Patent US3799862A successfully refreshed from Google Patents.
US3799862A
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Apparatus for sputtering
Assignee: RTX Corp
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Filing: 1971-11-19
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Granted: 1974-03-26
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Expires: 1991-11-19
Abstract
Abstract APPARATUS GENERATING VERY HIGH POWER DENSITIES IN THE VICINITY OF A SPUTTERING TARGET AND LIQUEFACTION THEREOF IS UTILIZED TO PROVIDE VERY RAPID DEPOSITION OF HIGH TEMPERATURE ALLOYS WITH MINIMAL THERMAL FRACTIONATION. D R A W I N G
Inventors
- 👤 R Krutenat
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 13:33
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; C23C14/24; C23C14/28; C23C14/35; C23C14/354; C23C14/355
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-03-25 | 1977-09-24 | 1978-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-03-25 | 1981-09-24 | 1982-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-03-25 | 1985-09-24 | 1986-03-26 | $7700.00 | Window Closed / Lapsed |