Patent US3758326A successfully refreshed from Google Patents.
US3758326A
Expired / Lapsed
US
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Mask or original for reproducing patterns on light sensitive layers
Assignee: Telefunken Electronic GmbH
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Filing: 1970-01-29
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Granted: 1973-09-11
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Expires: 1990-01-29
Abstract
Abstract A MASK OR ORIGINAL FOR REPORDUCING PATTERNS ON LIGHT SENSITIVE LAYERS COMPRISES A TRANSPARENT SUBSTRATE AND A PATTERN LAYER ON THE SUBSTRTE CONTAINING THE PATTERN TO BE REPRODUCED. THIS LAYER HAS A LIGHT TRANSMISSION DEPENDING ON THE LIGHT WAVELENGTH AND CONSISTS OF A III/V OR A II/VI COMPOUND. A METHOD OF PRODUCING SUCH A MASK OR ORIGINAL INCLUDES APPLYING THE LAYER TO THE SUBSTRATE BY VAPOUR DEPOSITION, CATHODE SPUTTERING, OR PYROLYTIC DEPOSITION.
Inventors
- 👤 K Hennings
- 👤 H Meyer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 16:32
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-09-10 | 1977-03-12 | 1977-09-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-09-10 | 1981-03-12 | 1981-09-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-09-10 | 1985-03-12 | 1985-09-11 | $7700.00 | Window Closed / Lapsed |