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US3769702A Expired / Lapsed US ⏱️ 0.0 years remaining

3d-coaxial memory construction and method of making

Assignee: Bunker Ramo Corp
•
Filing: 1972-08-09
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Granted: 1973-11-06
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Expires: 1992-08-09
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Abstract

Abstract A semiconductor memory in which integrated circuit chips each contain semiconductor flip-flop memory elements are mounted to respective ones of a plurality of batch-fabricated, pressurestacked electrically conductive wafers so as to form a compact, essentially all metal, three-dimensional memory structure. Coaxially-shielded X, Y and Z conductors are formed in the conductive wafers by selective chemical etching for expeditiously providing the interconnections required for the integrated circuit chips in accordance with the desired memory organization.

Inventors

  • 👤 A Scarbrough

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 08:54
CPC Classifications
G; G11; G11C; G11C11/00; G11C11/21; G11C11/34; G11C11/40; H; H10; H10W; H10W70/00; H10W70/60; H10W70/611; H10W90/00; H10W90/401; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49117; Y10T29/49124; Y10T29/49126

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 231 words
In a method of making a stacked multi-wafer digital memory, the steps of: providing a plurality of conductive wafers, selectively removing material from opposite surfaces of each wafer and replacing at least a portion of the removed material with dielectric material so as to form a plurality of spaced electrically insulated Z-axis through-terminals in each wafer supported therein and electrically insulated therefrom by said dielectric material and with at least predetermined ones of said Z-axis terminals being formed as through-terminals located in a like predetermined pattern in each wafer so that respective through-terminals will be aligned when the wafers are stacked, forming a pressure-deformable contact of material more malleable than said wafers on at least one end of each Z-axis throughterminal so that said contact is provided between each aligned pair or Z-axis through-terminals on adjacent wafers when the wafers are stacked, mounting and electrically connecting memory element chips each having a plurality of output leads to predetermined ones of said wafers in a like predetermined manner on each wafer with a majority of the output leads of each chip being electrically connected to respective Z-axis through-terminals of its respective wafer, and stacking said wafers under pressure sufficient to deform said pressure-deformable contacts and thereby form a plurality of insulated coaxially shielded Z-axis conductive paths within the stack electrically interconnecting respective ones of said majority of output leads of said chips.
Claim 2
Dependent Claim 231 words
In a method of making a stacked multi-wafer digital memory, the steps of: providing a plurality of conductive wafers, selectively removing material from opposite surfaces of each wafer and replacing at least a portion of the removed material with dielectric material so as to form a plurality of spaced electrically insulated Z-axis through-terminals in each wafer supported therein and electrically insulated therefrom by said dielectric material and with at least predetermined ones of said Z-axis terminals being formed as through-terminals located in a like predetermined pattern in each wafer so that respective through-terminals will be aligned when the wafers are stacked, forming a pressure-deformable contact of material more malleable than said wafers on at least one end of each Z-axis throughterminal so that said contact is provided between each aligned pair or Z-axis through-terminals on adjacent wafers when the wafers are stacked, mounting and electrically connecting memory element chips each having a plurality of output leads to predetermined ones of said wafers in a like predetermined manner on each wafer with a majority of the output leads of each chip being electrically connected to respective Z-axis through-terminals of its respective wafer, and stacking said wafers under pressure sufficient to deform said pressure-deformable contacts and thereby form a plurality of insulated coaxially shielded Z-axis conductive paths within the stack electrically interconnecting respective ones of said majority of output leads of said chips.
Claim 3
Dependent Claim 56 words
The invention in accordance with claim 1, wherein said method includes forming additional pressure-deformable contacts on the surface of at least one of each pair of adjacent stacked wafers at locations intermediate said Z-axis through-terminals which are likewise deformed during said stacking so as to reliably electrically interconnect said wafers to provide a common ground therefor.
Claim 4
Dependent Claim 35 words
The invention in accordance with claim 2, wherein said Z-axis through-terminals and said additional pressure-deformable contacts are provided in predetermined patterns on said wafers so as to provide for substantially uniform pressure distribution during stacking.
Claim 5
Dependent Claim 40 words
The invention in accordance with claim 1, wherein the step of selectively removing is such as to also form X-Y conductors in predetermined ones of said wafers electrically connected to predetermined ones of the Z-axis terminals of their respective wafers.
Claim 6
Dependent Claim 27 words
The invention in accordance with claim 4, wherein each of said X-Y conductors is formed so as to be recessed from both surfaces of its respective wafer.
Claim 7
Dependent Claim 19 words
The invention in accordance with claim 1, wherein the step of selectively removing is accomplished by selective chemical etching.
Claim 8
Dependent Claim 46 words
The invention in accordance with claim 6, wherein the step of stacking is such that the predetermined ones of said wafers to which said memory chips are mounted are stacked in an alternating arrangement with second predetermined ones of said wafers containing no memory chip elements.
Claim 9
Dependent Claim 37 words
The invention in accordance with claim 7, wherein said second predetermined ones of said wafers are additionally formed so as to provide recesses for accommodating projecting portions of memory chip elements on adjacent wafers during said stacking.

References Cited (Backward Citations)

US3383564A Cited
US3372309A Cited
US3351702A Cited
US3465435A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1976-11-05 1977-05-07 1977-11-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1980-11-05 1981-05-07 1981-11-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1984-11-05 1985-05-07 1985-11-06 $7700.00 Window Closed / Lapsed

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