • 👤 M Kurek
  • 👤 A Polivanov
  • 👤 B Vainshiein

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 18:27
CPC Classifications
B; B01; B01J; B01J19/00; B01J19/08; B01J19/081; C; C07; C07F; C07F7/00; C07F7/02; C07F7/08; C07F7/12; C07F7/121; C07F7/122

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 208 words
A METHOD OF PRODUCING ORGANOCHLOROSILANES HAVING THE GENERAL FORMULAE RRN''SICL3-N AND R"(SIRN''CL3-N)2, WHERE R IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYL, CHLOROARYL, FLUOROARYL, FLUOROCHLOROARYL, FUNCTIONAL ARYL AND HETEROCYCLIC RADICAL; R'' IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF THE ALKYL AND ARYL RADICALS; R" IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYLENE, CHLOROARYLENE, FLUOROARYLENE AND FUNCTIONAL ARYLENE; AND N = 0, 1, OR 2, WHICH COMPRISES REACTING A COMPOUND SELECTED FROM THE GROUP CONSISTING OF ORGANOCHLOROSILICOHYDRIDES AND TRICHLOROSILANE HAVING THE GENERAL FORMULA HSIRN''CL3-N, WHERE R'' IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ALKYL AND ARYL RADICALS; AND N = 0, 1, OR 2, WITH CHLORIDE-CONTAINING COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF COMPOUNDS OF THE GENERAL FORMULA RCL AND GENERAL FORMULA R"CL2, WHERE R IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYL, CHLOROARYL, FLUOROARYL, FLUOROCHLOROARYL, FUNCTIONAL ARYL AND HETEROCYCLIC RADICALS; R" IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYLENE, CHLORARYLENE, FLUOROARYLENE AND FUNCTIONAL ARYLENE; THE SAID PROCESS BEING CARRIED OUT IN THE VAPOR PHASE AT A TEMPERATURE OF NOT ABOVE 450*C AT A ATMOSPHERIC PRESSURE AND UNDER THE ACTION OF IONIZING RADIATION SELECTED FROM THE GROUP CONSISTING OF HIGH SPEED ELECTRONS, GAMMA RADIATION AND BETA RADIATION.
Claim 2
Independent Claim 208 words
A METHOD OF PRODUCING ORGANOCHLOROSILANES HAVING THE GENERAL FORMULAE RRN''SICL3-N AND R"(SIRN''CL3-N)2, WHERE R IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYL, CHLOROARYL, FLUOROARYL, FLUOROCHLOROARYL, FUNCTIONAL ARYL AND HETEROCYCLIC RADICAL; R'' IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF THE ALKYL AND ARYL RADICALS; R" IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYLENE, CHLOROARYLENE, FLUOROARYLENE AND FUNCTIONAL ARYLENE; AND N = 0, 1, OR 2, WHICH COMPRISES REACTING A COMPOUND SELECTED FROM THE GROUP CONSISTING OF ORGANOCHLOROSILICOHYDRIDES AND TRICHLOROSILANE HAVING THE GENERAL FORMULA HSIRN''CL3-N, WHERE R'' IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ALKYL AND ARYL RADICALS; AND N = 0, 1, OR 2, WITH CHLORIDE-CONTAINING COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF COMPOUNDS OF THE GENERAL FORMULA RCL AND GENERAL FORMULA R"CL2, WHERE R IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYL, CHLOROARYL, FLUOROARYL, FLUOROCHLOROARYL, FUNCTIONAL ARYL AND HETEROCYCLIC RADICALS; R" IS A RADICAL SELECTED FROM THE GROUP CONSISTING OF ARYLENE, CHLORARYLENE, FLUOROARYLENE AND FUNCTIONAL ARYLENE; THE SAID PROCESS BEING CARRIED OUT IN THE VAPOR PHASE AT A TEMPERATURE OF NOT ABOVE 450*C AT A ATMOSPHERIC PRESSURE AND UNDER THE ACTION OF IONIZING RADIATION SELECTED FROM THE GROUP CONSISTING OF HIGH SPEED ELECTRONS, GAMMA RADIATION AND BETA RADIATION.
Claim 3
Dependent Claim 16 words
A method as claimed in claim 1, wherein the components are reacted under high speed-electron radiation.
Claim 4
Dependent Claim 17 words
A method as claimed in claim 1, wherein the components react under the action of gamma radiation.
Claim 5
Independent Claim 214 words
A method for production of organochlorosilanes having the general formulae RRn''SiCl3-n and R''''(SIRn''Cl3-n)2, where R is a radical selected from the group consisting of the aryl, chloroaryl, fluoroaryl, fluorochloroaryl, functional aryl and heterocyclic radicals; R'' is a radical selected from the group cOnsisting of the alkyl and aryl radicals; R'''' is a radical selected from the group consisting of arylene, chloroarylene and functional arylene; and n 0, 1, or 2, which comprises reacting a compound selected from the group consisting of organochlorosilicohydrides and trichlorosilane having the general formula HSiRn''Cl3-n, where R'' is a radical selected from the group consisting of the alkyl and aryl radicals; and n 0, 1, or 2, with chlorine-containing compounds selected from the group consisting of compounds having the general formula RCl and the general formula R''''Cl2, where R is a radical selected from the group consisting of the aryl, chloroaryl, fluoroaryl, fluorochloroaryl, functional aryl and heterocyclic radicals; R'''' is a radical selected from the group consisting of arylene, chloroarylene, fluoroarylene and functional arylene; the said process being carried out in the vapour phase at a temperature of not above 450*C at elevated pressure which excludes the formation of the condensation phase, under the action of ionizing radiation selected from a group consisting of gamma rays and high speed electrons.
Claim 6
Independent Claim 214 words
A method for production of organochlorosilanes having the general formulae RRn''SiCl3-n and R''''(SIRn''Cl3-n)2, where R is a radical selected from the group consisting of the aryl, chloroaryl, fluoroaryl, fluorochloroaryl, functional aryl and heterocyclic radicals; R'' is a radical selected from the group cOnsisting of the alkyl and aryl radicals; R'''' is a radical selected from the group consisting of arylene, chloroarylene and functional arylene; and n 0, 1, or 2, which comprises reacting a compound selected from the group consisting of organochlorosilicohydrides and trichlorosilane having the general formula HSiRn''Cl3-n, where R'' is a radical selected from the group consisting of the alkyl and aryl radicals; and n 0, 1, or 2, with chlorine-containing compounds selected from the group consisting of compounds having the general formula RCl and the general formula R''''Cl2, where R is a radical selected from the group consisting of the aryl, chloroaryl, fluoroaryl, fluorochloroaryl, functional aryl and heterocyclic radicals; R'''' is a radical selected from the group consisting of arylene, chloroarylene, fluoroarylene and functional arylene; the said process being carried out in the vapour phase at a temperature of not above 450*C at elevated pressure which excludes the formation of the condensation phase, under the action of ionizing radiation selected from a group consisting of gamma rays and high speed electrons.
Claim 7
Dependent Claim 19 words
A method as claimed in claim 4, wherein the components react under the action of high speed electron radiation.
Claim 8
Dependent Claim 17 words
A method as claimed in claim 4, wherein the components react under the action of gamma radiation.

References Cited (Backward Citations)

US2405019A Cited
US3493479A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1977-12-09 1978-06-10 1978-12-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1981-12-09 1982-06-10 1982-12-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1985-12-09 1986-06-10 1986-12-10 $7700.00 Window Closed / Lapsed

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