Patent US3775277A successfully refreshed from Google Patents.
US3775277A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of determining the thickness of a layer of dielectric material during its growth
Assignee: US Philips Corp
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Filing: 1972-02-07
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Granted: 1973-11-27
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Expires: 1992-02-07
Abstract
Abstract A method of and a device for determining the thickness of a thin layer of dielectric material during deposition of this layer by means of cathode sputtering. The thickness of the layer is calculated by means of voltages which are measured by means of a detector which is arranged in the plasma of the discharge.
Inventors
- 👤 J Pompei
- 👤 Vacon Y Le
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 21:24
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; C; C23; C23C; C23C14/00; C23C14/22; C23C14/54; C23C14/542; C23C14/545; G; G01; G01B; G01B7/00; G01B7/02; G01B7/06; G01B7/08; G01B7/085
Claims Analysis
Total Claims: 1
Claim 1
Independent Claim
20 words
A method as claimed in claim 1, characterized in that the reference potential is the potential of the carrier electrode.
References Cited (Backward Citations)
US2824281A
Cited
US2978364A
Cited
US3278843A
Cited
US3350941A
Cited
US3493484A
Cited
US3614606A
Cited
US3591479A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-11-26 | 1977-05-28 | 1977-11-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-11-26 | 1981-05-28 | 1981-11-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-11-26 | 1985-05-28 | 1985-11-27 | $7700.00 | Window Closed / Lapsed |