Patent US3785937A successfully refreshed from Google Patents.
US3785937A
Expired / Lapsed
US
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Thin film metallization process for microcircuits
Assignee: Individual
•
Filing: 1971-04-28
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Granted: 1974-01-15
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Expires: 1991-04-28
Abstract
Abstract SELECTIVE ANODIC OXIDATION IS EMPOLYED TO PATTERN THIN METALLIC FILMS IN THE FABRICATION OF PRINTED CIRCUIT BOARDS AND INTEGRATED MICROCIRCUITS TO PROVIDE "INLAID" METALLIZATION GEOMETRY AND THEREBY ELIMINATE THE NEED TOR SELECTIVE ETCHING OF METAL FILMS, THE TOTAL ANODIC CONVERSION OF METALLIC THIN FILMS TO THE CORRESPONDING OXIDE IS DEMONSTRATED. STANDARD PHOTOLITHOGRAPHIC MASKING TECHNIQUES ARE EMPLOYED TO ACHIEVE SELECTIVE ANODIC OXIDATION IN THE DELINEATION OF A SINGLE METAL FILM, AND ALSO FOR EACH SUCCESSIVE METALLIZATION LAYER IN THE FABRICATION OF INTEGRATED MICROCIRCUITS HAVING MULTILEVEL, INSULATED, INTERCONNECTING METALLIZATION PATTERNS.
Inventors
- 👤 W Mcmahon
- 👤 T Ramsey
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 19:40
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W74/00; H10W74/40; H10W74/43
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-01-14 | 1977-07-16 | 1978-01-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-01-14 | 1981-07-16 | 1982-01-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-01-14 | 1985-07-16 | 1986-01-15 | $7700.00 | Window Closed / Lapsed |