Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
14 words
A method as defined in claim 1 wherein the photoresist is a positive-acting photoresist.
Claim 2
Dependent Claim
18 words
A method as defined in claim 1 wherein the hydrophobic material is applied by means of screen printing.
Claim 3
Dependent Claim
39 words
A method as defined in claim 1 wherein the hydrophobic material is selected from the group consisting of paraffins, waxes, oils, oil-solvent mixtures and plastics characterized by the properties of being permeable to light and to developers for photoresist.
Claim 4
Dependent Claim
17 words
A method as defined in claim 4 wherein the hydrophobic material is essentially a silicon oil-xylene mixture.
Claim 5
Dependent Claim
35 words
A method as defined in claim 1 wherein the aqueous solution includes lithium fluoride in an amount sufficient to substantially saturate said solution and includes a lithium-polymolybdate having a stoichiometric composition of 2LiO2 . 3MoO3.
Claim 6
Dependent Claim
23 words
A method as defined in claim 1 wherein the aqueous solution includes a lower aliphatic alcohol for adjusting the density of said solution.
Claim 7
Dependent Claim
17 words
A method as defined in claim 7 wherein the density of the aqueous solution is about 1.195.
Claim 8
Dependent Claim
17 words
A method as defined in claim 7 wherein the density of the aqueous solution is about 1.20.
Claim 9
Dependent Claim
50 words
A method as defined in claim 1 wherein the annealing conditions include passing a reducing atmosphere over the resultant base structure and subjecting said structure to temperatures in the range of about 1,350* to about 1,600* C. for a period of time ranging from about 5 to about 30 minutes.
Claim 10
Independent Claim
301 words
A method of select metallization of a surface of an insulating base consisting essentially of the steps of: coating a surface of said insulating base with a layer of a positive-acting photoresist; superimposing a layer of a hydrophobic material onto said layer of photoresist, said hydrophobic material comprising a silicon oil-solvent mixture; exposing select areas of the surface coated with superimposed layers of photoresist and hydrophobic material to light so that areas of said photoresist layer corresponding to select areas are exposed thereby producing an exposed coated base, said exposed areas of the photoresist layer undergoing a chemical change so as to become soluble in a suitable developer and allowing the photoresist layer to be developed by said developer; contacting said exposed coated base with a developer for said photoresist for removal of soluble areas of the photoresist layer and superimposed areas of the hydrophobic material so as to expose areas of said base corresponding to said select areas and thereby produce a partially coated base; coating said partially coated base with an aqueous solution of lithium-polymolybdate having a stoichiometric composition of 2LiO2 . 3MoO3 and an amount of lithium fluoride sufficient to substantially saturate said solution, so that a layer of said solution forms only on the exposed areas of said base; drying said solution on the exposed areas of said base; and substantially simultaneously passing a reducing atmosphere of a dry hydrogen gas having a dew point of less than -20* C. over the resultant base and subjecting said base to temperatures in the range of about 1,350* to about 1,600* C. for a period of time ranging from about 5 to 30 minutes so as to burn-in the metal from said solution onto the insulating base and completely remove the remaining photoresist and repellant materIal from said base.
Claim 11
Dependent Claim
20 words
A method as defined in claim 11 wherein the hydrophobic material is a 3 percent silicon oil in xylene mixture.