Process and apparatus for chemical milling

Abstract

Abstract An improved process for selectively etching a pattern into a base material by the photochemical method using a photoresist coating over the base material to enable the exposure of an etching solution to selected portions of the base material wherein the article to be etched is coated with the photoresist material and is thereafter continuously advanced and rotated at relatively uniform rates past a stationary spray of etching solution. A conveying system is also disclosed that is capable of simultaneously rotating and linearly advancing an article. The apparatus comprises a first and second spaced apart conveyor, the movable article carrier therebetween and in engagement with the conveyors and a driving means for each conveyor. The conveyors comprise a driving sprocket, an idler sprocket and an endless carriage in engagement with the sprockets. The endless carriage comprises a core and substantially equally spaced protrusions extending from each side of the core that engage the toothlike configuration of the periphery of each side of the sprockets. The carriages of each conveyor engages the article carrier to provide the linear movement. Differing the linear speeds or direction of travel of the two carriages enables variations in the rotational and linear movement of the article carrier.

Inventors

• 👤 J Lagermasini
• 👤 L Warner

Bibliographic Details