Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
148 words
Ion beam intensity measuring apparatus suitable for use with a mass spectrometer comprising an apertured resolving electrode connected to a fixed reference potential, a first apertured electrode located beyond said apertured resolving electrode for admitting the ion beam and capable of emitting secondary electrons from a surface thereof, a first retarding electrode located beyond said first apertured electrode to apply a retarding electric field to ions passing through the aperture, a detector mounted on said first retarding electrode facing said first apertured electrode for detecting secondary electrons emitted from said first apertured electrode by ions repelled to said first apertured electrode by said field, means for applying a variable high potential to said first retarding electrode, and means for applying to said first apertured electrode a high potential which is of opposite polarity to said variable high potential relative to the fixed potential of said apertured resolving electrode.
Claim 2
Dependent Claim
148 words
Ion beam intensity measuring apparatus suitable for use with a mass spectrometer comprising an apertured resolving electrode connected to a fixed reference potential, a first apertured electrode located beyond said apertured resolving electrode for admitting the ion beam and capable of emitting secondary electrons from a surface thereof, a first retarding electrode located beyond said first apertured electrode to apply a retarding electric field to ions passing through the aperture, a detector mounted on said first retarding electrode facing said first apertured electrode for detecting secondary electrons emitted from said first apertured electrode by ions repelled to said first apertured electrode by said field, means for applying a variable high potential to said first retarding electrode, and means for applying to said first apertured electrode a high potential which is of opposite polarity to said variable high potential relative to the fixed potential of said apertured resolving electrode.
Claim 3
Dependent Claim
36 words
Apparatus as claimed in claim 1 wherein said first apertured electrode is preceded by a further apertured electrode capable of being maintained at a potential which is slightly lower than that of said first apertured electrode.
Claim 4
Dependent Claim
64 words
Apparatus as claimed in claim 1 comprising means located between said first retarding electrode and said first apertured electrode for providing an electric field component whose direction is transverse to the axis of the aperture, whereby the ion paths between said two electrodes are displaced away from said axis and the tendency for ions to be repelled back through the aperture is thereby reduced.
Claim 5
Dependent Claim
31 words
Apparatus as claimed in claim 3 wherein said first apertured electrode comprises an assymetrically located projecting portion which extends towards said first retarding electrode in order to provide said field component.
Claim 6
Dependent Claim
26 words
Apparaus as claimed in claim 4 wherein said assymetrical portion comprises a part-cylindrical portion having its axis substantially parallel to a slit which constitutes the aperture.
Claim 7
Dependent Claim
28 words
Apparatus as claimed in claim 5 wherein said projecting portion extends beyond the end of the slit to provide a sensibly uniform transverse field in the slit region.
Claim 8
Dependent Claim
58 words
Apparatus as claimed in claim 1 whErein said means for applying a variable potential and said means for applying a potential comprise means for applying to said first retarding electrode a variable positive potential relative to said apertured resolving electrode, and means for applying to said first apertured electrode a negative potential relative to said apertured resolving electrode.