Patent US3849656A successfully refreshed from Google Patents.
US3849656A
Expired / Lapsed
US
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Plural sample ion source
Assignee: Associated Electrical Industries Ltd
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Filing: 1969-11-12
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Granted: 1974-11-19
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Expires: 1989-11-12
Abstract
Abstract An ion source for separately ionizing a plurality of vaporized samples and focusing the ions produced by the ionization into an ion beam containing ions from each of the vaporized samples. The ion source comprises an ionization chamber having an aperture through which ions are emitted, means for emitting an electron beam into the ionization chamber, at least one ion control electrode for establishing an ion control field, and partition means for dividing the ionization chamber into a first and second electron bombardment chamber. The ion source also includes a first and second gas storage vessel for respectively introducing at least a first and second vaporized sample into the first and second electron bombardment chambers, respectively, so that the first and second vaporized samples are independently ionized.
Inventors
- 👤 M Wallington
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 14:08
CPC Classifications
H; H01; H01J; H01J5/00; H01J5/02; H01J49/00; H01J49/02; H01J49/10; H01J49/14
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
154 words
An ion source for a mass spectrometer comprising: a. an evacuable ionization chamber; b. inlet means for introducing a plurality of vaporized samples into separate regions of said chamber; c. common aperture means defining at least one opening in communication with said ionization chamber through which ions formed in each of said regions exit to form an ion beam; d. partition means within said chamber for restricting the movement of the vaporized samples between said regions; e. means for developing ions of the samples in their respective regions of said chamber; f. electrode means for accelerating the ions through said common aperture means thereby producing an ion beam containing ions from each of the samples; and, g. said partition means extending to a position adjacent said common aperture means to define flow paths whereby ions from each of said regions may exit said ionization chamber through said opening without passing through any other regions.
Claim 2
Dependent Claim
154 words
An ion source for a mass spectrometer comprising: a. an evacuable ionization chamber; b. inlet means for introducing a plurality of vaporized samples into separate regions of said chamber; c. common aperture means defining at least one opening in communication with said ionization chamber through which ions formed in each of said regions exit to form an ion beam; d. partition means within said chamber for restricting the movement of the vaporized samples between said regions; e. means for developing ions of the samples in their respective regions of said chamber; f. electrode means for accelerating the ions through said common aperture means thereby producing an ion beam containing ions from each of the samples; and, g. said partition means extending to a position adjacent said common aperture means to define flow paths whereby ions from each of said regions may exit said ionization chamber through said opening without passing through any other regions.
Claim 3
Dependent Claim
37 words
The apparatus of claim 1 wherein said common aperture means comprises a single centrally located opening communicating with said ionization chamber, and said partition means divides said ionization chamber into substantially symmetrical regions of substantially equal size.
Claim 4
Dependent Claim
29 words
The apparatus of claim 1 wherein said opening has edges shaped to facilitate the flow of ions from said ionization chamber and the formation of a single ion beam.
Claim 5
Dependent Claim
40 words
The apparatus of claim 1 wherein the portion of said partition means which extends in the region of said opening is shaped to facilitate the flow of ions from said ionization chamber and the formation of a single ion beam.
Claim 6
Dependent Claim
26 words
The apparatus of claim 4 wherein said portion comprises edges tapered toward the region of said opening to provide said portion with a substantially pointed configuration.
Claim 7
Dependent Claim
46 words
The apparatus of claim 1 wherein: said partition means divides said chamber into first and second electron bombardment chambers; and said inlet means comprises first and second inlet passage means for respectively introducing first and second vaporized samples into said first and second electron bombardment chambers.
Claim 8
Dependent Claim
26 words
The apparatus of claim 6 wherein said partition means extends adjacent said opening in a plane which is substantially perpendicular to the plane of said opening.
Claim 9
Dependent Claim
46 words
The apparatus of claim 7 wherein the portion of said partition means whicH extends in the region of said opening, and the edges of said opening are shaped to facilitate the flow of ions from said ionization chamber and the formation of a single ion beam.
Claim 10
Dependent Claim
38 words
The apparatus of claim 1 wherein said aperture means comprises an ion exit slit, the edges of which are tapered to facilitate the flow of ions from said ionization chamber and the formation of a single ion beam.
Claim 11
Dependent Claim
32 words
The apparatus of claim 1 wherein said electrode means comprises a separate repeller plate disposed in each of said regions for accelerating the ions produced in that region into the ion beam.
Claim 12
Dependent Claim
146 words
An ion source for separately ionizing a plurality of gas samples, comprising: a. an ionization chamber having a single aperture through which ions are emitted; b. inlet means for introducing a plurality of gas samples into separate regions of said chamber; c. means for developing ions of the samples in their respective regions of said chamber; d. partition means within said chamber for restricting the movement of the samples between said regions; e. ion control electrode means in each of said regions for establishing an ion control field for propelling ions through said aperture to form a single ion beam including ions of each of the samples; and, f. said partition means extending to a position adjacent said aperture to define flow paths whereby ions from each of said regions may exit said ionization chamber through said aperture without passing into any of the other regions.
Claim 13
Dependent Claim
146 words
An ion source for separately ionizing a plurality of gas samples, comprising: a. an ionization chamber having a single aperture through which ions are emitted; b. inlet means for introducing a plurality of gas samples into separate regions of said chamber; c. means for developing ions of the samples in their respective regions of said chamber; d. partition means within said chamber for restricting the movement of the samples between said regions; e. ion control electrode means in each of said regions for establishing an ion control field for propelling ions through said aperture to form a single ion beam including ions of each of the samples; and, f. said partition means extending to a position adjacent said aperture to define flow paths whereby ions from each of said regions may exit said ionization chamber through said aperture without passing into any of the other regions.
Claim 14
Dependent Claim
27 words
The apparatus of claim 11 wherein said ion control means in each of said regions comprises a separate ion control electrode positioned in each of said regions.
Claim 15
Independent Claim
108 words
A method of generating an ion beam containing ions from a plurality of vaporized samples with an ion source including an ionization chamber partitioned into separate ionization regions and having a common aperture means through which ions exit the ionization chamber, comprising the steps of: introducing a first vaporized sample into a first one of said regions; introducing a second vaporized sample into a second one of said regions; separately ionizing each of said samples in its respective region by electron bombardment; and, accelerating ions produced in each of said regions through said common aperture means to produce an ion beam containing ions of each of said samples.
Claim 16
Independent Claim
108 words
A method of generating an ion beam containing ions from a plurality of vaporized samples with an ion source including an ionization chamber partitioned into separate ionization regions and having a common aperture means through which ions exit the ionization chamber, comprising the steps of: introducing a first vaporized sample into a first one of said regions; introducing a second vaporized sample into a second one of said regions; separately ionizing each of said samples in its respective region by electron bombardment; and, accelerating ions produced in each of said regions through said common aperture means to produce an ion beam containing ions of each of said samples.
Claim 17
Dependent Claim
61 words
A method of generating an ion beam as defined in claim 13 comprising the steps of: emitting a first electron beam through said first electron bombardment region for ionizing the first vaporized sample; and, emitting a second electron beam through said second electron bombardment region for ionizing the second vaporized sample so that the samples are ionized by separate electron beams.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-11-18 | 1978-05-20 | 1978-11-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-11-18 | 1982-05-20 | 1982-11-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-11-18 | 1986-05-20 | 1986-11-19 | $7700.00 | Window Closed / Lapsed |