Treatment of halogen-containing gas mixture

Abstract

Abstract THIS INVENTION RELATES TO A PROCESS FOR THE PURIFICATION OF A HALOGEN EFFUENT OBTAINED FRO THE OXIDATION OF AN INORGANIC HALIDE IN THE PRESENCE OF AN OXYGEN AND NITROGEN CONTAINING COMPOUND AND INVOLVES CONTACTING THE EFFLUENT MIXTURE CONTAINING NOT MORE THAN 1.5 WEIGHT PERCENT WATER, HYDROGEN HALIDE, HOLOGEN, OXYGEN AND NITROXYL HALIDE AT A TEMPERATURE OF FROM ABOUT ROOM TEMPERATURE TO ABOUT 175*F. UNDER A PRESSURE OF FROM ATMOSPHERIC TO 50 ATMOSPHERES, WITH POROUS SILICA, MAINTAINING THE MOLE RATIO OF HYDROGEN HALIDE TO HIGHER VALENT NITROGEN COMPOUNDS BETWEEN ABOUT 2:1 AND ABOUT 100:1. THE POROUS SILICA, WHICH IS A TYPE HAVING A SURFCE AREA IN EXCESS OF 50M.20G., ACTS AS A CATALYST TO CONVERT THE NITROXYL HALIDE AND NITROGEN DIOXIDE WHICH MAY ALSO BE PRESENT IN THE GASEOUS EFFUENT TO NITROSYL HALIDE AND CAN BE EMPLOYED ALONE OR IN ADMIXTURE OR COMPOSITE WITH OTHER METAL OXIDES WHERE THE MAJOR PORTION OF THE MIXTURE OR COMPOSITE COMPOSITION IS SILICA AND WHERE THE SURFACE AREA OF THE COMPOSITION OR COMPOSITE IS GREATER THAN 50M.2/G. THE RESULTING NITROSYL HALIDE CAN BE EASILY SEPARATED FROM THE HALOGEN PRODUCT BY ABSORPTION IN SULFURIC ACID OR OTHER SUITABLE EXTRACTION AGENT OR BY DISTILLATION SO THAT A HALOGEN PRODUCT OF GREATER THAN 99.9% PURITY WITH RESPECT TO NITROGEN CONTAMINANTS CAN BE RECOVERED AS THE PRODUCT OF THE PROCESS.

Inventors

• 👤 C Kang
• 👤 R Schreiber

Bibliographic Details