US3824014A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Relief mask for high resolution photolithography
Assignee: United States Department of the Navy
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Filing: 1973-07-26
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Granted: 1974-07-16
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Expires: 1993-07-26
Abstract
Abstract A mask comprising a mask pattern disposed on the planar surface of a raised mound extending from a flat backing plate, the invention insuring intimate contact between the mask pattern and a substrate surface to be masked even though said substrate surface may have an excess deposit of photoresist or other material around the perimeter thereof.
Inventors
- 👤 J Abita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 03:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/7035
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
50 words
A pattern mask assembly particularly useful for high resolution photolithographic fabrication of microelectronic devices, comprising: a mask body member; a raised central body portion extending from said body member and terminating in a planar surface; and a masking pattern disposed on the planar surface of said raised central body portion.
Claim 2
Dependent Claim
50 words
A pattern mask assembly particularly useful for high resolution photolithographic fabrication of microelectronic devices, comprising: a mask body member; a raised central body portion extending from said body member and terminating in a planar surface; and a masking pattern disposed on the planar surface of said raised central body portion.
Claim 3
Dependent Claim
163 words
A pattern mask apparatus for developing a circuit pattern on a layer of photoresist material disposed on a substrate, the photoresist material being present in excessive quantities around the perimeter of the substrate, thereby hindering intimate contact between the surface of the layer of photoresist material and a patterned mask, the mask apparatus comprising: a mask body member having a planar surface; a raised central body portion extending from the planar surface of said body member and having a planar surface surmounting said body portion, the second-mentioned planar surface having an area less than the area of the first-mentioned planar surface; and, masking pattern disposed on the second-mentioned planar surface of said raised central body portion, the masking pattern of said mask apparatus being readily brought into contact with the surface of the layer of photoresist on the aforementioned substrate due to the disposition of said masking pattern on the raised central body portion, which central body portion fits within the raised perimeter.
Claim 4
Dependent Claim
163 words
A pattern mask apparatus for developing a circuit pattern on a layer of photoresist material disposed on a substrate, the photoresist material being present in excessive quantities around the perimeter of the substrate, thereby hindering intimate contact between the surface of the layer of photoresist material and a patterned mask, the mask apparatus comprising: a mask body member having a planar surface; a raised central body portion extending from the planar surface of said body member and having a planar surface surmounting said body portion, the second-mentioned planar surface having an area less than the area of the first-mentioned planar surface; and, masking pattern disposed on the second-mentioned planar surface of said raised central body portion, the masking pattern of said mask apparatus being readily brought into contact with the surface of the layer of photoresist on the aforementioned substrate due to the disposition of said masking pattern on the raised central body portion, which central body portion fits within the raised perimeter.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-07-15 | 1978-01-14 | 1978-07-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-07-15 | 1982-01-14 | 1982-07-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-07-15 | 1986-01-14 | 1986-07-16 | $7700.00 | Window Closed / Lapsed |