Method and apparatus for stable silicon dioxide layers on silicon grown in silicon nitride ambient

Abstract

Abstract A METHOD AND APPARATUS FOR THERMALLY GROWING STABLE SILICON DIOXIDE LAYERS ON SILICON IS DISCLOSED. A PREVIOUSLY ETCHED AND BAKED SILICON NITRIDE TUBE PLACED IN A FURNACE IS USED TO GROW THE SILICON DIOXIDE. FIRST, PURE OXYGEN IS ALLOWDE TO FLOW THROUGH THE TUBE TO INITIALLY COAT THE INSIDE SURFACE OF THE TUBE WITH A THIN LAYER OF SILICON DIOXIDE. AFTER THE TUBE IS COATED WITH THE THIN LAYER OF SILICON DIOXIDE, THE SILICON IS OXIDIZED THERMALLY IN A NORMAL FASHION. IF THE TUBE BECOMES CONTAMINATED, THE SILICON DIOXIDE IS ETCHED OFF THEREBY EXPOSING CLEAN SILICON NITRIDE AND THEN THE INSIDE OF THE TUBE IS RECOATED WITH SILICON DIOXIDE. AS IS DISCLOSED, THE SILICON NITRIDE TUBE CAN ALSO BE USED AS THE AMBIENT FOR THE PYROLYTIC DECOMPOSITION OF SILANE AND AMMONIA TO FORM THIN LAYERS OF CLEAN SILICON NITRIDE.

Inventors

• 👤 R Cohen
• 👤 R Wheeler

Bibliographic Details